Patents by Inventor Yeong-Hoon SOHN

Yeong-Hoon SOHN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11909331
    Abstract: A power supply includes an inverter configured to direct current (DC) power into alternating current (AC) power, an impedance matching circuit configured to supply the AC power to a load; and a controller configured to adjust disposition of a powering period, in which the AC power is output, and a freewheeling period, in which the AC power is not output, to adjust a power amount of the power supplied to the load through the impedance matching circuit by the inverter.
    Type: Grant
    Filed: March 17, 2023
    Date of Patent: February 20, 2024
    Assignee: EN2CORE TECHNOLOGY, INC.
    Inventors: Yeong-Hoon Sohn, Se-Hong Park, Sae-Hoon Uhm
  • Publication number: 20240006150
    Abstract: A plasma generating apparatus according to an embodiment of the present invention comprises: a pair of electrodes arranged in a dielectric discharge tube; an initial discharge induction coil module; and a main discharge induction coil module. The initial discharge induction coil module and the main discharge induction coil module are connected to an RF power source, and the RF power source provides RF power having different resonance frequencies to the initial discharge induction coil module and the main discharge induction coil module, respectively.
    Type: Application
    Filed: September 12, 2023
    Publication date: January 4, 2024
    Inventors: Sae Hoon UHM, Yun Seong LEE, Yeong Hoon SOHN, Se Hong PARK
  • Patent number: 11791133
    Abstract: A plasma generating apparatus according to an embodiment of the present invention comprises: a pair of electrodes arranged in a dielectric discharge tube; an initial discharge induction coil module; and a main discharge induction coil module. The initial discharge induction coil module and the main discharge induction coil module are connected to an RF power source, and the RF power source provides RF power having different resonance frequencies to the initial discharge induction coil module and the main discharge induction coil module, respectively.
    Type: Grant
    Filed: November 15, 2022
    Date of Patent: October 17, 2023
    Assignee: EN2CORE TECHNOLOGY, INC.
    Inventors: Sae Hoon Uhm, Yun Seong Lee, Yeong Hoon Sohn, Se Hong Park
  • Publication number: 20230318486
    Abstract: A power supply includes an inverter configured to convert direct current (DC) power into alternating current (AC) power, an impedance matching circuit configured to supply the AC power to a load, and a controller configured to detect a delay time of an output voltage and an output current output to the impedance matching circuit and the load and to adjust a frequency of the output voltage according to the detected delay time.
    Type: Application
    Filed: January 11, 2022
    Publication date: October 5, 2023
    Inventors: Yeong-Hoon SOHN, Se-Hong PARK, Sae-Hoon UHM
  • Publication number: 20230231497
    Abstract: A power supply includes an inverter configured to direct current (DC) power into alternating current (AC) power, an impedance matching circuit configured to supply the AC power to a load; and a controller configured to adjust disposition of a powering period, in which the AC power is output, and a freewheeling period, in which the AC power is not output, to adjust a power amount of the power supplied to the load through the impedance matching circuit by the inverter.
    Type: Application
    Filed: March 17, 2023
    Publication date: July 20, 2023
    Inventors: Yeong-Hoon SOHN, Se-Hong PARK, Sae-Hoon UHM
  • Publication number: 20230170185
    Abstract: According to one embodiment of the present specification, there can be provided an apparatus for generating plasma, comprising: a chamber configured to provide a generating space for the plasma; an antenna module placed adjacent to the chamber and configured to be connected to a first power source and generate induced electric field in the chamber; an electrode placed adjacent to the chamber and configured to be connected to a second power source and assist in a generation of the plasma; a sensor configured to obtain sensing information related to a status of the plasma; and a controller configured to control the first power source and the second power source.
    Type: Application
    Filed: June 29, 2021
    Publication date: June 1, 2023
    Inventors: Sae Hoon UHM, Yun Seong LEE, Yeong Hoon SOHN, Se Hong PARK
  • Publication number: 20230136018
    Abstract: According to one embodiment of the present disclosure, there can be provided a plasma generating device for performing plasma discharge, the plasma generating device having multiple operation modes including a first mode and a second mode, and including: a first power supply capable of changing a frequency within a first frequency range; a second power supply capable of changing a frequency within a second frequency range that is at least partially different from the first frequency range; a dielectric tube; and an antenna module including a first unit coil wound around the dielectric tube at least one time, a second unit coil wound around the dielectric tube at least one time, and a first capacitor connected in series between the first unit coil and the second unit coil.
    Type: Application
    Filed: December 26, 2022
    Publication date: May 4, 2023
    Inventors: Sae Hoon UHM, Yun Seong LEE, Yeong Hoon SOHN, Se Hong PARK, Ji Hoon KIM
  • Publication number: 20230139675
    Abstract: This invention is an antenna structure inducing plasma in a chamber with applied alternative power, comprising: a first antenna segment and a second antenna segment arranged based on a virtual central axis to have a first curvature radius and a second curvature radius respectively, the central axis crossing a first plane, and a first capacitive load electrically connecting the first antenna segment and the second antenna segment, wherein the first antenna segment extends from one end of the first capacitive load with the first curvature radius having a first length and the second antenna segment extends from other end of the first capacitive load with the second curvature radius having a second length, and wherein a sum of the first length and the second length is shorter than a circumference of the first curvature radius or the second curvature radius.
