Abstract: Optoelectronic and photonic devices are formed by employing polymer materials that have a lower glass transition temperature (Tg) than the nominal operating temperature. By using such materials, the local or segmental mobility is increased so that local stress is eliminated or minimized on the polymer material, making performance more robust. The current invention involves use of a polymer in an optical device in an operating temperature range in the region above Tg, where the polymer segments between crosslinks are allowed local freedom of movement; however, large-scale movement of the material may be restricted by the crosslinked structure of the polymer material.

Abstract: An optical structure is fabricated by forming an active layer including a photodefinable material on a substrate or on another underlying layer, forming an upper layer above the active layer, and then patterning the active layer by selective application of radiation through the upper layer. The upper layer is substantially transparent to radiation of the type required to activate the photodefinable material in the active layer.

Abstract: Optoelectronic and photonic devices are formed by employing polymer materials that have a lower glass transition temperature (Tg) than the nominal operating temperature. By using such materials, the local or segmental mobility is increased so that local stress is eliminated or minimized on the polymer material, making performance more robust. The current invention involves use of a polymer in an optical device in an operating temperature range in the region above Tg, where the polymer segments between crosslinks are allowed local freedom of movement; however, large-scale movement of the material may be restricted by the crosslinked structure of the polymer material.

Abstract: An optical structure is fabricated by forming an active layer including a photodefinable material on a substrate or on another underlying layer, forming an upper layer above the active layer, and then patterning the active layer by selective application of radiation through the upper layer. The upper layer is substantially transparent to radiation of the type required to activate the photodefinable material in the active layer.

Abstract: Optoelectronic and photonic devices are formed by employing polymer materials that have a lower glass transition temperature (Tg) than the nominal operating temperature. By using such materials, the local or segmental mobility is increased so that local stress is eliminated or minimized on the polymer material, making performance more robust. The current invention involves use of a polymer in an optical device in an operating temperature range in the region above Tg, where the polymer segments between crosslinks are allowed local freedom of movement; however, large-scale movement of the material may be restricted by the crosslinked structure of the polymer material.