Patents by Inventor Yi-Ching Chang

Yi-Ching Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250149092
    Abstract: A memory device including a memory array, a driver circuit, and a recover circuit is provided. The memory array includes multiple memory cells. Each memory cell is coupled to a control line, a data line, and a source line and, during a normal operation, is configured to receive first and second voltage signals. The driver circuit is configured to output at least one of the first voltage signal or the second voltage signal to the memory cells. The recover circuit is configured to output, during a recover operation, a third voltage signal, through the driver circuit to at least one of the memory cells. The third voltage signal is configured to have a first voltage level that is higher than a highest level of the first voltage signal or the second voltage signal, or lower than a lowest level of the first voltage signal or the second voltage signal.
    Type: Application
    Filed: January 14, 2025
    Publication date: May 8, 2025
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Pei-Chun LIAO, Yu-Kai CHANG, Yi-Ching LIU, Yu-Ming LIN, Yih WANG, Chieh LEE
  • Publication number: 20250141422
    Abstract: A balun includes a first coil, a second coil, a third coil, a fourth coil, and a capacitor. The first coil is coupled between an unbalanced pin and a first ground terminal. The second coil is coupled between the first ground terminal and a second ground terminal. The third coil is coupled between a first balanced pin and a connection point and is inductively coupled to the first coil. The fourth coil is coupled between the connection point and a second balanced pin and is inductively coupled to the second coil. The capacitor is coupled between the connection point and a third ground terminal.
    Type: Application
    Filed: June 4, 2024
    Publication date: May 1, 2025
    Applicant: REALTEK SEMICONDUCTOR CORP.
    Inventors: Yi-Ching Wu, Chia-Jun Chang
  • Patent number: 12260321
    Abstract: A data feature augmentation system and method for a low-precision neural network are provided. The data feature augmentation system includes a first time difference unit. The first time difference unit includes a first sample-and-hold circuit and a subtractor. The first sample-and-hold circuit is used for receiving an input signal and obtaining a first signal according to the input signal. The first signal is related to a first leakage rate of the first sample-and-hold circuit and the first signal is the signal generated by delaying the input signal by one time unit. The subtractor is used for performing subtraction on the input signal and the first signal to obtain a time difference signal. The input signal and the time difference signal are inputted to the low-precision neural network.
    Type: Grant
    Filed: July 26, 2021
    Date of Patent: March 25, 2025
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Fu-Cheng Tsai, Yi-Ching Kuo, Chih-Sheng Lin, Shyh-Shyuan Sheu, Tay-Jyi Lin, Shih-Chieh Chang
  • Publication number: 20250096522
    Abstract: An optoelectronic device includes a first substrate, a second substrate, a photonic integrated circuit, and a laser diode. The second substrate is over the first substrate. The photonic integrated circuit is disposed on the first substrate and includes a first waveguide channel, a second waveguide channel, and a patterned structure. The first waveguide channel and the second waveguide channel are coupled to the patterned structure. The laser diode is disposed on the second substrate and configured to emit a light beam toward the patterned structure.
    Type: Application
    Filed: September 19, 2024
    Publication date: March 20, 2025
    Applicant: AuthenX Inc.
    Inventors: Sheng-Fu LIN, Po-Kuan SHEN, Yi-Ting LU, Chu-Ching TSAI, Jenq-Yang CHANG, Mao-Jen WU
  • Patent number: 12249390
    Abstract: A memory device includes a first layer, wherein the first layer includes a first memory array, a first row decoder circuit, and a first column sensing circuit. The memory device includes a second layer disposed with respect to the first layer in a vertical direction. The second layer includes a first peripheral circuit operatively coupled to the first memory array, the first row decoder circuit, and the first column sensing circuit. The memory device includes a plurality of interconnect structures extending along the vertical direction. At least a first one of the plurality of interconnect structures operatively couples the second layer to the first layer.
    Type: Grant
    Filed: May 12, 2023
    Date of Patent: March 11, 2025
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chieh Lee, Yi-Ching Liu, Chia-En Huang, Jen-Yuan Chang, Yih Wang
  • Patent number: 12243589
    Abstract: A memory device is provided, including a memory array, a driver circuit, and recover circuit. The memory array includes multiple memory cells. Each memory cell is coupled to a control line, a data line, and a source line and, during a normal operation, is configured to receive first and second voltage signals. The driver circuit is configured to output at least one of the first voltage signal or the second voltage signal to the memory cells. The recover circuit is configured to output, during a recover operation, a third voltage signal, through the driver circuit to at least one of the memory cells. The third voltage signal is configured to have a first voltage level that is higher than a highest level of the first voltage signal or the second voltage signal, or lower than a lowest level of the first voltage signal or the second voltage signal.
    Type: Grant
    Filed: August 30, 2022
    Date of Patent: March 4, 2025
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Pei-Chun Liao, Yu-Kai Chang, Yi-Ching Liu, Yu-Ming Lin, Yih Wang, Chieh Lee
  • Publication number: 20250072027
    Abstract: In method of manufacturing a semiconductor device, a source/drain epitaxial layer is formed, one or more dielectric layers are formed over the source/drain epitaxial layer, an opening is formed in the one or more dielectric layers to expose the source/drain epitaxial layer, a first silicide layer is formed on the exposed source/drain epitaxial layer, a second silicide layer different from the first silicide layer is formed on the first silicide layer, and a source/drain contact is formed over the second silicide layer.
