Patents by Inventor Yen Chuo

Yen Chuo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20170309225
    Abstract: An OLED apparatus has an OLED driver for receiving display data from a processor. The processor gets OLED status information indicating attenuation or other status of OLED cells or related circuits. The processor calculates adjustment data according to the OLED status information and sends the adjustment data to the OLED driver. The OLED driver drives the OLED cells based on the adjustment data to overcome attenuation and other related problems.
    Type: Application
    Filed: April 21, 2016
    Publication date: October 26, 2017
    Inventors: Chih-Ta Star Sung, Yin-Chun Lan, Yen Chuo
  • Patent number: 9800825
    Abstract: A method of frame rate conversion includes receiving multiple input frames including a previous frame, a current frame and a next frame. A changing trend between the current frame and the previous frame is calculated. The current frame is used for generating one or more than one inserting frame according to the changing trend. The inserting frame is output after outputting the current frame to achieve frame conversion.
    Type: Grant
    Filed: March 2, 2015
    Date of Patent: October 24, 2017
    Inventors: Chih-Ta Star Sung, Yin-Chun Blue Lan, Yen Chuo, Chien-Hao Chiu
  • Publication number: 20160261823
    Abstract: A method of frame rate conversion includes receiving multiple input frames including a previous frame, a current frame and a next frame. A changing trend between the current frame and the previous frame is calculated. The current frame is used for generating one or more than one inserting frame according to the changing trend. The inserting frame is output after outputting the current frame to achieve frame conversion.
    Type: Application
    Filed: March 2, 2015
    Publication date: September 8, 2016
    Inventors: Chih-Ta Star Sung, Yin-Chun Blue Lan, Yen Chuo, Chien-Hao Chiu
  • Publication number: 20160133232
    Abstract: A method and an apparatus for processing an image are provided. A buffer is provided and separated into a series of storage units. Each storage unit has a fixed size. The image is divided into pixel groups, and each pixel group corresponds to one storage unit. Each pixel group is compressed by one of candidate compression methods to obtain compressed data so that the compressed data of each pixel group fits the corresponding storage unit.
    Type: Application
    Filed: November 6, 2014
    Publication date: May 12, 2016
    Inventors: Ko Hung Lin, Yen Chuo, Yin Chun Lan
  • Publication number: 20160119621
    Abstract: A method and an apparatus for processing an image are provided. A buffer is provided and separated into a series of storage units. Each storage unit has a fixed size. The image is divided into pixel groups, and each pixel group corresponds to one storage unit. Each pixel group is compressed by one of candidate compression methods to obtain compressed data so that the compressed data of each pixel group fits the corresponding storage unit.
    Type: Application
    Filed: October 27, 2014
    Publication date: April 28, 2016
    Inventors: Ko Hung Lin, Yen Chuo, Yin Chun Lan
  • Patent number: 8942490
    Abstract: A method of compressing an image is provided by saving compressed color components into temporary buffers. In different time slots, compressed color components are stored in different temporary buffer. When data in the temporary buffers reach a predetermined size, data are moved to a second buffer larger than the temporary buffers. When the second buffer stores a predetermined amount of data, data are moved to an external memory.
    Type: Grant
    Filed: July 8, 2008
    Date of Patent: January 27, 2015
    Inventors: Yin-Chun Blue Lan, Yen Chuo, Po-Chih Chang
  • Patent number: 8942473
    Abstract: A method and an apparatus for processing an image are provided. A buffer is provided and separated into a series of storage units. Each storage unit has a fixed size. The image is divided into pixel groups, and each pixel group corresponds to one storage unit. Each pixel group is compressed by one of candidate compression methods to obtain compressed data so that the compressed data of each pixel group fits the corresponding storage unit.
    Type: Grant
    Filed: July 25, 2012
    Date of Patent: January 27, 2015
    Inventors: Ko Hung Lin, Yen Chuo, Yin Chun Lan
  • Publication number: 20140029845
    Abstract: A method and an apparatus for processing an image are provided. A buffer is provided and separated into a series of storage units. Each storage unit has a fixed size. The image is divided into pixel groups, and each pixel group corresponds to one storage unit. Each pixel group is compressed by one of candidate compression methods to obtain compressed data so that the compressed data of each pixel group fits the corresponding storage unit.
    Type: Application
    Filed: July 25, 2012
    Publication date: January 30, 2014
    Inventors: Ko Hung Lin, Yen Chuo, Yin Chun Lan
  • Patent number: 8216877
    Abstract: A phase-change memory is provided. The phase-change memory comprises a substrate. A first electrode is formed on the substrate. A circular or linear phase-change layer is electrically connected to the first electrode. A second electrode formed on the phase-change layer and electrically connected to the phase-change layer, wherein at least one of the first electrode and the second electrode comprises phase-change material.
