Patents by Inventor YEN-CHIN HSIAO

YEN-CHIN HSIAO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10423069
    Abstract: A non-toxic water soluble photosensitive resin composition able to function as a solder mask coating comprises a polymer containing oxazolinyl, a photosensitive monomer, and a photo-initiator. These elements are all water soluble or water dispersible. The polymer containing oxazolinyl and the photosensitive monomer have a plurality of carbon-carbon double bonds. The polymer containing oxazolinyl and the photosensitive monomer are polymerized to form a dense cross-linking network structure when the water soluble photosensitive resin composition is exposed to ultraviolet radiation. A film using the water soluble photosensitive resin composition is also provided.
    Type: Grant
    Filed: August 30, 2017
    Date of Patent: September 24, 2019
    Assignee: Zhen Ding Technology Co., Ltd.
    Inventors: Chen-Feng Yen, Chang-Hung Lee, Yi-Fang Lin, Yen-Chin Hsiao, Shou-Jui Hsiang, Mao-Feng Hsu
  • Patent number: 10329368
    Abstract: A non-reactive photosensitive resin composition storable at room temperature comprises a carboxylic acid-modified bisphenol epoxy (meth)acrylate, a photosensitive monomer, a photosensitive prepolymer, a photo-initiator, and a coloring agent. Each of the carboxylic acid-modified bisphenol epoxy (meth)acrylate, photosensitive monomer, and photosensitive prepolymer has a plurality of carbon-carbon double bonds, so that the carboxylic acid-modified bisphenol epoxy (meth)acrylate, photosensitive monomer and photosensitive prepolymer may be polymerized to form a dense cross-linking network structure when the photosensitive resin composition is exposed to ultraviolet radiation. A film and a printed circuit board using the photosensitive resin composition are also provided.
    Type: Grant
    Filed: April 11, 2017
    Date of Patent: June 25, 2019
    Assignee: Zhen Ding Technology Co., Ltd.
    Inventors: Mao-Feng Hsu, Chen-Feng Yen, Shou-Jui Hsiang, Yen-Chin Hsiao
  • Publication number: 20180203350
    Abstract: A photosensitive resin composition which is non-reactive and thus storable at a normal temperatures includes 100 parts (by weight) of an epoxy acrylate, 10-50 parts acrylate monomers, 1-40 parts acrylate oligomers, 5-15 parts of a photoinitiator, 1-5 parts of a coloring agent, and 10-50 parts of a blocked polyisocyanate. A method of making and a printed circuit board made accordingly are also disclosed.
    Type: Application
    Filed: April 10, 2017
    Publication date: July 19, 2018
    Inventors: MAO-FENG HSU, CHEN-FENG YEN, SHOU-JUI HSIANG, YEN-CHIN HSIAO
  • Publication number: 20180188649
    Abstract: A non-toxic water soluble photosensitive resin composition able to function as a solder mask coating comprises a polymer containing oxazolinyl, a photosensitive monomer, and a photo-initiator. These elements are all water soluble or water dispersible. The polymer containing oxazolinyl and the photosensitive monomer have a plurality of carbon-carbon double bonds. The polymer containing oxazolinyl and the photosensitive monomer are polymerized to form a dense cross-linking network structure when the water soluble photosensitive resin composition is exposed to ultraviolet radiation. A film using the water soluble photosensitive resin composition is also provided.
    Type: Application
    Filed: August 30, 2017
    Publication date: July 5, 2018
    Applicants: Zhen Ding Technology Co., Ltd., Zhen Ding Technology Co., Ltd.
    Inventors: CHEN-FENG YEN, CHANG-HUNG LEE, YI-FANG LIN, YEN-CHIN HSIAO, SHOU-JUI HSIANG, MAO-FENG HSU
  • Publication number: 20170362361
    Abstract: A non-reactive photosensitive resin composition storable at room temperature comprises a carboxylic acid-modified bisphenol epoxy (meth)acrylate, a photosensitive monomer, a photosensitive prepolymer, a photo-initiator, and a coloring agent. Each of the carboxylic acid-modified bisphenol epoxy (meth)acrylate, photosensitive monomer, and photosensitive prepolymer has a plurality of carbon-carbon double bonds, so that the carboxylic acid-modified bisphenol epoxy (meth)acrylate, photosensitive monomer and photosensitive prepolymer may be polymerized to form a dense cross-linking network structure when the photosensitive resin composition is exposed to ultraviolet radiation. A film and a printed circuit board using the photosensitive resin composition are also provided.
    Type: Application
    Filed: April 11, 2017
    Publication date: December 21, 2017
    Inventors: MAO-FENG HSU, CHEN-FENG YEN, SHOU-JUI HSIANG, YEN-CHIN HSIAO
  • Publication number: 20170275508
    Abstract: A resin composition suitable as an adhesive layer and as a circuit board substrate includes an acrylic resin, a non-photosensitive resin with carboxyl groups, nano core-shell particles, a photoinitiator, and a solvent, such adhesive layer and circuit board substrate being high-strength and temperature-resistant whilst retaining flexibility. The acrylic resin is in an amount by weight of 150 parts in the resin composition, the non-photosensitive resin is in an amount by weight of 30 parts to 80 parts in the resin composition, the nano core-shell particles are in an amount by weight of 5 parts to 30 parts in the resin composition, and the photoinitiator is in an amount by weight of 1 part to 10 parts in the resin composition.
    Type: Application
    Filed: June 23, 2016
    Publication date: September 28, 2017
    Inventors: MAO-FENG HSU, CHEN-FENG YEN, YEN-CHIN HSIAO