Patents by Inventor Yeonock Han

Yeonock Han has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • ACETYLENE FLUID SUPPLY PACKAGE, SYSTEM COMPRISING THE SAME AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME
    Publication number: 20220260212
    Abstract: A composition comprising acetylene fluid at least partially solubilized in an improved solvent is described. The improved solvents exhibit non-toxicity and are further characterized by low vapor pressures to minimize solvent carryover during delivery of the acetylene fluid, while retaining suitable acetylene solubilizing capacity.
    Type: Application
    Filed: February 9, 2022
    Publication date: August 18, 2022
    Inventors: Ashwini K. Sinha, Xuemei Song, William S. Kane, Youn-Joung Cho, Wonwoong Chung, Yeonock Han
  • Gas storage cylinder, deposition system, and method of manufacturing semiconductor device
    Patent number: 10883173
    Abstract: A method of manufacturing a semiconductor device includes disposing a gas-storage cylinder storing monochlorosilane within a gas supply unit. The monochlorosilane is supplied from the gas-storage cylinder into a process chamber to form a silicon containing layer therein. The gas-storage cylinder includes manganese.
    Type: Grant
    Filed: November 26, 2018
    Date of Patent: January 5, 2021
    Assignee: SAMSUNG ELECTRONICS., LTD.
    Inventors: Yeonock Han, Wonwoong Chung, Keum Seok Park, Pankwi Park, Jeongho Yoo, Younjoung Cho, Byung Koo Kong, Mijeong Kim, Jin Wook Lee, Changeun Jang
  • GAS STORAGE CYLINDER, DEPOSITION SYSTEM, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
    Publication number: 20190309415
    Abstract: A method of manufacturing a semiconductor device includes disposing a gas-storage cylinder storing monochlorosilane within a gas supply unit. The monochlorosilane is supplied from the gas-storage cylinder into a process chamber to form a silicon containing layer therein. The gas-storage cylinder includes manganese.
    Type: Application
    Filed: November 26, 2018
    Publication date: October 10, 2019
    Applicant: SK-MATERIALS CO., LTD.
    Inventors: Yeonock Han, Wonwoong Chung, Keum Seok Park, Pankwi Park, Jeongho Yoo, Younjoung Cho, Byung Koo Kong, Mijeong Kim, Jin Wook Lee, Changeun Jang