Patents by Inventor Yen-Hsun Chen
Yen-Hsun Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240203738Abstract: A device includes gate spacers over a substrate, and a gate structure between the gate spacers. The gate structure includes an interfacial layer over the substrate, a metal oxide layer over the interfacial layer, a metal oxide layer over the interfacial layer, a first metal nitride layer over the metal oxide layer, a second metal nitride over the first metal nitride layer, and a tungsten-containing material interposing the first metal nitride layer and the second metal nitride layer.Type: ApplicationFiled: February 27, 2024Publication date: June 20, 2024Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Yen-Yu CHEN, Yu-Chi LU, Chih-Pin TSAO, Shih-Hsun CHANG
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Patent number: 12005090Abstract: Disclosed herein is a probiotic composition including Lactobacillus salivarius subsp. salicinius AP-32 that is deposited at the China Center for Type Culture Collection (CCTCC) under an accession number CCTCC M 2011127, and Bifidobacterium longum subsp. longum OLP-01 that is deposited at the China General Microbiological Culture Collection Center (CGMCC) under an accession number CGMCC 17345. Also disclosed herein are use of at least one of the abovementioned lactic acid bacterial strains for treating obesity and/or an obesity-related disorder, and for inhibiting fat absorption.Type: GrantFiled: October 1, 2021Date of Patent: June 11, 2024Assignee: GLAC BIOTECH CO., LTD.Inventors: Hsieh-Hsun Ho, Ching-Wei Chen, Yu-Fen Huang, Yi-Wei Kuo, Wen-Yang Lin, Yen-Yu Huang
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Publication number: 20240181568Abstract: A method for producing graphene, configured for forming a graphene layer on a surface of an object. The method includes steps of: depositing a poly-p-xylene material layer on the surface: and converting the poly-p-xylene material layer into a graphene layer by using a laser sintering process or a plasma-assisted sintering process.Type: ApplicationFiled: March 3, 2023Publication date: June 6, 2024Inventors: Yun-Wei TSAI, Hsien-Yeh CHEN, Shu-Man HU, Chin-Yun LEE, Yi-Chang WU, Yen-Hsun LIN, Kuo-Wei TSAO, Chi-Liang TSAI
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Patent number: 11982936Abstract: A method of fabricating a photomask includes selectively exposing portions of a photomask blank to radiation to change an optical property of the portions of the photomask blank exposed to the radiation, thereby forming a pattern of exposed portions of the photomask blank and unexposed portions of the photomask blank. The pattern corresponds to a pattern of semiconductor device features.Type: GrantFiled: June 30, 2022Date of Patent: May 14, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Hsin-Chang Lee, Ping-Hsun Lin, Yen-Cheng Ho, Chih-Cheng Lin, Chia-Jen Chen
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Patent number: 11948800Abstract: A device includes a pair of gate spacers on a substrate, and a gate structure on the substrate and between the gate spacers. The gate structure includes an interfacial layer, a metal oxide layer, a nitride-containing layer, a tungsten-containing layer, and a metal compound layer. The interfacial layer is over the substrate. The metal oxide layer is over the interfacial layer. The nitride-containing layer is over the metal oxide layer. The tungsten-containing layer is over the nitride-containing layer. The metal compound layer is over the tungsten-containing layer. The metal compound layer has a different material than a material of the tungsten-containing layer.Type: GrantFiled: December 14, 2022Date of Patent: April 2, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Yen-Yu Chen, Yu-Chi Lu, Chih-Pin Tsao, Shih-Hsun Chang
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Publication number: 20230280664Abstract: A reticle carrier described herein is configured to quickly discharge the residual charge on a reticle so as to reduce, minimize, and/or prevent particles in the reticle carrier from being attracted to and/or transferred to the reticle. In particular, the reticle carrier may be configured to provide reduced capacitance between an inner baseplate of the reticle carrier and the reticle. The reduction in capacitance may reduce the resistance-capacitance (RC) time constant for discharging the residual charge on the reticle, which may increase the discharge speed for discharging the residual charge through support pins of the reticle carrier. The increase in discharge speed may reduce the likelihood that an electrostatic force in the reticle carrier may attract particles in the reticle carrier to the reticle.Type: ApplicationFiled: May 12, 2023Publication date: September 7, 2023Inventors: Yen-Hsun CHEN, Yi-Zhen CHEN, Jhan-Hong YEH, Han-Lung CHANG, Tzung-Chi FU, Li-Jui CHEN
