Patents by Inventor Yen-Shih Wang

Yen-Shih Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods for preparing void-free coatings for plasma treatment components
    Patent number: 11875973
    Abstract: Methods for preparing a void-free protective coating are disclosed herein. The void-free protective coating is used on a dielectric window having a central hole, which is used in a plasma treatment tool. A first protective coating layer is applied to the window, leaving an uncoated annular retreat area around the central hole. The first protective coating layer is polished to produce a flat surface and fill in any voids on the window. A second protective coating layer is then applied upon the flat surface of the first protective coating layer to obtain the void-free coating. This increases process uptime and service lifetime of the dielectric window and the plasma treatment tool.
    Type: Grant
    Filed: February 8, 2022
    Date of Patent: January 16, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Shih-Tsung Chen, Tsung-Cheng Ho, Chien-Yu Wang, Yen-Shih Wang, Jiun-Rong Pai, Yeh-Chieh Wang
  • METHODS FOR PREPARING VOID-FREE COATINGS FOR PLASMA TREATMENT COMPONENTS
    Publication number: 20230367339
    Abstract: Methods for preparing a void-free protective coating are disclosed herein. The void-free protective coating is used on a dielectric window having a central hole, which is used in a plasma treatment tool. A first protective coating layer is applied to the window, leaving an uncoated annular retreat area around the central hole. The first protective coating layer is polished to produce a flat surface and fill in any voids on the window. A second protective coating layer is then applied upon the flat surface of the first protective coating layer to obtain the void-free coating. This increases process uptime and service lifetime of the dielectric window and the plasma treatment tool.
    Type: Application
    Filed: July 26, 2023
    Publication date: November 16, 2023
    Inventors: Shih-Tsung Chen, Yeh-Chieh Wang, Yen-Shih Wang, Chien-Yu Wang, Jiun-Rng Pai, Tsung-Cheng Ho
  • METHODS FOR PREPARING VOID-FREE COATINGS FOR PLASMA TREATMENT COMPONENTS
    Publication number: 20230025296
    Abstract: Methods for preparing a void-free protective coating are disclosed herein. The void-free protective coating is used on a dielectric window having a central hole, which is used in a plasma treatment tool. A first protective coating layer is applied to the window, leaving an uncoated annular retreat area around the central hole. The first protective coating layer is polished to produce a flat surface and fill in any voids on the window. A second protective coating layer is then applied upon the flat surface of the first protective coating layer to obtain the void-free coating. This increases process uptime and service lifetime of the dielectric window and the plasma treatment tool.
    Type: Application
    Filed: February 8, 2022
    Publication date: January 26, 2023
    Inventors: Shih-Tsung Chen, Tsung-Cheng Ho, Chien-Yu Wang, Yen-Shih Wang, Jiun-Rong Pai, Yeh-Chieh Wang