Abstract: A display device includes a substrate including a display region and a peripheral region, display structures at the display region of the substrate, a plurality of blocking structures at the peripheral region of the substrate wherein the blocking structures have heights different from each other, an organic layer on the display structures and the blocking structures, and an inorganic layer on the organic layer.

Abstract: Provided is an active layer composition of a reduction electrode for brine electrolysis containing a metal precursor mixture containing a ruthenium precursor, a platinum precursor, and a lanthanide metal precursor, and an organic solvent containing an alcohol-based compound and an amine-based compound. Also provided is a reduction electrode containing a metal substrate and an active layer that is a dried and heat treated active layer composition positioned on the metal substrate.

Abstract: Disclosed is a process stop loss reduction system, in which in case that pressure in a trapping apparatus and pressure in a process chamber are increased because of space clogging or the like caused by reaction by-products while the trapping apparatus for trapping of a reaction by-product contained in exhaust gas discharged from the process chamber operates over a long period of time during a semiconductor process, only the trapping apparatus, in which an exhaust gas supply flow path is blocked, may be quickly replaced while inert gas, instead of the exhaust gas, is received in an idle state and continuously supplied to the vacuum pump through a bypass pipe without stopping an operation of (shutting down) a semiconductor manufacturing process chamber facility, and then the trapping apparatus may be supplied with the exhaust gas again as the flow path is changed.

Abstract: Provided is a reactive by-products collection system utilizing the narrow sub-factory structure of the existing semiconductor manufacturing facility consisting of a two-story structure of the main factory and sub-factory and providing a replaceable collection device structure that is connected vertically to a vacuum pump via a connecting pipe so that it solves the problem of lack of reactive by-product collection treatment capacity in the system using increased process gas.

Abstract: The present disclosure relates to an apparatus for trapping multiple reaction by-products for a semiconductor process, in which in order to separate, with the single trapping apparatus, reaction by-product mixtures contained in unreacted gases discharged after a process of depositing multiple different thin film layers is performed in a process chamber during a semiconductor manufacturing process, a trapping region division part is provided, which divides a heat distribution region into trapping regions for respective reaction by-products while controlling a flow in a movement direction of an introduced unreacted gas, thereby trapping a reaction by-product aggregated in the form of a thin film in a relatively high-temperature region by using a first internal trapping tower in a front region, and trapping a reaction by-product aggregated in the form of powder in a relatively low-temperature region by using a second internal trapping tower in a rear region.

Abstract: The present disclosure relates to an apparatus for collecting by-products for a semiconductor manufacturing process with improved collection space efficiency, and an object of the present disclosure is to provide an apparatus for collecting by-products, which provides a multi-stage collection function while guiding a flow of exhaust gas through an internal collection tower, which includes an upper-end collection part, an intermediate collection part, and a lower-end collection part by guiding the exhaust gas to a lower side through a peripheral portion after heating the exhaust gas, which is introduced into the collection apparatus, by using a heater, and allows main by-products to be accumulated in an internal space of the intermediate collection part having open gas flow structures of an inner region and an inner wall housing, thereby improving efficiency of a collection space.

Abstract: Proposed are a light source-tracking solar cell array, and a light source-tracking solar power generation system using same. More specifically, a light source-tracking solar cell array, and a light source-tracking solar power generation system using same, wherein light source-tracking solar cell array includes a stretchable solar module including a plurality of unit solar cells and a metal fiber-based conductive connector having elasticity and flexibility, wherein the plurality of unit solar cells are connected to each other by the conductive connector, and a transformable means which transforms in shape according to a change in position of a light source by connecting at least two or more of the plurality of unit solar cells, wherein the stretchable solar module is transformed in shape as the transformable means changes intervals between the unit solar cells due to the changes in the position of the sun.

Abstract: A mask including a sensor area including at least one half-etched area, a first deposition area disposed external to the sensor area, and a second deposition area disposed in the sensor area. The mask, a mask assembly including the mask, a display panel manufacturing apparatus including the mask assembly, and a method of manufacturing a display panel using the display panel manufacturing apparatus in accordance with embodiments of the disclosure may improve deposition quality.

Abstract: The present disclosure relates to a method for preparing a filler composition for molding. The method for preparing a filler composition for molding includes the operations of: a) providing PLGA microparticles consisting of poly (lactic-co-glycolic acid) (PLGA), a biodegradable polymer; b) providing PDO microparticles consisting of polydioxanone (PDO); c) preparing a mixture by mixing the PLGA microparticles and the PDO microparticles; d) injecting plasma into the mixture to perform a plasma surface treatment on the PLGA microparticles and the PDO microparticles; e) dispersing the plasma-treated mixture into a solution containing a dispersant composition to prepare a dispersant solution; and f) freeze-drying the dispersant solution to form the composite containing the PLGA microparticles and the PDO microparticles.