    Type: Grant
    Filed: April 5, 2011
    Date of Patent: July 10, 2012
    Assignee: Promos Technologies Inc.
    Inventors: Yen Chuo, Hong-Hui Hsu
  • Publication number: 20110177667
    Abstract: A phase-change memory is provided. The phase-change memory comprises a substrate. A first electrode is formed on the substrate. A circular or linear phase-change layer is electrically connected to the first electrode. A second electrode formed on the phase-change layer and electrically connected to the phase-change layer, wherein at least one of the first electrode and the second electrode comprises phase-change material.
    Type: Application
    Filed: April 5, 2011
    Publication date: July 21, 2011
    Inventors: Yen CHUO, Hong-Hui Hsu
  • Patent number: 7964862
    Abstract: Phase change memory devices and methods for manufacturing the same are provided. An exemplary embodiment of a phase change memory device includes a first electrode disposed in a first dielectric layer. A second dielectric layer is disposed over the first dielectric layer and the first electrode. A phase change material layer disposed in the second dielectric layer to electrically contact the first electrode. A third dielectric layer is disposed over the second dielectric layer. A second electrode is disposed in the third dielectric layer to electrically connect the phase change material layer and at least one gap disposed in the first dielectric layer or the second dielectric layer to thereby isolate portions of the phase change material layer and portions of the first or second dielectric layer adjacent thereto.
    Type: Grant
    Filed: March 26, 2008
    Date of Patent: June 21, 2011
    Assignee: Industrial Technology Research Institute
    Inventors: Frederick T Chen, Yen Chuo, Hong-Hui Hsu, Jyi-Tyan Yeh, Ming-Jinn Tsai
  • Patent number: 7868314
    Abstract: A phase change memory device and fabricating method are provided. A disk-shaped phase change layer is buried within the insulating material. A center via and ring via are formed by a lithography. The center via is located in the center of the phase change layer and passes through the phase change layer, and the ring via takes the center via as a center. A heating electrode within the center via performs Joule heating of the phase change layer, and the contact area between the phase change layer and the heating electrode is reduced by controlling the thickness of the phase change layer. Furthermore, a second electrode within the ring via dissipates the heat transmitted to the contact interface between the phase change layers, so as to avoid transmitting the heat to the etching boundary at the periphery of the phase change layer.
    Type: Grant
    Filed: August 26, 2009
    Date of Patent: January 11, 2011
    Assignee: Industrial Technology Research Institute
    Inventors: Wei-Su Chen, Yi-Chan Chen, Wen-Han Wang, Hong-Hui Hsu, Chien-Min Lee, Yen Chuo, Te-Sheng Chao, Min-Hung Lee
  • Patent number: 7835177
    Abstract: A phase change memory (PCM) cell fabricated by etching a tapered structure into a phase change layer, and planarizing a dielectric layer on the phase change layer until a tip of the tapered structure is exposed for contacting a heating electrode. Therefore, the area of the exposed tip of the phase change layer is controlled to be of an extremely small size, the contact area between the phase change layer and the heating electrode is reduced, thereby lowering the operation current.
    Type: Grant
    Filed: July 27, 2006
    Date of Patent: November 16, 2010
    Assignee: Industrial Technology Research Institute
    Inventors: Hong-Hui Hsu, Chien-Min Lee, Wen-Han Wang, Min-Hung Lee, Te-Sheng Chao, Yen Chuo, Yi-Chan Chen, Wei-Su Chen
  • Publication number: 20100140583
    Abstract: A phase change memory device and fabricating method are provided. A disk-shaped phase change layer is buried within the insulating material. A center via and ring via are formed by a lithography. The center via is located in the center of the phase change layer and passes through the phase change layer, and the ring via takes the center via as a center. A heating electrode within the center via performs Joule heating of the phase change layer, and the contact area between the phase change layer and the heating electrode is reduced by controlling the thickness of the phase change layer. Furthermore, a second electrode within the ring via dissipates the heat transmitted to the contact interface between the phase change layers, so as to avoid transmitting the heat to the etching boundary at the periphery of the phase change layer.
    Type: Application
    Filed: August 26, 2009
    Publication date: June 10, 2010
    Applicant: Industrial Technology Research Institute
    Inventors: Wei-Su Chen, Yi-Chan Chen, Wen-Han Wang, Hong-Hui Hsu, Chien-Min Lee, Yen Chuo, Te-Sheng Chao, Min-Hung Lee
  • Publication number: 20100008571
    Abstract: A method of compressing an image by saving the compressed color components into multiple temporary buffers with each time slot saving the color component to the different buffer. The difference between the input data and the output data.
