Patents by Inventor Yeong-Hun Han

Yeong-Hun Han has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of etching carbon-containing layer, method of forming contact hole using the same, and method of manufacturing semiconductor device using the same
    Publication number: 20100081286
    Abstract: A method of etching a carbon-containing layer, a method of forming a contact hole using the same, and a method of manufacturing a semiconductor device using the same, the method of etching a carbon-containing layer including forming a capping layer pattern on a carbon-containing layer to expose a portion of the carbon-containing layer, and plasma etching the exposed portion of the carbon-containing layer using an etching gas, wherein the etching gas includes oxygen gas and an inert gas, the inert gas being xenon gas or a gas mixture of xenon gas and argon gas.
    Type: Application
    Filed: September 16, 2009
    Publication date: April 1, 2010
    Inventors: Nam-Gun Kim, Sung-Il Cho, Yeong-Hun Han