Abstract: A mirror for use in high power optical applications, the mirror comprising: a support plate comprising a synthetic diamond material; and a reflective coating disposed over the support plate, wherein the reflective coating comprises a bonding layer of carbide forming material which bonds the reflective coating to the synthetic diamond material in the support plate, a reflective metal layer disposed over the bonding layer, and one or more layers of dielectric material disposed over the reflective metal layer, wherein the bonding layer and the reflective metal layer together have a total thickness in a range 50 nm to 10 ?m with the reflective metal layer having a thickness of no more than 5 ?m, and wherein the support plate and the reflective coating are configured such that the mirror has a reflectivity of at least 99% at an operational wavelength of the mirror.

Abstract: An optical element comprising: synthetic diamond material; and an anti-reflective surface pattern formed directly in at least one surface of the synthetic diamond material, wherein the optical element has an absorption coefficient measured at room temperature of ?0.5 cm?1 at a wavelength of 10.6 ?m, wherein the optical element has a reflectance at said at least one surface of no more than 2% at an operating wavelength of the optical element, and wherein the optical element has a laser induced damage threshold meeting one or both of the following characteristics: the laser induced damage threshold is at least 30 Jcm?2 measured using a pulsed laser at a wavelength of 10.6 ?m with a pulse duration of 100 ns and a pulse repetition frequency in a range 1 to 10 Hz; and the laser induced damage threshold is at least 1 MW/cm2 measured using a continuous wave laser at a wavelength of 10.6 ?m.

Abstract: An optical element comprising: synthetic diamond material; and a flattened lens surface structure in the form of a zone plate, Fresnel lens, or a spherical lens formed directly in at least one surface of the synthetic diamond material, wherein the synthetic diamond material has an absorption coefficient measured at room temperature of ?0.5 cm?1 at a wavelength of 10.6 ?m, and wherein the synthetic diamond material has a laser induced damage threshold meeting one or both of the following characteristics: the laser induced damage threshold is at least 30 Jcm?2 measured using a pulsed laser at a wavelength of 10.6 ?m with a pulse duration of 100 ns and a pulse repetition frequency in a range 1 to 10 Hz; and the laser induced damage threshold is at least 1 MW/cm2 measured using a continuous wave laser at a wavelength of 10.6 ?m.

Abstract: A mirror for use in high power optical applications, the mirror comprising: a support plate comprising a synthetic diamond material; and a reflective coating disposed over the support plate, wherein the reflective coating comprises a bonding layer of carbide forming material which bonds the reflective coating to the synthetic diamond material in the support plate, a reflective metal layer disposed over the bonding layer, and one or more layers of dielectric material disposed over the reflective metal layer, wherein the bonding layer and the reflective metal layer together have a total thickness in a range 50 nm to 10 ?m with the reflective metal layer having a thickness of no more than 5 and wherein the support plate and the reflective coating are configured such that the mirror has a reflectivity of at least 99% at an operational wavelength of the mirror.

Abstract: An optical element comprising: synthetic diamond material; and a flattened lens surface structure in the form of a zone plate, Fresnel lens, or a spherical lens formed directly in at least one surface of the synthetic diamond material, wherein the synthetic diamond material has an absorption coefficient measured at room temperature of ?0.5 cm?1 at a wavelength of 10.6 ?m, and wherein the synthetic diamond material has a laser induced damage threshold meeting one or both of the following characteristics: the laser induced damage threshold is at least 30 Jcm?2 measured using a pulsed laser at a wavelength of 10.6 ?m with a pulse duration of 100 ns and a pulse repetition frequency in a range 1 to 10 Hz; and the laser induced damage threshold is at least 1 MW/cm2 measured using a continuous wave laser at a wavelength of 10.6 ?m.

Abstract: An optical element comprising: synthetic diamond material; and an anti-reflective surface pattern formed directly in at least one surface of the synthetic diamond material, wherein the optical element has an absorption coefficient measured at room temperature of ?0.5 cm?1 at a wavelength of 10.6 ?m, wherein the optical element has a reflectance at said at least one surface of no more than 2% at an operating wavelength of the optical element, and wherein the optical element has a laser induced damage threshold meeting one or both of the following characteristics: the laser induced damage threshold is at least 30 Jcm?2 measured using a pulsed laser at a wavelength of 10.6 ?m with a pulse duration of 100 ns and a pulse repetition frequency in a range 1 to 10 Hz; and the laser induced damage threshold is at least 1 MW/cm2 measured using a continuous wave laser at a wavelength of 10.6 ?m.

Abstract: An information storage device comprises a ferroelectric media, write circuitry to provide a first signal and a second signal to the ferroelectric media, a tip platform and a cantilever operably associated with the tip platform. A tip extends from the cantilever toward the ferroelectric media and includes a first conductive material communicating the first signal from the write circuitry to the ferroelectric media and a second conductive material communicating the second signal from the write circuitry to the ferroelectric media. A insulating material arranged between the first conductive material and the second conductive material to electrically isolate the first conductive material from the second conductive material.

Abstract: An embodiment of a method for forming a nano-imprint lithography template having very high feature counts includes exposing a sub-template using electron beam lithography, the sub-template including a fraction of the template, transferring a first pattern from the sub-template to the template using nano-imprinting lithography, repositioning the sub-template, and transferring a second pattern from the sub-template to the template using nano-imprinting lithography, wherein the template includes the first pattern and the second pattern.