    Type: Application
    Filed: February 19, 2021
    Publication date: May 4, 2023
    Inventors: Sae Hoon UHM, Yun Seong LEE, Yeong Hoon SOHN, Se Hong PARK
  • Patent number: 11632061
    Abstract: A power supply includes an inverter configured to direct current (DC) power into alternating current (AC) power, an impedance matching circuit configured to supply the AC power to a load; and a controller configured to adjust disposition of a powering period, in which the AC power is output, and a freewheeling period, in which the AC power is not output, to adjust a power amount of the power supplied to the load through the impedance matching circuit by the inverter.
    Type: Grant
    Filed: February 17, 2022
    Date of Patent: April 18, 2023
    Assignee: EN2CORE TECHNOLOGY, INC.
    Inventors: Yeong-Hoon Sohn, Se-Hong Park, Sae-Hoon Uhm
  • Publication number: 20230083958
    Abstract: A plasma generating apparatus according to an embodiment of the present invention comprises: a pair of electrodes arranged in a dielectric discharge tube; an initial discharge induction coil module; and a main discharge induction coil module. The initial discharge induction coil module and the main discharge induction coil module are connected to an RF power source, and the RF power source provides RF power having different resonance frequencies to the initial discharge induction coil module and the main discharge induction coil module, respectively.
    Type: Application
    Filed: November 15, 2022
    Publication date: March 16, 2023
    Inventors: Sae Hoon UHM, Yun Seong LEE, Yeong Hoon SOHN, Se Hong PARK
  • Patent number: 11532455
    Abstract: A plasma generating apparatus according to an embodiment of the present invention comprises: a pair of electrodes arranged in a dielectric discharge tube; an initial discharge induction coil module; and a main discharge induction coil module. The initial discharge induction coil module and the main discharge induction coil module are connected to an RF power source, and the RF power source provides RF power having different resonance frequencies to the initial discharge induction coil module and the main discharge induction coil module, respectively.
    Type: Grant
    Filed: December 27, 2019
    Date of Patent: December 20, 2022
    Assignee: EN2CORE TECHNOLOGY, INC.
    Inventors: Sae-Hoon Uhm, Yun-Seong Lee, Yeong-Hoon Sohn, Se-Hong Park
  • Publication number: 20220173670
    Abstract: A power supply includes an inverter configured to direct current (DC) power into alternating current (AC) power, an impedance matching circuit configured to supply the AC power to a load; and a controller configured to adjust disposition of a powering period, in which the AC power is output, and a freewheeling period, in which the AC power is not output, to adjust a power amount of the power supplied to the load through the impedance matching circuit by the inverter.
    Type: Application
    Filed: February 17, 2022
    Publication date: June 2, 2022
    Inventors: Yeong-Hoon SOHN, Se-Hong PARK, Sae-Hoon UHM
  • Patent number: 11290028
    Abstract: A power supply includes an inverter configured to direct current (DC) power into alternating current (AC) power, an impedance matching circuit configured to supply the AC power to a load; and a controller configured to adjust disposition of a powering period, in which the AC power is output, and a freewheeling period, in which the AC power is not output, to adjust a power amount of the power supplied to the load through the impedance matching circuit by the inverter.
    Type: Grant
    Filed: June 11, 2018
    Date of Patent: March 29, 2022
    Assignee: EN2CORE TECHNOLOGY, INC.
    Inventors: Yeong-Hoon Sohn, Se-Hong Park, Sae-Hoon Uhm
  • Patent number: 11258373
    Abstract: A power supply includes an inverter configured to convert direct current (DC) power into alternating current (AC) power, an impedance matching circuit configured to supply the AC power to a load, and a controller configured to detect a delay time of an output voltage and an output current output to the impedance matching circuit and the load and to adjust a frequency of the output voltage according to the detected delay time.
    Type: Grant
    Filed: June 11, 2018
    Date of Patent: February 22, 2022
    Assignee: EN2CORE TECHNOLOGY, INC.
    Inventors: Yeong-Hoon Sohn, Se-Hong Park, Sae-Hoon Uhm
  • Publication number: 20210319979
    Abstract: A plasma generating apparatus according to an embodiment of the present invention comprises: a pair of electrodes arranged in a dielectric discharge tube; an initial discharge induction coil module; and a main discharge induction coil module. The initial discharge induction coil module and the main discharge induction coil module are connected to an RF power source, and the RF power source provides RF power having different resonance frequencies to the initial discharge induction coil module and the main discharge induction coil module, respectively.
    Type: Application
    Filed: December 27, 2019
    Publication date: October 14, 2021
    Inventors: Sae-Hoon UHM, Yun-Seong LEE, Yeong-Hoon SOHN, Se-Hong PARK
  • Publication number: 20210226556
    Abstract: A power supply includes an inverter configured to direct current (DC) power into alternating current (AC) power, an impedance matching circuit configured to supply the AC power to a load; and a controller configured to adjust disposition of a powering period, in which the AC power is output, and a freewheeling period, in which the AC power is not output, to adjust a power amount of the power supplied to the load through the impedance matching circuit by the inverter.
    Type: Application
    Filed: June 11, 2018
    Publication date: July 22, 2021
    Inventors: Yeong-Hoon SOHN, Se-Hong PARK, Sae-Hoon UHM
  • Publication number: 20210226555
    Abstract: A power supply includes an inverter configured to convert direct current (DC) power into alternating current (AC) power, an impedance matching circuit configured to supply the AC power to a load, and a controller configured to detect a delay time of an output voltage and an output current output to the impedance matching circuit and the load and to adjust a frequency of the output voltage according to the detected delay time.
    Type: Application
    Filed: June 11, 2018
    Publication date: July 22, 2021
    Inventors: Yeong-Hoon SOHN, Se-Hong PARK, Sae-Hoon UHM