Patents by Inventor Yeon-Soo Lee

Yeon-Soo Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20150079332
    Abstract: The present invention relates to a photocurable composition, to a barrier layer including same, and to an encapsulated device including same, wherein the composition comprises a photocurable monomer(A) and a silicon containing monomer(B), wherein the silicon containing monomers(B) has a structure according to Formula 1.
    Type: Application
    Filed: February 22, 2013
    Publication date: March 19, 2015
    Inventors: Chang Min Lee, Seung Jib Choi, Ji Hye Kwon, Yeon Soo Lee, Kyoung Jin Ha
  • Publication number: 20150034886
    Abstract: A photosensitive resin composition for a color filter includes (A) a dye including a cation moiety represented by the following Chemical Formula 1, wherein in Chemical Formula 1, each substituent is the same as defined in the detailed description; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; (D) an acrylic-based binder resin; and (E) a solvent, and a color filter using the same.
    Type: Application
    Filed: December 5, 2013
    Publication date: February 5, 2015
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Chang-Min LEE, Kwang-Won SEO, Yeon-Soo LEE, Sang-Won CHO, Seung-Jib CHOI, Soo-Young HEO
  • Patent number: 8906271
    Abstract: Disclosed is a photosensitive resin composition for a color filter and a color filter using the same. The photosensitive resin composition for a color filter includes (A) a dye-polymer composite including a structural unit derived from the compound represented by the following Chemical Formula 1, wherein each substituent is the same as defined in the detailed description; (B) an acryl-based photopolymerizable monomer; (C) a photopolymerization initiator; and (D) a solvent.
    Type: Grant
    Filed: October 16, 2012
    Date of Patent: December 9, 2014
    Assignee: Cheil Industries Inc.
    Inventors: Yeon-Soo Lee, Seong-Ryong Nam, Taek-Jin Baek, Sang-Won Cho, Jae-Hyun Kim, Chang-Min Lee, Gyu-Seok Han
  • Publication number: 20140178675
    Abstract: A composition for encapsulation and an encapsulated apparatus, the composition including a (meth)acrylic alkoxysilane monomer including a moiety represented by Formula 1 or 2, below, or an oligomer thereof; a multifunctional (meth)acrylate monomer or an oligomer thereof; and an initiator, wherein * and ** represent a binding site between elements.
    Type: Application
    Filed: November 22, 2013
    Publication date: June 26, 2014
    Inventors: Kyoung Jin HA, Ji Hye KWON, Seong Ryong NAM, Yeon Soo LEE, Chang Min LEE, Seung Jib CHOI
  • Patent number: 8735027
    Abstract: Disclosed are a photosensitive resin composition for a color filter and a color filter using the same. The photosensitive resin composition for a color filter includes (A) a dye-polymer composite including a structural unit derived from a compound represented by the following Chemical Formula 1; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; and (D) a solvent. In Chemical Formula 1, each substituent is the same as defined in the detailed description.
    Type: Grant
    Filed: August 22, 2012
    Date of Patent: May 27, 2014
    Assignee: Cheil Industries Inc.
    Inventors: Seong-Ryong Nam, Taek-Jin Baek, Yeon-Soo Lee, Chang-Min Lee, Sang-Won Cho, Won-A Noh, Gyu-Seok Han, Han-Chul Hwang
  • Publication number: 20140106111
    Abstract: A photocurable composition, a composition for encapsulation of an organic light emitting device, an encapsulated device, and an encapsulated apparatus, the photocurable composition including a photocurable monomer; a silicon-containing monomer; and a photopolymerization initiator, wherein the silicon-containing monomer has a structure represented Formula 1:
    Type: Application
    Filed: September 25, 2013
    Publication date: April 17, 2014
    Inventors: Seong Ryong NAM, Chang Min LEE, Seung Jib CHOI, Ji Hye KWON, Chang Soo WOO, Yeon Soo LEE, Kyoung Jin HA
  • Publication number: 20130328028
    Abstract: Disclosed are a photocurable composition which includes (A) a photocurable monomer and (B) a monomer represented by Formula 1, and an apparatus including a protective layers formed of the composition;
    Type: Application
    Filed: June 12, 2013
    Publication date: December 12, 2013
    Inventors: Chang Min LEE, Seung Jib CHOI, Ji Hye KWON, Kyoung Jin HA, Yeon Soo LEE
  • Publication number: 20130236681
    Abstract: A photocurable composition includes (A) a photocurable monomer and (B) a silicon-containing monomer or oligomer thereof, the silicon-containing monomer being represented by Formula 1
    Type: Application
    Filed: March 5, 2013
    Publication date: September 12, 2013
    Inventors: Chang Min LEE, Seung Jib CHOI, Ji Hye KWON, Irina NAM, Jin Seong PARK, Yeon Soo LEE, Kyoung Jin HA
  • Publication number: 20130164678
    Abstract: Disclosed are a photosensitive resin composition for a color filter and a color filter using the same. The photosensitive resin composition for a color filter includes (A) a dye-polymer composite including a structural unit derived from a compound represented by the following Chemical Formula 1; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; and (D) a solvent. In Chemical Formula 1, each substituent is the same as defined in the detailed description.