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Patent number: 11728675Abstract: A power supply apparatus is coupled to an AC power source, a critical load, and a general load. The power supply apparatus includes a UPS, a generator system, a power conversion system, and a controller. The power conversion system includes a first power conversion path and a second power conversion path. The first power conversion path is connected to the critical load and an output side, and the second power conversion path is connected to the general load and an input side. The first power conversion path and the second power conversion path are jointly connected to a DC bus. When the controller determines that the AC power source is abnormal, the controller controls disconnecting the AC power source, and activates the UPS to supply power to the critical load so as to enable the first power conversion path and disable the second power conversion path.Type: GrantFiled: April 14, 2022Date of Patent: August 15, 2023Assignee: DELTA ELECTRONICS, INC.Inventors: Kai-Wei Hu, Yen-Hsun Chen, Chia-Tse Lee, Lei-Chung Hsing
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Patent number: 11698591Abstract: An EUV photolithography system utilizes a baseplate of an EUV pod to unload an EUV reticle from a chuck within an EUV scanner. The baseplate includes a top surface and support pins extending from the top surface. The when the reticle is unloaded onto the baseplate, the support pins hold the reticle at relatively large distance from the top surface of the baseplate. The support pins have a relatively low resistance. The large distance and low resistance help ensure that particles do not travel from the baseplate to the reticle during unloading.Type: GrantFiled: August 31, 2021Date of Patent: July 11, 2023Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Yi-Zhen Chen, Yen-Hsun Chen, Jhan-Hong Yeh, Tzung-Chi Fu, Han-Lung Chang, Li-Jui Chen
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Patent number: 11687011Abstract: A reticle carrier described herein is configured to quickly discharge the residual charge on a reticle so as to reduce, minimize, and/or prevent particles in the reticle carrier from being attracted to and/or transferred to the reticle. In particular, the reticle carrier may be configured to provide reduced capacitance between an inner baseplate of the reticle carrier and the reticle. The reduction in capacitance may reduce the resistance-capacitance (RC) time constant for discharging the residual charge on the reticle, which may increase the discharge speed for discharging the residual charge through support pins of the reticle carrier. The increase in discharge speed may reduce the likelihood that an electrostatic force in the reticle carrier may attract particles in the reticle carrier to the reticle.Type: GrantFiled: August 30, 2021Date of Patent: June 27, 2023Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Yen-Hsun Chen, Yi-Zhen Chen, Jhan-Hong Yeh, Han-Lung Chang, Tzung-Chi Fu, Li-Jui Chen
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Patent number: 11644759Abstract: An extreme ultraviolet radiation source apparatus includes a chamber including at least a droplet generator, a nozzle of the droplet generator, and a dry ice blasting assembly. The droplet generator includes a reservoir for a molten metal, and the nozzle has a first end connected to the reservoir and a second opposing end where molten metal droplets emerge from the nozzle. The dry ice blasting assembly includes a blasting nozzle, a blasting air inlet and a blaster carbon dioxide (CO2) inlet. The blasting nozzle is disposed inside the chamber. The blasting nozzle is arranged to direct a pressurized air stream and dry ice particles at the nozzle of the droplet generator.Type: GrantFiled: June 7, 2021Date of Patent: May 9, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Yen-Hsun Chen, Ming-Hsun Tsai, Shao-Hua Wang, Han-Lung Chang, Li-Jui Chen, Chia-Chen Chen
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Publication number: 20230064313Abstract: A system and method for management of heterogeneous bare metal servers is disclosed. The system includes target bare metal servers coupled to a network and an administrative server. The administrative server executes a framework for managing the bare metal servers. The framework includes unified APIs for performance of management functions. A recognition engine receives identification information from the server and selects a driver from a driver library based on the identification information. Each of the drivers in the driver library is associated with a different type of bare metal server. A driver loader loads the selected driver to translate the unified APIs to native APIs on the bare metal server to perform the management function on the server.Type: ApplicationFiled: July 25, 2022Publication date: March 2, 2023Inventors: Yen-Hsun CHEN, Chiun-Yu KUO, Tong-Pai HUANG, Chia-Jui LEE
