Patents by Inventor Yen-Hsi Lee

Yen-Hsi Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11953877
    Abstract: Manufacturing of a shoe or a portion of a shoe is enhanced by executing various shoe-manufacturing processes in an automated fashion. For example, information describing a shoe part may be determined, such as an identification, an orientation, a color, a surface topography, an alignment, a size, etc. Based on the information describing the shoe part, automated shoe-manufacturing apparatuses may be instructed to apply various shoe-manufacturing processes to the shoe part, such as a pickup and placement of the shoe part with a pickup tool.
    Type: Grant
    Filed: October 20, 2022
    Date of Patent: April 9, 2024
    Assignee: NILE, Inc.
    Inventors: Dragan Jurkovic, Patrick Conall Regan, Chih-Chi Chang, Chang-chu Liao, Ming-Feng Jean, Kuo-Hung Lee, Yen-Hsi Liu, Hung-Yu Wu
  • Patent number: 9544506
    Abstract: An image processing method includes acquiring a first image during a first exposure time, and a second image during a second exposure time, wherein the first exposure time is smaller than the second exposure time; acquiring the image region with the luminance greater than a first threshold in the second image as a first over-exposure region; acquiring the image region located at corresponding positions of the first over-exposure region and in the first image as a second over-exposure region; comparing the second over-exposure region and the first over-exposure region, for acquiring a first moving-object region; excluding the first moving-object region from the second over-exposure region, to generate a third over-exposure region; acquiring the image region located at corresponding positions of the third over-exposure region and in the second image as a fourth over-exposure region; and combining the third over-exposure region and the fourth over-exposure region.
    Type: Grant
    Filed: August 26, 2015
    Date of Patent: January 10, 2017
    Assignee: NOVATEK Microelectronics Corp.
    Inventors: Kai-Wen Wang, Qingjie Chen, Shaoxiong Li, Yen-Hsi Lee, Jia-Xiu Liu
  • Publication number: 20090021526
    Abstract: A determination method for white-point and a correction method of the white balance are disclosed. In the determination method for white-point of the white balance, first gray cards with different reflection coefficients are detected according to the properties of an image sensing device. Next, the white-point gray line of a first color temperature and the white-point gray line of a second color temperature are intersected on a white-point plane to form a fan area, so as to set the white-point range of the low saturation of the image sensing device. Next, the vertical projection for an image datum is calculated to obtain a placement datum on the white-point plane, and a difference value between the image datum and the placement datum is calculated. Finally, whether the image datum is a white-point is determined according to the difference value and relationship between the placement datum and the fan area.
    Type: Application
    Filed: October 31, 2007
    Publication date: January 22, 2009
    Applicant: NOVATEK MICROELECTRONICS CORP.
    Inventors: Ming-Feng Chiang, Yen-Hsi Lee, Chia-Ho Lin, Chih-Yuan Yang