Patents by Inventor Yen-Ni Lin

Yen-Ni Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240085739
    Abstract: A wavelength conversion element including a substrate, a blocking wall structure layer, and a wavelength conversion layer is provided. The blocking wall structure layer is disposed on a surface of the substrate and defines multiple microgrooves. Reflectivity of the blocking wall structure layer is in a range of 1% to 99%. The wavelength conversion layer is disposed in the microgrooves and includes multiple wavelength conversion particles. A height of the blocking wall structure layer along a normal direction of the surface of the substrate is greater than a height of the wavelength conversion layer along the normal direction of the surface of the substrate. A backlight module adopting the wavelength conversion element is also provided.
    Type: Application
    Filed: September 4, 2023
    Publication date: March 14, 2024
    Applicant: Nano Precision Taiwan Limited
    Inventors: Ching-Nan Chuang, Hung-Tse Lin, Ming-Dah Liu, Yen-Ni Lin
  • Patent number: 11774065
    Abstract: A quantum dot composition includes a matrix resin, a quantum dot phosphor, and a polysilane polymer. The matrix resin includes epoxy-fluorene copolymer acrylic resin represented by Formula 1: Formula 1. In Formula 1, R1 and R4 each is independently hydrogen or a C1-C12 long alkyl carbon chain. R2 and R3 each is independently a is an integer from 1 to 10, and b and c each is independently an integer from 0 to 10. X is 0.1 to 0.9. A color conversion film including the quantum dot composition and a backlight module using the color conversion film are also provided.
    Type: Grant
    Filed: July 20, 2021
    Date of Patent: October 3, 2023
    Assignee: Nano Precision Taiwan Limited
    Inventors: Ching-Nan Chuang, Yen-Ni Lin, Shih-Yuan Liu
  • Publication number: 20220033707
    Abstract: A quantum dot composition includes a matrix resin, a quantum dot phosphor, and a polysilane polymer. The matrix resin includes epoxy-fluorene copolymer acrylic resin represented by Formula 1: Formula 1. In Formula 1, R1 and R4 each is independently hydrogen or a C1-C12 long alkyl carbon chain. R2 and R3 each is independently a is an integer from 1 to 10, and b and c each is independently an integer from 0 to 10. X is 0.1 to 0.9. A color conversion film including the quantum dot composition and a backlight module using the color conversion film are also provided.
    Type: Application
    Filed: July 20, 2021
    Publication date: February 3, 2022
    Applicant: Nano Precision Taiwan Limited
    Inventors: Ching-Nan Chuang, Yen-Ni Lin, Shih-Yuan Liu