Patents by Inventor Yeo-Hwang Kim

Yeo-Hwang Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of measuring on-resistance in backside drain wafer
    Patent number: 7859291
    Abstract: A method of measuring on-resistance in a backside drain wafer includes providing a wafer having a first MOS transistor and a second MOS transistor each having a source and also sharing a drain provided at a backside of the wafer, and then forming a current flow path passing through the first and second MOS transistors, and then measuring a resistance between the sources of the first and second MOS transistors. Accordingly, an on-resistance in a backside drain wafer can be measured without using a chuck.
    Type: Grant
    Filed: November 29, 2008
    Date of Patent: December 28, 2010
    Assignee: Dongbu HiTek Co., Ltd.
    Inventor: Yeo-Hwang Kim
  • METHOD OF MEASURING ON-RESISTANCE IN BACKSIDE DRAIN WAFER
    Publication number: 20090140763
    Abstract: A method of measuring on-resistance in a backside drain wafer includes providing a wafer having a first MOS transistor and a second MOS transistor each having a source and also sharing a drain provided at a backside of the wafer, and then forming a current flow path passing through the first and second MOS transistors, and then measuring a resistance between the sources of the first and second MOS transistors. Accordingly, an on-resistance in a backside drain wafer can be measured without using a chuck.
    Type: Application
    Filed: November 29, 2008
    Publication date: June 4, 2009
    Inventor: Yeo-Hwang Kim