Patents by Inventor Yeong-Hoon SOHN
Yeong-Hoon SOHN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11909331Abstract: A power supply includes an inverter configured to direct current (DC) power into alternating current (AC) power, an impedance matching circuit configured to supply the AC power to a load; and a controller configured to adjust disposition of a powering period, in which the AC power is output, and a freewheeling period, in which the AC power is not output, to adjust a power amount of the power supplied to the load through the impedance matching circuit by the inverter.Type: GrantFiled: March 17, 2023Date of Patent: February 20, 2024Assignee: EN2CORE TECHNOLOGY, INC.Inventors: Yeong-Hoon Sohn, Se-Hong Park, Sae-Hoon Uhm
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Publication number: 20240006150Abstract: A plasma generating apparatus according to an embodiment of the present invention comprises: a pair of electrodes arranged in a dielectric discharge tube; an initial discharge induction coil module; and a main discharge induction coil module. The initial discharge induction coil module and the main discharge induction coil module are connected to an RF power source, and the RF power source provides RF power having different resonance frequencies to the initial discharge induction coil module and the main discharge induction coil module, respectively.Type: ApplicationFiled: September 12, 2023Publication date: January 4, 2024Inventors: Sae Hoon UHM, Yun Seong LEE, Yeong Hoon SOHN, Se Hong PARK
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Patent number: 11791133Abstract: A plasma generating apparatus according to an embodiment of the present invention comprises: a pair of electrodes arranged in a dielectric discharge tube; an initial discharge induction coil module; and a main discharge induction coil module. The initial discharge induction coil module and the main discharge induction coil module are connected to an RF power source, and the RF power source provides RF power having different resonance frequencies to the initial discharge induction coil module and the main discharge induction coil module, respectively.Type: GrantFiled: November 15, 2022Date of Patent: October 17, 2023Assignee: EN2CORE TECHNOLOGY, INC.Inventors: Sae Hoon Uhm, Yun Seong Lee, Yeong Hoon Sohn, Se Hong Park
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Publication number: 20230318486Abstract: A power supply includes an inverter configured to convert direct current (DC) power into alternating current (AC) power, an impedance matching circuit configured to supply the AC power to a load, and a controller configured to detect a delay time of an output voltage and an output current output to the impedance matching circuit and the load and to adjust a frequency of the output voltage according to the detected delay time.Type: ApplicationFiled: January 11, 2022Publication date: October 5, 2023Inventors: Yeong-Hoon SOHN, Se-Hong PARK, Sae-Hoon UHM
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Publication number: 20230231497Abstract: A power supply includes an inverter configured to direct current (DC) power into alternating current (AC) power, an impedance matching circuit configured to supply the AC power to a load; and a controller configured to adjust disposition of a powering period, in which the AC power is output, and a freewheeling period, in which the AC power is not output, to adjust a power amount of the power supplied to the load through the impedance matching circuit by the inverter.Type: ApplicationFiled: March 17, 2023Publication date: July 20, 2023Inventors: Yeong-Hoon SOHN, Se-Hong PARK, Sae-Hoon UHM
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Publication number: 20230170185Abstract: According to one embodiment of the present specification, there can be provided an apparatus for generating plasma, comprising: a chamber configured to provide a generating space for the plasma; an antenna module placed adjacent to the chamber and configured to be connected to a first power source and generate induced electric field in the chamber; an electrode placed adjacent to the chamber and configured to be connected to a second power source and assist in a generation of the plasma; a sensor configured to obtain sensing information related to a status of the plasma; and a controller configured to control the first power source and the second power source.Type: ApplicationFiled: June 29, 2021Publication date: June 1, 2023Inventors: Sae Hoon UHM, Yun Seong LEE, Yeong Hoon SOHN, Se Hong PARK
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Publication number: 20230136018Abstract: According to one embodiment of the present disclosure, there can be provided a plasma generating device for performing plasma discharge, the plasma generating device having multiple operation modes including a first mode and a second mode, and including: a first power supply capable of changing a frequency within a first frequency range; a second power supply capable of changing a frequency within a second frequency range that is at least partially different from the first frequency range; a dielectric tube; and an antenna module including a first unit coil wound around the dielectric tube at least one time, a second unit coil wound around the dielectric tube at least one time, and a first capacitor connected in series between the first unit coil and the second unit coil.Type: ApplicationFiled: December 26, 2022Publication date: May 4, 2023Inventors: Sae Hoon UHM, Yun Seong LEE, Yeong Hoon SOHN, Se Hong PARK, Ji Hoon KIM
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Publication number: 20230139675Abstract: This invention is an antenna structure inducing plasma in a chamber with applied alternative power, comprising: a first antenna segment and a second antenna segment arranged based on a virtual central axis to have a first curvature radius and a second curvature radius respectively, the central axis crossing a first plane, and a first capacitive load electrically connecting the first antenna segment and the second antenna segment, wherein the first antenna segment extends from one end of the first capacitive load with the first curvature radius having a first length and the second antenna segment extends from other end of the first capacitive load with the second curvature radius having a second length, and wherein a sum of the first length and the second length is shorter than a circumference of the first curvature radius or the second curvature radius.Type: ApplicationFiled: February 19, 2021Publication date: May 4, 2023Inventors: Sae Hoon UHM, Yun Seong LEE, Yeong Hoon SOHN, Se Hong PARK
