Patents by Inventor Yi-Ching Liu

Yi-Ching Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250149092
    Abstract: A memory device including a memory array, a driver circuit, and a recover circuit is provided. The memory array includes multiple memory cells. Each memory cell is coupled to a control line, a data line, and a source line and, during a normal operation, is configured to receive first and second voltage signals. The driver circuit is configured to output at least one of the first voltage signal or the second voltage signal to the memory cells. The recover circuit is configured to output, during a recover operation, a third voltage signal, through the driver circuit to at least one of the memory cells. The third voltage signal is configured to have a first voltage level that is higher than a highest level of the first voltage signal or the second voltage signal, or lower than a lowest level of the first voltage signal or the second voltage signal.
    Type: Application
    Filed: January 14, 2025
    Publication date: May 8, 2025
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Pei-Chun LIAO, Yu-Kai CHANG, Yi-Ching LIU, Yu-Ming LIN, Yih WANG, Chieh LEE
  • Publication number: 20250124960
    Abstract: A semiconductor device comprises a first conductive structure extending along a vertical direction and a second conductive structure extending along the vertical direction. The second conductive structure is spaced apart from the first conductive structure along a lateral direction. The semiconductor device further comprises a plurality of third conductive structures each extending along the lateral direction. The plurality of third conductive structures are disposed across the first and second conductive structures. The first and second conductive structures each have a varying width along the lateral direction. The plurality of third conductive structures are configured to be applied with respective different voltages in accordance with the varying width of the first and second conductive structures.
    Type: Application
    Filed: December 20, 2024
    Publication date: April 17, 2025
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Peng-Chun Liou, Zhiqiang Wu, Chung-Wei Wu, Yi-Ching Liu, Yih Wang
  • Patent number: 12266424
    Abstract: A memory circuit includes a first memory cell on a first layer, a second memory cell on a second layer different from the first layer, a first select transistor on a third layer different from the first layer and the second layer, and a first bit line extending in a first direction, and being coupled to the first memory cell and the second memory cell. The memory circuit further includes a first source line extending in the first direction, being coupled to the first memory cell, the second memory cell and the first select transistor, and being separated from the first bit line in a second direction different from the first direction. memory circuit includes a second source line extending in the first direction, and being coupled to the first select transistor.
    Type: Grant
    Filed: November 28, 2023
    Date of Patent: April 1, 2025
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Yi-Ching Liu, Chia-En Huang, Yih Wang
  • Patent number: 12249390
    Abstract: A memory device includes a first layer, wherein the first layer includes a first memory array, a first row decoder circuit, and a first column sensing circuit. The memory device includes a second layer disposed with respect to the first layer in a vertical direction. The second layer includes a first peripheral circuit operatively coupled to the first memory array, the first row decoder circuit, and the first column sensing circuit. The memory device includes a plurality of interconnect structures extending along the vertical direction. At least a first one of the plurality of interconnect structures operatively couples the second layer to the first layer.
    Type: Grant
    Filed: May 12, 2023
    Date of Patent: March 11, 2025
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chieh Lee, Yi-Ching Liu, Chia-En Huang, Jen-Yuan Chang, Yih Wang
  • Publication number: 20250078907
    Abstract: An integrated circuit includes a sense amplifier connected to a bit line and a bit line bar, a first memory cell configured to store a data signal and selectively output the data signal on at least one of the bit line and the bit line bar in response to a word line signal, a first circuit connected between a first voltage terminal configured to receive a first external voltage and the bit line and having a first enable terminal configured to receive a first enable signal, wherein the first external voltage is different than the data signal, and a second circuit connected between a second voltage terminal configured to receive a second external voltage and the bit line bar and having a second enable terminal configured to receive a second enable signal, wherein the second external voltage is different than the data signal and the first external voltage.
