Abstract: The present invention relates to a micro device for solid phase extraction and more particularly provides a micro device which is configured to perform solid phase extraction by injecting a filler and a solvent and producing a uniform flow of the solvent.

Abstract: A method for analyzing the structure of an insoluble pigment compound is disclosed. In some embodiments, a method comprise determining a molecular weight of the pigment compound, the insoluble pigment compound by ultrasonic treatment in a solvent to form partial structural compounds, analyzing the elemental composition and the structure of partial structural compounds by liquid chromatography/mass spectrometry and nuclear magnetic resonance, respectively and determining the structure of the insoluble pigment compound from the analysis of the partial structural compounds and the molecular weight of the insoluble pigment compound.

Abstract: The present invention relates to a novel dispersing agent capable of uniformly dispersing a variety of carbon-based materials in different media including aqueous solvents and a preparation method thereof, and a carbon-based material-dispersed composition including the same. The dispersing agent is a mixture of a plurality of polyaromatic hydrocarbon oxides, and the mixture includes polyaromatic hydrocarbon oxide having a molecular weight of 300 to 1000 in an amount of 60% by weight or more.

Abstract: A pretreatment method for analyzing dioxin compounds and an analytical method using the same, in which a column packed with polymer beads that are capable of selectively adsorbing dioxin compounds is used in a purification step during pretreatment, thereby remarkably reducing a time required for pretreatment and improving a recovery rate of an internal standard for purification, are provided.

Abstract: The present invention relates to a novel dispersing agent capable of uniformly dispersing a variety of carbon-based materials in different media including aqueous solvents and a preparation method thereof, and a carbon-based material-dispersed composition including the same. The dispersing agent is a mixture of a plurality of polyaromatic hydrocarbon oxides, and the mixture includes polyaromatic hydrocarbon oxide having a molecular weight of 300 to 1000 in an amount of 60% by weight or more.

Abstract: A thinner composition includes propylene glycol ether acetate, methyl 2-hydroxy-2-methyl propionate, and an ester compound such as ethyl lactate, ethyl 3-ethoxy propionate or a mixture thereof.

Abstract: A thinner composition includes propylene glycol ether acetate, methyl 2-hydroxy-2-methyl propionate, and an ester compound such as ethyl lactate, ethyl 3-ethoxy propionate or a mixture thereof.

Abstract: The photoresist composition of the present invention includes a solvent mixture, a resin, a photo acid generator, and a quencher, the solvent mixture comprising a first solvent containing an ether compound and a second solvent having a polarity stronger than the first solvent, wherein an amount of the first solvent is in a range of about 61% to about 79% by weight, and an amount of the second solvent is in a range of about 21% to about 39% by weight based on a total weight of the solvent mixture.

Abstract: A thinner composition includes propylene glycol ether acetate, methyl 2-hydroxy-2-methyl propionate, and an ester compound such as ethyl lactate, ethyl 3-ethoxy propionate or a mixture thereof.

Abstract: A photoresist composition for preventing exposing failures and a method of forming a pattern using the same are disclosed. The photoresist composition preferably comprises about 0.1% to about 0.5% by weight of a photo acid generator, and about 2% to about 10% by weight of a polymer resin, the PAG including a monophenyl sulfonium compound, a triphenyl sulfonium compound or a mixture thereof. The footing phenomenon and the top loss of a pattern are sufficiently prevented.

Abstract: An adhesive compound for use with a photoresist, the compound represented in accordance with the following chemical formula, A method for forming a photoresist pattern using the adhesive compound is also disclosed.

Abstract: The photoresist composition of the present invention includes a solvent mixture, a resin, a photo acid generator, and a quencher, the solvent mixture comprising a first solvent containing an ether compound and a second solvent having a polarity stronger than the first solvent, wherein an amount of the first solvent is in a range of about 61% to about 79% by weight, and an amount of the second solvent is in a range of about 21% to about 39% by weight based on a total weight of the solvent mixture.

Abstract: In a photoresist composition including a blocking group less sensitive to a temperature during a PEB process, the photoresist composition comprising from about 2% to about 10% by weight of a photosensitive resin, from about 0.1% to about 0.5% by weight of a photoacid generator, and a residual amount of a solvent, the photosensitive resin including a blocking group having a weight average molecular weight of from about 70 to about 130.

Abstract: A photoresist composition for preventing exposing failures and a method of forming a pattern using the same are disclosed. The photoresist composition preferably comprises about 0.1% to about 0.5% by weight of a photo acid generator, and about 2% to about 10% by weight of a polymer resin, the PAG including a monophenyl sulfonium compound, a triphenyl sulfonium compound or a mixture thereof. The footing phenomenon and the top loss of a pattern are sufficiently prevented.

Abstract: A thinner composition includes propylene glycol ether acetate, methyl 2-hydroxy-2-methyl propionate, and an ester compound such as ethyl lactate, ethyl 3-ethoxy propionate or a mixture thereof.

Abstract: An adhesive compound for use with a photoresist, the compound represented in accordance with the following chemical formula, A method for forming a photoresist pattern using the adhesive compound is also disclosed.