Patents by Inventor Yeou-Hsin Hsieh

Yeou-Hsin Hsieh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photomask with dies relating to different functionalities
    Patent number: 6841313
    Abstract: A photomask having dies relating to different functionalities is disclosed. A photomask for performing lithography in conjunction with fabrication of one or more semiconductor devices includes one or more first semiconductor dies and one or more second semiconductor dies. Each first semiconductor die relates to first functionality having a first definition grade. Each second semiconductor die relates to second functionality different than the first functionality. The second functionality has a second definition grade at least substantially close to the first definition grade. For instance, the second definition grade may be identical to the first definition grade, or it may be immediately adjacent (i.e., sequentially related) to the first definition grade.
    Type: Grant
    Filed: May 31, 2002
    Date of Patent: January 11, 2005
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Fei-Gwo Tsai, Yeou-Hsin Hsieh, Chih-Chiang Tu, Yu-Chin King
  • Photomask with dies relating to different functionalities
    Publication number: 20030224148
    Abstract: A photomask having dies relating to different functionalities is disclosed. A photomask for performing lithography in conjunction with fabrication of one or more semiconductor devices includes one or more first semiconductor dies and one or more second semiconductor dies. Each first semiconductor die relates to first functionality having a first definition grade. Each second semiconductor die relates to second functionality different than the first functionality. The second functionality has a second definition grade at least substantially close to the first definition grade. For instance, the second definition grade may be identical to the first definition grade, or it may be immediately adjacent (i.e., sequentially related) to the first definition grade.
    Type: Application
    Filed: May 31, 2002
    Publication date: December 4, 2003
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Fei-Gwo Tsai, Yeou-Hsin Hsieh, Chih-Chiang Tu, Yu-Chin King