Abstract: A method for manufacturing an image sensor that does not include a reflow process but includes exposing a photoresist film a plurality of times from various angles and then forming one or more micro lenses by developing the exposed photoresist film.

Abstract: A mask according to embodiments includes a substrate and a phase delay material layer formed over the substrate. At least one mask pattern including a hole pattern may be formed on the phase delay material layer, the hole pattern allowing light to pass through the mask pattern. Assist patterns compensate for constructive interference of the light occurring between the mask patterns. Embodiments may prevent sidelobes from occurring by inserting an assist pattern into a mask, so that defects in semiconductor devices can be prevented.

Abstract: Embodiments relate to a mask used for manufacturing a semiconductor device and a method for manufacturing the same. The mask includes a first and second region formed on a semiconductor mask. First and second mask patterns may be formed in the first and second regions and aligned at first and second intervals. One or more auxiliary patterns, which may have a width of about 10 nm to 70 nm, may be aligned adjacent to the second mask patterns. The auxiliary patterns are added to the mask so that desired patterns are achieved regardless of the type of patterns, including high-density patterns, intermediate-density patterns, isolation patterns, and asymmetrical patterns.

Abstract: A method of manufacturing a photomask for forming micro-patterns on a semiconductor device including detecting a shifter-pattern area that encounters a side lobe in a photomask composed of a mask substrate and a shifter pattern deposited on the mask substrate; and forming at least one side lobe-prevention contact hole in the detected shifter-pattern area.

Abstract: A mask for forming a microlens pattern and a CMOS image sensor manufactured using the mask for forming a microlens pattern is provided. The mask includes a transparent substrate, a plurality of light-blocking layers, and a dummy pattern. The plurality of light-blocking layers are formed on the transparent substrate to define microlens regions of an image sensor, and the dummy pattern is formed between the plurality of light-blocking layers. The dummy pattern can be formed between corners of four adjacent light-blocking layers.