Patents by Inventor Yen-Wei Li

Yen-Wei Li has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Low dropout regulator circuits, input/output device, and methods for operating a low dropout regulator
    Patent number: 11966241
    Abstract: A circuit includes a voltage divider circuit configured to generate a feedback voltage according to an output voltage, an operational amplifier configured to output a driving signal according to the feedback voltage and a reference voltage and a pass gate circuit including multiple current paths. The current paths are controlled by the driving signal and connected in parallel between the voltage divider circuit and a power reference node.
    Type: Grant
    Filed: February 11, 2022
    Date of Patent: April 23, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Huan-Neng Chen, Yen-Lin Liu, Chia-Wei Hsu, Jo-Yu Wu, Chang-Fen Hu, Shao-Yu Li, Bo-Ting Chen
  • METHODS OF PRODUCING NARONAPRIDE TRIHYDRATE
    Publication number: 20210355116
    Abstract: Provided herein are methods of producing the trihydrate form of (3S, 4R, 3?R)-6-[4-(4-amino-5-chloro-2-methoxy-benzoylamino)-3-methoxy-piperidin-1-yl]-hexanoic acid 1-azabicyclo[2.2.2]oct-3?-yl ester di-hydrochloride salt.
    Type: Application
    Filed: April 30, 2021
    Publication date: November 18, 2021
    Inventors: Pascal Jean DRUZGALA, Peter MILNER, Jien Heh TIEN, Jinun-Ban YEH, Yen-Wei LI, Yen-Chi SU
  • Process for preparation of optically pure -substituted-3-methoxypropionic acid derivatives
    Patent number: 9718765
    Abstract: A method of producing optically pure N-substituted-3-methoxy propionic acid is provided, which includes the steps of: reacting N-substituted-3-methoxy propionic acid represented by formula (III): with a chiral amine in a solvent to obtain a diastereomeric salt represented by formula (IV): subjecting the diastereomeric salt to a sequential washing process to obtain the optically pure N-substituted-3-methoxy propionic acid represented by one of formulae (Ia) and (Ib): wherein R1 is selected from the group consisting of C1-5 alkyl, C1-6 alkoxy and C6-10 aryloxy group, and R2 is selected from the group consisting of C2-5 alkyl, C6-8 cycloalkyl and C6-10 aryl.
    Type: Grant
    Filed: June 21, 2016
    Date of Patent: August 1, 2017
    Assignee: SCI Pharmtech, Inc.
    Inventors: Bo-Fong Chen, Yen-Chi Su, Yen-Wei Li, Feng-Hsu Li, Chen-Wei Huang
  • Preparation of Duloxetine® hydrochloride using optically active methylhydroxylaminopropanol compound as an intermediate
    Patent number: 8957227
    Abstract: The present invention provides a process for preparing duloxetine hydrochloride with higher yield and lower cost.
    Type: Grant
    Filed: August 29, 2013
    Date of Patent: February 17, 2015
    Assignee: SCI Pharmtech, Inc.
    Inventors: Bo-Fong Chen, Feng-Ju Lu, Jinun-Ban Yeh, Wei-Chyun Wong, Feng-hsu Li, Yen-Wei Li, Yeh-Chi Su
  • PREPARATION OF DULOXETINE HYDROCHLORIDE USING OPTICALLY ACTIVE METHYLHYDROXYLAMINOPROPANOL COMPOUND AS AN INTERMEDIATE
    Publication number: 20140005414
    Abstract: The present invention provides a process for preparing duloxetine hydrochloride with higher yield and lower cost.
    Type: Application
    Filed: August 29, 2013
    Publication date: January 2, 2014
    Applicant: SCI Pharmtech, Inc.
    Inventors: Bo-Fong Chen, Feng-Ju Lu, Jinun-Ban Yeh, Wei-Chyun Wong, Feng-hsu Li, Yen-Wei Li, Yeh-Chi Su