    Type: Application
    Filed: November 12, 2024
    Publication date: February 27, 2025
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Cheng-Wei CHANG, Shahaji B. MORE, Yi-Ying LIU, Yueh-Ching PAI
  • Publication number: 20250054627
    Abstract: A method for assessing acute kidney injury of inpatient includes the following steps. An electronic medical record data of an inpatient is captured by a processor, and the electronic medical record data includes a baseline basic serum creatinine concentration data. A target serum creatinine concentration data and a minimum post-admission serum creatinine concentration data of the inpatient are captured by the processor. A dynamic-increasing value of serum creatinine concentration is calculated to obtain by the processor based on the target serum creatinine concentration data, the baseline basic serum creatinine concentration data and the minimum post-admission serum creatinine concentration data. The dynamic-increasing value of serum creatinine concentration is analyzed by the processor to assess whether the inpatient is an inpatient suffering the acute kidney injury or not.
    Type: Application
    Filed: August 9, 2024
    Publication date: February 13, 2025
    Applicant: China Medical University
    Inventors: Chin-Chi Kuo, Hsiu-Yin Chiang, Hung-Chieh Yeh, Sheng-Ya Lu, Yi-Ching Chang
  • Publication number: 20250056851
    Abstract: A semiconductor device includes a first channel region, a second channel region, and a first insulating fin, the first insulating fin being interposed between the first channel region and the second channel region. The first insulating fin includes a lower portion and an upper portion. The lower portion includes a fill material. The upper portion includes a first dielectric layer on the lower portion, the first dielectric layer being a first dielectric material, a first capping layer on the first dielectric layer, the first capping layer being a second dielectric material, the second dielectric material being different than the first dielectric material, and a second dielectric layer on the first capping layer, the second dielectric layer being the first dielectric material.
    Type: Application
    Filed: October 28, 2024
    Publication date: February 13, 2025
    Inventors: Jen-Hong Chang, Yi-Hsiu Liu, You-Ting Lin, Chih-Chung Chang, Kuo-Yi Chao, Jiun-Ming Kuo, Yuan-Ching Peng, Sung-En Lin, Chia-Cheng Chao, Chung-Ting Ko
  • Publication number: 20250040039
    Abstract: A package assembly includes a substrate, an electronic component and a cover. The electronic component and the cover are disposed on the substrate, wherein the electronic component is located within a chamber between the cover and the substrate. A cooling liquid may be filled in a heat dissipation space of the cover, so as to dissipate the heat generated by the electronic component. Furthermore, the cooling liquid may be filled in the chamber where the electronic component is located, so as to directly dissipate the heat generated by the electronic component.
    Type: Application
    Filed: October 10, 2024
    Publication date: January 30, 2025
    Applicant: Wiwynn Corporation
    Inventors: Yi Cheng, Wei-Ching Chang, Kang-Bin Mah, Li-Wei Chen, Zi-Ping Wu, Ting-Yu Pai
  • Patent number: 12205648
    Abstract: Disclosed herein are related to a memory array including one-time programmable (OTP) cells. In one aspect, the memory array includes a set of OTP cells including a first subset of OTP cells connected between a first program control line and a first read control line. Each OTP cell of the first subset of OTP cells may include a programmable storage device and a switch connected between the first program control line and the first read control line. The first program control line may extend towards a first side of the memory array along a first direction, and the first read control line may extend towards a second side of the memory array facing away from the first side of the memory array.
    Type: Grant
    Filed: August 30, 2021
    Date of Patent: January 21, 2025
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Meng-Sheng Chang, Chia-En Huang, Yi-Ching Liu, Yih Wang
  • Patent number: 11776587
    Abstract: Memory devices are disclosed that support multiple power ramping sequences or modes. For example, a level shifter device is operably connected to a memory macro in a memory device. The level shifter device receives at least one gating signal. Based on a state of the at least one gating signal, the level shifter device outputs one or more signals that cause or control voltage signals in or received by the memory macro to ramp up, ramp down, or ramp up and ramp down according to one or more power ramping modes.
    Type: Grant
    Filed: November 9, 2021
    Date of Patent: October 3, 2023
    Inventors: Yi-Ching Chang, Yangsyu Lin, Yu-Hao Hsu, Cheng Lee
  • Patent number: 11545547
    Abstract: A semiconductor device and a method of forming the same, the semiconductor device includes a substrate, a gate structure, a first dielectric layer, a second dielectric layer, a first plug and two metal lines. The substrate has a shallow trench isolation and an active area, and the gate structure is disposed on the substrate to cover a boundary between the active area and the shallow trench isolation. The first dielectric layer is disposed on the substrate, to cover the gate structure, and the first plug is disposed in the first dielectric layer to directly in contact with a conductive layer of the gate structure and the active area. The second dielectric layer is disposed on the first dielectric layer, with the first plug and the gate being entirely covered by the first dielectric layer and the second dielectric layer. The two metal lines are disposed in the second dielectric layer.
