Patents by Inventor Yeqing Cui

Yeqing Cui has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and system for MOM capacitance value control
    Patent number: 10269893
    Abstract: A method for MOM capacitance value control is disclosed. The method comprises: S01: setting a target thicknesses for each metal layers; S02: after forming a current metal layer, measuring a thickness of the current metal layer; when the thickness of the current metal layer is equal to or less than a threshold value, then turning to step S03; S03: calculating multiple capacitance variations related to the current metal layer according to the thickness of the current metal layer; wherein each of the capacitance variation related to the current metal layer is between an actual capacitance value of a MOM capacitor combination associated with the current metal layer and a target capacitance value of the same MOM capacitor combination; S04: calculating updated target thicknesses for all subsequent metal layers according to the capacitance variations related to the current metal layer.
    Type: Grant
    Filed: November 30, 2017
    Date of Patent: April 23, 2019
    Assignee: SHANGHAI HUALI MICROELECTRONICS CORPORATION
    Inventors: Yeqing Cui, Ran Huang, Jianning Deng
  • METHOD AND SYSTEM FOR MOM CAPACITANCE VALUE CONTROL
    Publication number: 20180294330
    Abstract: A method for MOM capacitance value control is disclosed. The method comprises: S01: setting a target thicknesses for each metal layers; S02: after forming a current metal layer, measuring a thickness of the current metal layer; when the thickness of the current metal layer is equal to or less than a threshold value, then turning to step S03; S03: calculating multiple capacitance variations related to the current metal layer according to the thickness of the current metal layer; wherein each of the capacitance variation related to the current metal layer is between an actual capacitance value of a MOM capacitor combination associated with the current metal layer and a target capacitance value of the same MOM capacitor combination; S04: calculating updated target thicknesses for all subsequent metal layers according to the capacitance variations related to the current metal layer.
    Type: Application
    Filed: November 30, 2017
    Publication date: October 11, 2018
    Inventors: Yeqing Cui, Ran Huang, Jianning Deng