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Publication number: 20230062852Abstract: A reticle carrier described herein is configured to quickly discharge the residual charge on a reticle so as to reduce, minimize, and/or prevent particles in the reticle carrier from being attracted to and/or transferred to the reticle. In particular, the reticle carrier may be configured to provide reduced capacitance between an inner baseplate of the reticle carrier and the reticle. The reduction in capacitance may reduce the resistance-capacitance (RC) time constant for discharging the residual charge on the reticle, which may increase the discharge speed for discharging the residual charge through support pins of the reticle carrier. The increase in discharge speed may reduce the likelihood that an electrostatic force in the reticle carrier may attract particles in the reticle carrier to the reticle.Type: ApplicationFiled: August 30, 2021Publication date: March 2, 2023Inventors: Yen-Hsun CHEN, Yi-Zhen CHEN, Jhan-Hong YEH, Han-Lung CHANG, Tzung-Chi FU, Li-Jui CHEN
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Publication number: 20230060598Abstract: An EUV photolithography system utilizes a baseplate of an EUV pod to unload an EUV reticle from a chuck within an EUV scanner. The baseplate includes a top surface and support pins extending from the top surface. The when the reticle is unloaded onto the baseplate, the support pins hold the reticle at relatively large distance from the top surface of the baseplate. The support pins have a relatively low resistance. The large distance and low resistance help ensure that particles do not travel from the baseplate to the reticle during unloading.Type: ApplicationFiled: August 31, 2021Publication date: March 2, 2023Inventors: Yi-Zhen CHEN, Yen-Hsun CHEN, Jhan-Hong YEH, Tzung-Chi FU, Han-Lung CHANG, Li-Jui CHEN
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Publication number: 20230006465Abstract: A power supply apparatus is coupled to an AC power source, a critical load, and a general load. The power supply apparatus includes a UPS, a generator system, a power conversion system, and a controller. The power conversion system includes a first power conversion path and a second power conversion path. The first power conversion path is connected to the critical load and an output side, and the second power conversion path is connected to the general load and an input side. The first power conversion path and the second power conversion path are jointly connected to a DC bus. When the controller determines that the AC power source is abnormal, the controller controls disconnecting the AC power source, and activates the UPS to supply power to the critical load so as to enable the first power conversion path and disable the second power conversion path.Type: ApplicationFiled: April 14, 2022Publication date: January 5, 2023Inventors: Kai-Wei HU, Yen-Hsun CHEN, Chia-Tse LEE, Lei-Chung HSING
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Publication number: 20220416203Abstract: The disclosure provides an electronic device, including a display panel, an infrared light source, and an infrared cutoff layer. The display panel includes a display surface, a back surface opposite to the display surface, and a side surface connecting the display surface and the back surface. The infrared light source is disposed adjacent to the side surface of the display panel and is configured to emit infrared light. The display panel includes an overlapping region in which the infrared light source overlaps with the side surface as viewed from a side view. The infrared cutoff layer is attached to the side surface and the back surface of the display panel, and covers at least the overlapping region and an extension region in which the overlapping region extends respectively in a transverse direction and toward the back surface by a preset distance.Type: ApplicationFiled: June 8, 2022Publication date: December 29, 2022Applicant: ASUSTeK COMPUTER INC.Inventors: Chin-An Tseng, Kun-Chan Lee, Yen-Hsun Chen, Hong-Bin Liu