    Type: Grant
    Filed: May 12, 2021
    Date of Patent: January 3, 2023
    Assignees: UNITED MICROELECTRONICS CORP., Fujian Jinhua Integrated Circuit Co., Ltd.
    Inventors: Feng-Yi Chang, Fu-Che Lee, Yi-Ching Chang, Kai-Lou Huang, Ying-Chih Lin, Gang-Yi Lin
  • Publication number: 20220254385
    Abstract: Memory devices are disclosed that support multiple power ramping sequences or modes. For example, a level shifter device is operably connected to a memory macro in a memory device. The level shifter device receives at least one gating signal. Based on a state of the at least one gating signal, the level shifter device outputs one or more signals that cause or control voltage signals in or received by the memory macro to ramp up, ramp down, or ramp up and ramp down according to one or more power ramping modes.
    Type: Application
    Filed: November 9, 2021
    Publication date: August 11, 2022
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yi-Ching Chang, Yangsyu Lin, Yu-Hao Hsu, Cheng Lee
  • Publication number: 20220064644
    Abstract: The present disclosure relates to a method of identifying a genetic modifier of a nucleotide repeat disorder, comprising selecting from the subjects the late-onset subjects with higher nucleotide repeat load or the early-onset subjects with lower nucleotide repeat load and identifying one or more genetic modifiers delaying or promoting onset of a nucleotide repeat disorder. The present disclosure also relates to a method for treating or preventing a polyglutamine (polyQ) expansion disease in a subject in need of such treatment or prevention, comprising administering an effective amount of a PIAS1 variant or a recombinant nucleic acid molecule encoding the PIAS1 variant to the subject. The present disclosure also relates to a method for treating or preventing early symptoms onset of the polyglutamine expansion disease, a PIAS1 variant, comprising one or more sequence changes located in the C-terminal region of PIAS1 and a recombinant nucleic acid molecule encoding the PIAS1 variant as disclosed herein.
    Type: Application
    Filed: August 30, 2021
    Publication date: March 3, 2022
    Inventors: Bing-Wen SOONG, Ueng-Cheng YANG, Yu-Shuen TSAI, Tzu-Hao CHENG, Yi-Juang CHERN, Ming-Tsan SU, Yi-Ching CHANG, Yan Hua LEE
  • Patent number: 11244948
    Abstract: A semiconductor device and method of forming the same, the semiconductor device includes a substrate, a first plug, a conductive pad and a capacitor structure. The first plug is disposed on the substrate, and the conductive pad is disposed on the first plug, with the conductive pad including a recessed shoulder portion at a top corner thereof. The capacitor structure is disposed on the conductive pad, to directly in connection with thereto.
    Type: Grant
    Filed: October 12, 2018
    Date of Patent: February 8, 2022
    Assignees: UNITED MICROELECTRONICS CORP., Fujian Jinhua Integrated Circuit Co., Ltd.
    Inventors: Feng-Yi Chang, Fu-Che Lee, Yi-Ching Chang, Kai-Lou Huang
  • Publication number: 20210265462
    Abstract: A semiconductor device and a method of forming the same, the semiconductor device includes a substrate, a gate structure, a first dielectric layer, a second dielectric layer, a first plug and two metal lines. The substrate has a shallow trench isolation and an active area, and the gate structure is disposed on the substrate to cover a boundary between the active area and the shallow trench isolation. The first dielectric layer is disposed on the substrate, to cover the gate structure, and the first plug is disposed in the first dielectric layer to directly in contact with a conductive layer of the gate structure and the active area. The second dielectric layer is disposed on the first dielectric layer, with the first plug and the gate being entirely covered by the first dielectric layer and the second dielectric layer. The two metal lines are disposed in the second dielectric layer.
    Type: Application
    Filed: May 12, 2021
    Publication date: August 26, 2021
    Inventors: Feng-Yi Chang, Fu-Che Lee, Yi-Ching Chang, Kai-Lou Huang, Ying-Chih Lin, Gang-Yi Lin
  • Patent number: D938360
    Type: Grant
    Filed: July 17, 2019
    Date of Patent: December 14, 2021
    Assignee: SCHNEIDER ELECTRIC IT CORPORATION
    Inventors: Yi-Ching Chang, Chung-Hui Chen, Zeqian Li
  • Patent number: D938361
    Type: Grant
    Filed: July 17, 2019
    Date of Patent: December 14, 2021
    Assignee: SCHNEIDER ELECTRIC IT CORPORATION
    Inventors: Yi-Ching Chang, Chung-Hui Chen, Zeqian Li
  • Patent number: D971153
    Type: Grant
    Filed: December 13, 2021
    Date of Patent: November 29, 2022
    Assignee: SCHNEIDER ELECTRIC IT CORPORATION
    Inventors: Yi-Ching Chang, Chung-Hui Chen, Zeqian Li