Patents by Inventor Yeqing LU

Yeqing LU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8796733
    Abstract: A low voltage tunnel field effect transistor includes a p-n tunnel junction, a gate-dielectric, a gate, a source-contact, and a drain-contact. The p-n tunnel junction includes a depletion region interfacing together a source-layer and a drain-layer. The depletion region includes a source-tunneling-region of the source-layer and a drain-tunneling-region of the drain-layer. When no external electric field is imposed, the depletion region of the p-n tunnel junction has an internal electric field that substantially points towards the source-tunneling-region and the drain-tunneling-region. The gate-dielectric is interfaced directly onto the drain-tunneling-region such that the drain-tunneling-region is between the source-tunneling-region and the gate-dielectric. The gate is interfaced onto the gate-dielectric such that the gate is configured to impose an external electric field which is oriented substantially in parallel to the internal electric field of the depletion region.
    Type: Grant
    Filed: August 9, 2011
    Date of Patent: August 5, 2014
    Assignees: University of Notre Dame du Lac, International Business Machines Corporation
    Inventors: Alan C. Seabaugh, Patrick Fay, Huili (Grace) Xing, Guangle Zhou, Yeqing Lu, Mark A. Wistey, Siyuranga Koswatta
  • Publication number: 20120032227
    Abstract: A low voltage tunnel field effect transistor includes a p-n tunnel junction, a gate-dielectric, a gate, a source-contact, and a drain-contact. The p-n tunnel junction includes a depletion region interfacing together a source-layer and a drain-layer. The depletion region includes a source-tunneling-region of the source-layer and a drain-tunneling-region of the drain-layer. When no external electric field is imposed, the depletion region of the p-n tunnel junction has an internal electric field that substantially points towards the source-tunneling-region and the drain-tunneling-region. The gate-dielectric is interfaced directly onto the drain-tunneling-region such that the drain-tunneling-region is between the source-tunneling-region and the gate-dielectric. The gate is interfaced onto the gate-dielectric such that the gate is configured to impose an external electric field which is oriented substantially in parallel to the internal electric field of the depletion region.
    Type: Application
    Filed: August 9, 2011
    Publication date: February 9, 2012
    Applicant: UNIVERSITY OF NOTRE DAME DU LAC
    Inventors: Alan C. SEABAUGH, Patrick FAY, Huili (Grace) XING, Guangle ZHOU, Yeqing LU, Mark A. WISTEY, Siyuranga KOSWATTA