    Type: Application
    Filed: July 8, 2008
    Publication date: January 14, 2010
    Inventors: Yin-Chun Blue Lan, Yen Chuo, Po-Chih Chang
  • Patent number: 7626191
    Abstract: A lateral phase change memory with spacer electrodes and method of manufacturing the same are provided. The memory is formed by connecting the conductive electrodes with lower resistivity and the spacer electrodes with higher resistivity, and filling the phase change material between the spacer electrodes. Therefore, the area that the phase change material contacts the spacer electrodes and the volume of the phase change material can be reduced; thereby the programming current and power consumption of the phase change memory are reduced.
    Type: Grant
    Filed: May 17, 2006
    Date of Patent: December 1, 2009
    Assignee: Industrial Technology Research Institute
    Inventors: Te-Sheng Chao, Wen-Han Wang, Min-Hung Lee, Hong-Hui Hsu, Chien-Min Lee, Yen Chuo, Yi-Chan Chen, Wei-Su Chen
  • Patent number: 7598113
    Abstract: A phase change memory device and fabricating method are provided. A disk-shaped phase change layer is buried within the insulating material. A center via and ring via are formed by a lithography. The center via is located in the center of the phase change layer and passes through the phase change layer, and the ring via takes the center via as a center. A heating electrode within the center via performs Joule heating of the phase change layer, and the contact area between the phase change layer and the heating electrode is reduced by controlling the thickness of the phase change layer. Furthermore, a second electrode within the ring via dissipates the heat transmitted to the contact interface between the phase change layers, so as to avoid transmitting the heat to the etching boundary at the periphery of the phase change layer.
    Type: Grant
    Filed: June 30, 2006
    Date of Patent: October 6, 2009
    Assignee: Industrial Technology Research Institute
    Inventors: Wei-Su Chen, Yi-Chan Chen, Wen-Han Wang, Hong-Hui Hsu, Chien-Min Lee, Yen Chuo, Te-Sheng Chao, Min-Hung Lee
  • Publication number: 20080265238
    Abstract: Phase change memory devices and methods for manufacturing the same are provided. An exemplary embodiment of a phase change memory device includes a first electrode disposed in a first dielectric layer. A second dielectric layer is disposed over the first dielectric layer and the first electrode. A phase change material layer disposed in the second dielectric layer to electrically contact the first electrode. A third dielectric layer is disposed over the second dielectric layer. A second electrode is disposed in the third dielectric layer to electrically connect the phase change material layer and at least one gap disposed in the first dielectric layer or the second dielectric layer to thereby isolate portions of the phase change material layer and portions of the first or second dielectric layer adjacent thereto.
    Type: Application
    Filed: March 26, 2008
    Publication date: October 30, 2008
    Applicants: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE, POWERCHIP SEMICONDUCTOR CORP., NANYA TECHNOLOGY CORPORATION, PROMOS TECHNOLOGIES INC., WINBOND ELECTRONICS CORP.
    Inventors: Frederick T. Chen, Yen Chuo, Hong-Hui Hsu, Jyi-Tyan Yeh, Ming-Jinn Tsai
  • Publication number: 20080203374
    Abstract: A phase-change memory is provided. The phase-change memory comprises a substrate. A first electrode is formed on the substrate. A circular or linear phase-change layer is electrically connected to the first electrode. A second electrode formed on the phase-change layer and electrically connected to the phase-change layer, wherein at least one of the first electrode and the second electrode comprises phase-change material.
    Type: Application
    Filed: January 30, 2008
    Publication date: August 28, 2008
    Applicants: Industrial Technology Research Institute, Powerchip Semiconductor Corp., NANYA TECHNOLOGY CORPORATION, ProMOS Technologies Inc., Winbond Electronics Corp.
    Inventors: Yen Chuo, Hong-Hui Hsu
  • Publication number: 20080186762
    Abstract: A phase-change memory is provided. The phase-change memory comprises first and second electrodes, wherein the first and second electrodes comprise phase-change material. A conductive path is formed between the first and second electrodes and electrically connects the first and second electrodes, wherein the conductive path comprises an embedded metal layer and a phase-change layer resulting in current from the first electrode to the second electrode or from the second electrode to the first electrode passing through the embedded metal layer and the phase change layer.
    Type: Application
    Filed: January 29, 2008
    Publication date: August 7, 2008
    Applicants: Industrial Technology Research Institute, Powerchip Semiconductor Corp., NANYA TECHNOLOGY CORPORATION, ProMOS Technologies Inc., Windbond Electronics Corp.
    Inventors: Yen Chuo, Frederick T. Chen