    Type: Application
    Filed: August 22, 2012
    Publication date: June 27, 2013
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Seong-Ryong NAM, Taek-Jin BAEK, Yeon-Soo LEE, Chang-Min LEE, Sang-Won CHO, Won-A NOH, Gyu-Seok HAN, Han-Chul HWANG
  • Publication number: 20130141810
    Abstract: Disclosed is a photosensitive resin composition for a color filter and a color filter using the same. The photosensitive resin composition for a color filter includes (A) a dye-polymer composite including a structural unit derived from the compound represented by the following Chemical Formula 1, wherein each substituent is the same as defined in the detailed description; (B) an acryl-based photopolymerizable monomer; (C) a photopolymerization initiator; and (D) a solvent.
    Type: Application
    Filed: October 16, 2012
    Publication date: June 6, 2013
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Yeon-Soo LEE, Seong-Ryong NAM, Taek-Jin BAEK, Sang-Won CHO, Jae-Hyun KIM, Chang-Min LEE, Gyu-Seok HAN
  • Publication number: 20130001483
    Abstract: Disclosed is a photosensitive resin composition for a color filter that includes (A) an acrylic-based binder resin including a structural unit represented by the following Chemical Formula 1; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; (D) a colorant; and (E) a solvent. In the above Chemical Formula, each definition of R1, R2, R3 and R4 is the same as defined in the detailed description.
    Type: Application
    Filed: January 19, 2012
    Publication date: January 3, 2013
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Chang-Min LEE, Yeon-Soo LEE, Yong-Hee KANG, Man-Suk KIM, Taek-Jin BAEK, Hyun-Moo CHOI, Kyung-Hee HYUNG, Sang-Hyun HONG
  • Patent number: 8227456
    Abstract: The present invention relates to a use of a specific alpha-arylmethoxyacrylate derivative, or its pharmacologically acceptable salt or solvate for preventing and treating metabolic bone diseases.
    Type: Grant
    Filed: October 14, 2009
    Date of Patent: July 24, 2012
    Assignees: Korea Research Institute of Chemical Technology, Oscotec Inc.
    Inventors: Bum Tae Kim, Yong Ki Min, Yeon Soo Lee, Jung Nyoung Heo, Hyuk Lee, No Kyun Park, Jung-Keun Kim, Se-Won Kim, Seon-Yle Ko
  • Patent number: 7879835
    Abstract: The present invention relates to a use of a specific alpha-arylmethoxyacrylate derivative, or its pharmacologically acceptable salt or solvate for preventing and treating metabolic bone diseases.
    Type: Grant
    Filed: June 22, 2005
    Date of Patent: February 1, 2011
    Assignees: Korea Research Institute of Chemical Technology, Oscotec Inc.
    Inventors: Bum Tae Kim, Yong Ki Min, Yeon Soo Lee, Jung Nyoung Heo, Hyuk Lee, No Kyun Park, Jung-Keun Kim, Se-Won Kim, Seon-Yle Ko
  • Publication number: 20100256367
    Abstract: The present invention relates to a use of a specific alpha-arylmethoxyacrylate derivative, or its pharmacologically acceptable salt or solvate for preventing and treating metabolic bone diseases.
    Type: Application
    Filed: October 14, 2009
    Publication date: October 7, 2010
    Applicants: KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY, OSCOTEC INC.