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Patent number: 11632061Abstract: A power supply includes an inverter configured to direct current (DC) power into alternating current (AC) power, an impedance matching circuit configured to supply the AC power to a load; and a controller configured to adjust disposition of a powering period, in which the AC power is output, and a freewheeling period, in which the AC power is not output, to adjust a power amount of the power supplied to the load through the impedance matching circuit by the inverter.Type: GrantFiled: February 17, 2022Date of Patent: April 18, 2023Assignee: EN2CORE TECHNOLOGY, INC.Inventors: Yeong-Hoon Sohn, Se-Hong Park, Sae-Hoon Uhm
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Publication number: 20230083958Abstract: A plasma generating apparatus according to an embodiment of the present invention comprises: a pair of electrodes arranged in a dielectric discharge tube; an initial discharge induction coil module; and a main discharge induction coil module. The initial discharge induction coil module and the main discharge induction coil module are connected to an RF power source, and the RF power source provides RF power having different resonance frequencies to the initial discharge induction coil module and the main discharge induction coil module, respectively.Type: ApplicationFiled: November 15, 2022Publication date: March 16, 2023Inventors: Sae Hoon UHM, Yun Seong LEE, Yeong Hoon SOHN, Se Hong PARK
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Patent number: 11532455Abstract: A plasma generating apparatus according to an embodiment of the present invention comprises: a pair of electrodes arranged in a dielectric discharge tube; an initial discharge induction coil module; and a main discharge induction coil module. The initial discharge induction coil module and the main discharge induction coil module are connected to an RF power source, and the RF power source provides RF power having different resonance frequencies to the initial discharge induction coil module and the main discharge induction coil module, respectively.Type: GrantFiled: December 27, 2019Date of Patent: December 20, 2022Assignee: EN2CORE TECHNOLOGY, INC.Inventors: Sae-Hoon Uhm, Yun-Seong Lee, Yeong-Hoon Sohn, Se-Hong Park
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Publication number: 20220173670Abstract: A power supply includes an inverter configured to direct current (DC) power into alternating current (AC) power, an impedance matching circuit configured to supply the AC power to a load; and a controller configured to adjust disposition of a powering period, in which the AC power is output, and a freewheeling period, in which the AC power is not output, to adjust a power amount of the power supplied to the load through the impedance matching circuit by the inverter.Type: ApplicationFiled: February 17, 2022Publication date: June 2, 2022Inventors: Yeong-Hoon SOHN, Se-Hong PARK, Sae-Hoon UHM
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Patent number: 11290028Abstract: A power supply includes an inverter configured to direct current (DC) power into alternating current (AC) power, an impedance matching circuit configured to supply the AC power to a load; and a controller configured to adjust disposition of a powering period, in which the AC power is output, and a freewheeling period, in which the AC power is not output, to adjust a power amount of the power supplied to the load through the impedance matching circuit by the inverter.Type: GrantFiled: June 11, 2018Date of Patent: March 29, 2022Assignee: EN2CORE TECHNOLOGY, INC.Inventors: Yeong-Hoon Sohn, Se-Hong Park, Sae-Hoon Uhm
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Patent number: 11258373Abstract: A power supply includes an inverter configured to convert direct current (DC) power into alternating current (AC) power, an impedance matching circuit configured to supply the AC power to a load, and a controller configured to detect a delay time of an output voltage and an output current output to the impedance matching circuit and the load and to adjust a frequency of the output voltage according to the detected delay time.Type: GrantFiled: June 11, 2018Date of Patent: February 22, 2022Assignee: EN2CORE TECHNOLOGY, INC.Inventors: Yeong-Hoon Sohn, Se-Hong Park, Sae-Hoon Uhm
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Publication number: 20210319979Abstract: A plasma generating apparatus according to an embodiment of the present invention comprises: a pair of electrodes arranged in a dielectric discharge tube; an initial discharge induction coil module; and a main discharge induction coil module. The initial discharge induction coil module and the main discharge induction coil module are connected to an RF power source, and the RF power source provides RF power having different resonance frequencies to the initial discharge induction coil module and the main discharge induction coil module, respectively.Type: ApplicationFiled: December 27, 2019Publication date: October 14, 2021Inventors: Sae-Hoon UHM, Yun-Seong LEE, Yeong-Hoon SOHN, Se-Hong PARK
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Publication number: 20210226556Abstract: A power supply includes an inverter configured to direct current (DC) power into alternating current (AC) power, an impedance matching circuit configured to supply the AC power to a load; and a controller configured to adjust disposition of a powering period, in which the AC power is output, and a freewheeling period, in which the AC power is not output, to adjust a power amount of the power supplied to the load through the impedance matching circuit by the inverter.Type: ApplicationFiled: June 11, 2018Publication date: July 22, 2021Inventors: Yeong-Hoon SOHN, Se-Hong PARK, Sae-Hoon UHM
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Publication number: 20210226555Abstract: A power supply includes an inverter configured to convert direct current (DC) power into alternating current (AC) power, an impedance matching circuit configured to supply the AC power to a load, and a controller configured to detect a delay time of an output voltage and an output current output to the impedance matching circuit and the load and to adjust a frequency of the output voltage according to the detected delay time.Type: ApplicationFiled: June 11, 2018Publication date: July 22, 2021Inventors: Yeong-Hoon SOHN, Se-Hong PARK, Sae-Hoon UHM