Abstract: Provided is a thin film depositing apparatus. The thin film depositing apparatus includes: a process chamber including at least one sputter gun inducing a first plasma on a film or a flat plate; a loading unit provided at one side of the process chamber and including first and second loading chambers loading the film or the flat plate into the process chamber; and an unloading unit provided at the other side of the process chamber facing the loading unit and including first and second loading chambers including first and second unloading chambers unloading the film or the flat plate from the process chamber, wherein the first loading chamber is connected to the first unloading chamber or the second loading chamber is connected to the second unloading chamber at both sides of the process chamber.

Abstract: Provided is a thin film depositing apparatus. The thin film depositing apparatuses includes: a chamber where a process is performed on a subject to be processed; a plurality of supporters supporting the subject to be processed in the chamber; at least one sputter gun inducing a first plasma below or on the subject to be processed between the plurality of supporters; and a plurality of inductive coupled plasma tubes inducing a more expanded second plasma than the first plasma between the sputter gun and the subject to be processed.