Patents by Inventor Yi-Ann Lin

Yi-Ann Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of Forming an Integrated Circuit
    Publication number: 20200312663
    Abstract: A method of forming an integrated circuit includes forming a patterned mask layer on a material layer, wherein the patterned mask layer has a plurality of first features, and a first distance between adjacent first features of the plurality of first features. The method further includes patterning the material layer to form the first features in the material layer. The method further includes increasing the first distance between adjacent first features of the plurality of first features to a second distance. The method further includes treating portions of the material layer exposed by the patterned mask layer. The method further includes removing the patterned mask layer; and removing non-treated portions of the material layer.
    Type: Application
    Filed: May 22, 2020
    Publication date: October 1, 2020
    Inventors: Tzu-Yen Hsieh, Ming-Ching Chang, Chun-Hung Lee, Yi-Ann Lin, De-Fang Chen, Chao-Cheng Chen