    Type: Application
    Filed: September 1, 2023
    Publication date: March 6, 2025
    Inventors: Chi Lo, Chia-En Huang, Yi-Ching Liu, Hiroki Noguchi, Yih Wang
  • Patent number: 12243589
    Abstract: A memory device is provided, including a memory array, a driver circuit, and recover circuit. The memory array includes multiple memory cells. Each memory cell is coupled to a control line, a data line, and a source line and, during a normal operation, is configured to receive first and second voltage signals. The driver circuit is configured to output at least one of the first voltage signal or the second voltage signal to the memory cells. The recover circuit is configured to output, during a recover operation, a third voltage signal, through the driver circuit to at least one of the memory cells. The third voltage signal is configured to have a first voltage level that is higher than a highest level of the first voltage signal or the second voltage signal, or lower than a lowest level of the first voltage signal or the second voltage signal.
    Type: Grant
    Filed: August 30, 2022
    Date of Patent: March 4, 2025
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Pei-Chun Liao, Yu-Kai Chang, Yi-Ching Liu, Yu-Ming Lin, Yih Wang, Chieh Lee
  • Publication number: 20250056785
    Abstract: An SRAM cell includes a first n-type channel (n-channel) layer engaged with a first gate layer to form a first device; a first p-type channel (p-channel) layer engaged with the first gate layer to form a second device, the first gate layer stacked between the first n-channel layer and the first p-channel layer along a first direction; a second n-channel layer engaged with a second gate layer to form a third device, the second gate layer coupled to a first word line and the second n-channel layer coupled to the first n-channel layer along a second direction perpendicular to the first direction; a third n-channel layer engaged with a third gate layer to form a fourth device, the third n-channel layer spaced from the second n-channel layer along a third direction perpendicular to the first direction and the second direction; a second p-channel layer engaged with the third gate layer to form a fifth device, the third gate layer stacked between the third n-channel layer and the second p-channel layer along the fir
    Type: Application
    Filed: August 7, 2023
    Publication date: February 13, 2025
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Kuan-Chung Chiu, Wei-Hua Chen, Chieh LEE, Chun-Ying LEE, Yi-Ching LIU, Chia-En Huang
  • Patent number: 12217790
    Abstract: A device includes a substrate, a first sense amplifier disposed on the substrate, a first word line driver disposed on the substrate and situated adjacent the first sense amplifier in the x-direction, and a first memory array disposed above the first sense amplifier and above the first word line driver in the z-direction. A plurality of first conductive segments extend alternately in the x-direction and the y-direction, and are disposed between the first memory array and the first sense amplifier and configured to electrically connect the first sense amplifier to a first bit line of the first memory array. A plurality of second conductive segments extend alternately in the x-direction and the y-direction, and are disposed between the first memory array and the first word line driver and configured to electrically connect the first word line driver to a first word line of the first memory array.
    Type: Grant
    Filed: March 13, 2023
    Date of Patent: February 4, 2025
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chieh Lee, Chia-En Huang, Chun-Ying Lee, Yi-Ching Liu, Yih Wang, Rose Tseng, Yao-Jen Yang, Jonathan Tsung-Yung Chang
  • Publication number: 20250040143
    Abstract: One aspect of this description relates to a semiconductor device. In some embodiments, the semiconductor device includes a first drain/source structure extending in a first direction, a second drain/source structure extending the first direction and spaced from the first drain/source structure in a second direction perpendicular to the first direction, a third drain/source structure extending in the first direction and spaced from the second drain/source structure in the second direction, a first bit line disposed over the first drain/source structure in the first direction, a common select line that includes a portion disposed over the second drain/source structure in the first direction, a second bit line disposed over the third drain/source structure in the first direction, and a charge storage layer coupled to at least a first sidewall of each of the first drain/source structure, the second drain/source structure, and the third drain/source structure.
    Type: Application
    Filed: July 28, 2023
    Publication date: January 30, 2025
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Meng-Han Lin, Chia-En Huang, Yi-Ching Liu
  • Patent number: 12205648
    Abstract: Disclosed herein are related to a memory array including one-time programmable (OTP) cells. In one aspect, the memory array includes a set of OTP cells including a first subset of OTP cells connected between a first program control line and a first read control line. Each OTP cell of the first subset of OTP cells may include a programmable storage device and a switch connected between the first program control line and the first read control line. The first program control line may extend towards a first side of the memory array along a first direction, and the first read control line may extend towards a second side of the memory array facing away from the first side of the memory array.