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Publication number: 20220390291Abstract: A temperature detection device includes plural thermistors, a voltage source and plural temperature detection circuits. The first terminals of the thermistors are electrically connected with a common node. The voltage source is electrically connected with the common node directly. Each temperature detection circuit includes a voltage divider and a differential amplifier circuit. The voltage divider includes a first resistor and a second resistor. A first terminal of the first resistor is connected with the common node. A second terminal of the first resistor is connected with a first terminal of the second resistor and the second terminal of the corresponding thermistor. The second terminal of the second resistor is electrically connected with a ground terminal. The differential amplifier circuit includes a first input terminal connected with the first terminal of the first resistor, a second input terminal connected with the second terminal of the first resistor, and an output terminal.Type: ApplicationFiled: December 28, 2021Publication date: December 8, 2022Inventors: Cheng-Te Li, Chih-Yuan Chuang, Yen-Hsun Chen
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Patent number: 11153958Abstract: An extreme ultraviolet (EUV) lithography method includes causing a first metallic droplet to move along a shroud and through an aperture of the shroud at a first velocity, and adjusting an open area of the aperture of the shroud. After adjusting the open area of the aperture of the shroud, a second metallic droplet is caused to move along the shroud and through the aperture of the shroud at a second velocity, in which the second velocity is different from the first velocity.Type: GrantFiled: September 14, 2020Date of Patent: October 19, 2021Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Ming-Hsun Tsai, Han-Lung Chang, Yen-Hsun Chen, Shao-Hua Wang, Li-Jui Chen, Po-Chung Cheng
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Patent number: 11134558Abstract: A droplet generator assembly includes a storage tank, a refill system, a droplet generator, and a temperature control system. The storage tank is configured to store a target material. The refill system is connected to the storage tank. The droplet generator includes a reservoir and a nozzle connected to the reservoir, in which the droplet generator is connected to the refill system, and the refill system is configured to deliver the target material to the reservoir. The temperature control system is adjacent to the refill system or the reservoir.Type: GrantFiled: July 11, 2019Date of Patent: September 28, 2021Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Shih-Yu Tu, Yu-Kuang Sun, Shao-Hua Wang, Han-Lung Chang, Hsiao-Lun Chang, Li-Jui Chen, Po-Chung Cheng, Cheng-Hao Lai, Hsin-Feng Chen, Wei-Shin Cheng, Ming-Hsun Tsai, Yen-Hsun Chen
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Publication number: 20210294226Abstract: An extreme ultraviolet radiation source apparatus includes a chamber including at least a droplet generator, a nozzle of the droplet generator, and a dry ice blasting assembly. The droplet generator includes a reservoir for a molten metal, and the nozzle has a first end connected to the reservoir and a second opposing end where molten metal droplets emerge from the nozzle. The dry ice blasting assembly includes a blasting nozzle, a blasting air inlet and a blaster carbon dioxide (CO2) inlet. The blasting nozzle is disposed inside the chamber. The blasting nozzle is arranged to direct a pressurized air stream and dry ice particles at the nozzle of the droplet generator.Type: ApplicationFiled: June 7, 2021Publication date: September 23, 2021Inventors: Yen-Hsun CHEN, Ming-Hsun TSAI, Shao-Hua WANG, Han-Lung CHANG, Li-Jui CHEN, Chia-Chen CHEN
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Patent number: 11029613Abstract: An extreme ultraviolet radiation source apparatus includes a chamber including at least a droplet generator, a nozzle of the droplet generator, and a dry ice blasting assembly. The droplet generator includes a reservoir for a molten metal, and the nozzle has a first end connected to the reservoir and a second opposing end where molten metal droplets emerge from the nozzle. The dry ice blasting assembly includes a blasting nozzle, a blasting air inlet and a blaster carbon dioxide (CO2) inlet. The blasting nozzle is disposed inside the chamber. The blasting nozzle is arranged to direct a pressurized air stream and dry ice particles at the nozzle of the droplet generator.Type: GrantFiled: July 20, 2020Date of Patent: June 8, 2021Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Yen-Hsun Chen, Ming-Hsun Tsai, Shao-Hua Wang, Han-Lung Chang, Li-Jui Chen, Chia-Chen Chen