    Inventors: Bum Tae KIM, Yong Ki Min, Yeon Soo Lee, Jung Nyoung Heo, Hyuk Lee, No Kyun Park, Jung-Keun Kim, Se-Won Kim, Seon-Yle Ko
  • Publication number: 20080280901
    Abstract: The present invention relates to a use of a specific alpha-arylmethoxyacrylate derivative, or its pharmacologically acceptable salt or solvate for preventing and treating metabolic bone diseases.
    Type: Application
    Filed: June 22, 2005
    Publication date: November 13, 2008
    Applicants: Korea Research Institute of Chemical Technology, Oscotec Inc.
    Inventors: Bum Tae Kim, Yong Ki Min, Yeon Soo Lee, Jung Nyoung Heo, Hyuk Lee, No Kyun Park, Jung-Keun Kim, Se-Won Kim, Seon-Yle Ko
  • Publication number: 20080221205
    Abstract: The present invention relates to furan derivatives and pharmaceutical compositions containing them to prevent and cure osteoporosis. The furan derivatives of the present invention have effect on bone proliferation with the side effect reduced, so that they can be used for bone disease.
    Type: Application
    Filed: May 22, 2008
    Publication date: September 11, 2008
    Inventors: Jung-Keun Kim, Se-Won Kim, Kwi-Ok Oh, Seon Yle Ko, Jong Yeo Kim, Byung-Eui Lee, Bum Tae Kim, Yeon Soo Lee, Yong Ki Min, No Kyun Park
  • Publication number: 20080027117
    Abstract: An azole derivative of formula (I) having a fluorovinyl moiety or a pharmaceutically acceptable salt thereof is superior to the conventional antifungal drugs in antifungal activity against a wide spectrum of pathogenic fungi, and has advantageously low toxicity.
    Type: Application
    Filed: August 9, 2004
    Publication date: January 31, 2008
    Applicant: KOREA RESERACH INSTIITUTE OF CHEMICAL TECHNOLOGY
    Inventors: Bum Tae Kim, Yong Ki Min, Yeon Soo Lee, No Kyun Park, Woo Jung Kim
  • Patent number: 6933403
    Abstract: A process for a mono carbonylation of a benzenediol of the formula (I) is characterized in that a benzene diol of the formula (II) is reacted with an acid anhydride or carbonyl halide of the formula (III) without any organic or inorganic bases for thereby producing a monocarbonylated benzenediol of the formula (I): wherein R is hydrogen, C1-C15 alkyl group, cycle alkyl group, aryl group, alkoxy group, aryloxy group, dialkylamino group, alkylarylamino group or diarylamino group, and X is a general leaving group such as fluoride, chloride, bromide, iodide, acetoxy, etc.
    Type: Grant
    Filed: October 14, 2002
    Date of Patent: August 23, 2005
    Assignees: Bioland Co., Ltd., Korea Research Institute of Chemical Technology
    Inventors: Yeon-Soo Lee, Bum-Tae Kim, Yong-Ki Min, No-Kyun Park, Ki-Ho Kim, Ki-Soo Kim
  • Publication number: 20040260114
    Abstract: A process for a mono carbonylation of a benzenediol of the formula (I) is characterized in that a benzene diol of the formula (II) is reacted with an acid anhydride or carbonyl halide of the formula (III) without any organic or inorganic bases for thereby producing a monocarbonylated benzenediol of the formula (I): 1
    Type: Application
    Filed: March 24, 2004
    Publication date: December 23, 2004
    Inventors: Yeon-Soo Lee, Bum-Tae Kim, Yong-Ki Min, No-Kyun Park, Ki-Ho Kim, Ki-Soo Kim
  • Patent number: 6388103
    Abstract: The invention is related to a preparation method of arbutin intermediate (chemical formula I). It is characterized by the glycosylation of hydroquinone or mono-protectected hydroquinone (chemical formula II) with pentaacetyl-&bgr;-D-glucose (chemical formula III) in the presence of Lewis acid and base as catalysts. where Ac is acetyl group, R is hydrogen, alkyl or cycloalkyl group with 1 to 10 carbon, or aliphatic or aromatic acyl group with 1 to 10 carbon.
    Type: Grant
    Filed: April 20, 2001
    Date of Patent: May 14, 2002
    Assignees: Korea Research Institute of Chemical Technology, Biolano Co., Ltd.
    Inventors: Yeon Soo Lee, Bum Tae Kim, Yong Ki Min, No Kyun Park, Ki Ho Kim, Jae Seob Lee, See Wha Jeoung, Ki Soo Kim