Abstract: The present disclosure relates to an apparatus for trapping a reaction by-product created by an etching process, the apparatus being configured to trap a reaction by-product contained in an unreacted gas discharged after a process is performed in an etching process chamber during a semiconductor manufacturing process, trap and stack the reaction by-product in the form of powder at a position between a vacuum pump and a scrubber through multiple flow path switching structures, multiple trapping structures, and multiple stacking structures, and discharge only a gaseous unreacted gas to the scrubber.

Abstract: A gateway apparatus and a method for dynamically applying API settings are disclosed. The gateway apparatus includes a sub-processing unit processing an API (application programming interface) request of a client terminal based on API settings through a plurality of sub-threads, a setting unit comprising a first rule table and a second rule table to store a set value for processing the API request, and a reference flag, and a main processing unit updating new API settings in a rule table other than the rule table corresponding to a reference value of the reference flag through a main thread when receiving the new API settings, and setting the reference value of the reference flag to a reference value corresponding to the updated rule table when the update is completed.

Abstract: Disclosed is a process stop loss reduction system, in which in case that pressure in a trapping apparatus and pressure in a process chamber are increased because of space clogging or the like caused by reaction by-products while the trapping apparatus for trapping of a reaction by-product contained in exhaust gas discharged from the process chamber operates over a long period of time during a semiconductor process, only the trapping apparatus, in which an exhaust gas supply flow path is blocked, may be quickly replaced while inert gas, instead of the exhaust gas, is received in an idle state and continuously supplied to the vacuum pump through a bypass pipe without stopping an operation of (shutting down) a semiconductor manufacturing process chamber facility, and then the trapping apparatus may be supplied with the exhaust gas again as the flow path is changed.

Abstract: The probe for hydrogen sulfide detection according to the present invention is represented by chemical formula 1 below.

Abstract: Disclosed is a process stop loss reduction system, in which in case that pressure in a trapping apparatus and pressure in a process chamber are increased because of space clogging or the like caused by reaction by-products while the trapping apparatus for trapping of a reaction by-product contained in exhaust gas discharged from the process chamber operates over a long period of time during a semiconductor process, only the trapping apparatus, to which a supply of exhaust gas is cut off, may be quickly replaced while inert gas is received in an idle state and continuously supplied to a vacuum pump through a bypass pipe of the trapping apparatus without stopping an operation of (shutting down) a semiconductor manufacturing process chamber facility, and then the trapping apparatus may be supplied with the exhaust gas again.

Abstract: The present invention relates to new compounds derived from marine actinomycetes Streptomyces, and the new compound according to the present invention has an inhibitory effect of NO production on BV-2 microglia stimulated with LPS, and thus can be utilized for the prevention and treatment of neuroinflammatory diseases.

Abstract: The present disclosure relates to an apparatus for trapping of a reaction by-product capable of expanding the area for collection by inducing a gas flow, in which an internal trapping tower of the apparatus for trapping of a reaction by-product, which traps a reaction by-product contained in gas discharged from a process chamber during a semiconductor manufacturing process, is divided into multiple stages, the introduced gas is guided to a lower side of an inner region of an intermediate trapping unit provided as a space portion and discharged to an outer region while a trapping reaction occurs according to the reaction by-product trapping amount during a former part of a use duration time.

Abstract: The present disclosure relates to an apparatus for trapping of a reaction by-product with an extended available collection area. The configuration of the present disclosure relates to an apparatus for trapping of a reaction by-product, which is configured to accommodate gas, which is discharged after a deposition process during a semiconductor manufacturing process, in a housing (1), heat the gas with a heater (2), trap a reaction by-product contained in the gas by using an internal trapping tower (3), and discharge only the gas.

Abstract: The present disclosure relates to an apparatus for trapping of a reaction by-product with an extended available collection area. The configuration of the present disclosure relates to an apparatus for trapping of a reaction by-product, which is configured to accommodate gas, which is discharged after a deposition process during a semiconductor manufacturing process, in a housing (1), heat the gas with a heater (2), trap a reaction by-product contained in the gas by using an internal trapping tower (3), and discharge only the gas.

Abstract: The present disclosure relates to an apparatus for trapping of a reaction by-product capable of expanding the area for collection by inducing a gas flow, in which an internal trapping tower of the apparatus for trapping of a reaction by-product, which traps a reaction by-product contained in gas discharged from a process chamber during a semiconductor manufacturing process, is divided into multiple stages, the introduced gas is guided to a lower side of an inner region of an intermediate trapping unit provided as a space portion and discharged to an outer region while a trapping reaction occurs according to the reaction by-product trapping amount during a former part of a use duration time.

Abstract: A medical image providing apparatus includes: a display configured to display a first image including an object; and a processor. The processor is configured to: while the first image is displayed, control to output, on the display, a list including second medical images, wherein each of the second medical images is reconstructed by one of a plurality of medical images reconstruction techniques using image data of a first region in the first image; control to output, on the display, a manipulation menu item for manipulating at least one of the second medical images included in the list; based on a selection of the manipulation menu item corresponding to one of the second medical images, receive a manipulation input corresponding to the selected manipulation menu item; and update the second medical image corresponding to the selected manipulation menu item by applying the manipulation input.