Patents by Inventor Yeru Wang

Yeru Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11339468
    Abstract: A magnetron sputtering scanning method for manufacturing a silicon carbide optical reflector surface modification layer and improving surface profile includes (1) for a silicon carbide plane mirror to be modified, first utilizing diamond micro-powders to grind and roughly polish an aspherical silicon carbide reflector with a conventional polishing or CCOS numerical control machining method; (2) after the surface profile precision of the silicon carbide reflector satisfies a modification requirement, utilizing a strip-shaped magnetron sputtering source to deposit a compact silicon modification layer on the surface of the silicon carbide reflector; (3) then, utilizing a circular sputtering source to modify and improve the surface profile of the reflector; and (4) finally, finely polishing the modification layer, and achieving the requirements for machining the surface profile and roughness of the reflector.
    Type: Grant
    Filed: March 30, 2018
    Date of Patent: May 24, 2022
    Assignee: NANJING INSTITUTE OF ASTRONOMICAL OPTICS & TECHNOLOGY, NATIONAL ASTORNOMICAL OBSERVATORIES, CHINESE ACADEMY OF SCIENCES
    Inventors: Jinfeng Wang, Meng Huang, Jie Tian, Yeru Wang
  • Publication number: 20200270745
    Abstract: A magnetron sputtering scanning method for manufacturing a silicon carbide optical reflector surface modification layer and improving surface profile includes (1) for a silicon carbide plane mirror to be modified, first utilizing diamond micro-powders to grind and roughly polish an aspherical silicon carbide reflector with a conventional polishing or CCOS numerical control machining method; (2) after the surface profile precision of the silicon carbide reflector satisfies a modification requirement, utilizing a strip-shaped magnetron sputtering source to deposit a compact silicon modification layer on the surface of the silicon carbide reflector; (3) then, utilizing a circular sputtering source to modify and improve the surface profile of the reflector; and (4) finally, finely polishing the modification layer, and achieving the requirements for machining the surface profile and roughness of the reflector.
    Type: Application
    Filed: March 30, 2018
    Publication date: August 27, 2020
    Inventors: Jinfeng Wang, Meng Huang, Jie Tian, Yeru Wang
  • Patent number: 10359621
    Abstract: A frost-prevention film system of a large-aperture reflecting optic infrared telescope used in an extremely low temperature environment and a preparation method thereof is disclosed. The frost-prevention film system has the following structure: a transparent conducting film layer, an intermediate insulation layer, a reflecting film layer and an outermost medium protection layer in sequence from a main telescope mirror surface, wherein both sides of the transparent conducting film layer are provided with conducting electrodes. The steps are as follows: (1) a preparation step; (2) a step of plating a conducting film; (3) a step of plating an intermediate insulation layer; (4) a step of plating a reflecting film layer; (5) a step of plating an outermost medium protection layer; and (6) a step of plating conducting electrodes.
    Type: Grant
    Filed: April 29, 2016
    Date of Patent: July 23, 2019
    Assignee: NANJING INST OF ASTRONOMICAL OPTICS & TECH NAT ASTRONOMICAL OBSERVATORIES CHINESE ACAD OF SCIENCE
    Inventors: Jinfeng Wang, Yeru Wang, Jie Tian, Xinnan Li
  • Publication number: 20180149856
    Abstract: A frost-prevention film system of a large-aperture reflecting optic infrared telescope used in an extremely low temperature environment and a preparation method thereof is disclosed. The frost-prevention film system has the following structure: a transparent conducting film layer, an intermediate insulation layer, a reflecting film layer and an outermost medium protection layer in sequence from a main telescope mirror surface, wherein both sides of the transparent conducting film layer are provided with conducting electrodes. The steps are as follows: (1) a preparation step; (2) a step of plating a conducting film; (3) a step of plating an intermediate insulation layer; (4) a step of plating a reflecting film layer; (5) a step of plating an outermost medium protection layer; and (6) a step of plating conducting electrodes.
    Type: Application
    Filed: April 29, 2016
    Publication date: May 31, 2018
    Inventors: Jinfeng Wang, Yeru Wang, Jie Tian, Xinnan Li