    Type: Grant
    Filed: August 30, 2021
    Date of Patent: January 21, 2025
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Meng-Sheng Chang, Chia-En Huang, Yi-Ching Liu, Yih Wang
  • Publication number: 20250024657
    Abstract: A method includes depositing a metal to form a gate layer for a first memory cell in a metallization layer of the semiconductor device. The method includes forming a plurality of semiconductor channels separated from the gate layer by a gate oxide layer. The method includes defining a plurality of gates from the gate layer. The method includes interconnecting the plurality of gates and the plurality of semiconductor channels to form a memory cell, wherein the interconnection comprises a plurality of mezzanine levels.
    Type: Application
    Filed: July 11, 2023
    Publication date: January 16, 2025
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Wei-Hua Chen, Kuan-Chung Chiu, Chieh Lee, Chun-Ying Lee, Chia-En Huang, Yi-Ching Liu
  • Patent number: 12190931
    Abstract: A semiconductor device comprises a first conductive structure extending along a vertical direction and a second conductive structure extending along the vertical direction. The second conductive structure is spaced apart from the first conductive structure along a lateral direction. The semiconductor device further comprises a plurality of third conductive structures each extending along the lateral direction. The plurality of third conductive structures are disposed across the first and second conductive structures. The first and second conductive structures each have a varying width along the lateral direction. The plurality of third conductive structures are configured to be applied with respective different voltages in accordance with the varying width of the first and second conductive structures.
    Type: Grant
    Filed: June 16, 2023
    Date of Patent: January 7, 2025
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Peng-Chun Liou, Zhiqiang Wu, Chung-Wei Wu, Yi-Ching Liu, Yih Wang
  • Publication number: 20240415740
    Abstract: A nasogastric tube is provided, and includes an adapter and an extension in order to construct a first path and a second path that are separated from each other. The extension is constructed as a single tube body with a front end disposed on the adapter, the extension has a first passage and a second passage that are separated from each other. The adapter includes a first connection port and a second connection port respectively connected to the first passage and the second passage. The extension has a first opening connected to the first passage, a portion of the extension where the first opening exists is configured to define a working portion, the working portion is configured to be positioned only in the hypopharynx, and the working portion is ranged from 0.1 cm to 3 cm in an elongated direction of the extension.
    Type: Application
    Filed: August 27, 2024
    Publication date: December 19, 2024
    Inventors: YI-CHING LIU, HSIN-HUA TSAI
  • Publication number: 20240389347
    Abstract: A memory device includes a three dimensional memory array having memory cells arranged on multiple floors in rows and columns. Each column is associated with a bit line and a select line. The memory device further includes select gate pairs each being associated with a column. The bit line of a column is connectable to a corresponding a global bit line through a first select gate of a select gate pair associated with the column and a select line of the column is connectable to a corresponding global select line through the second select gate of the select gate pair associated with the column. The plurality of select gate pairs are formed in a different layer than the plurality of memory cells.
    Type: Application
    Filed: July 30, 2024
    Publication date: November 21, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chia-Ta Yu, Chia-En Huang, Yi-Ching Liu, Yih Wang, Sai-Hooi Yeong, Yu-Ming Lin
  • Publication number: 20240371433
    Abstract: A memory structure includes a first memory array having bit lines; a second memory array having bit lines; a first sense amplifier connected to a first bit line of the first memory array and a first bit line of the second memory array; and a second sense amplifier connected to a second bit line of the first memory array and a second bit line of the second memory array. The second bit line of the first memory array is adjacent to the first bit line of the first memory array, and the second bit line of the second memory array is adjacent to the first bit line of the second memory array.
    Type: Application
    Filed: July 13, 2024
    Publication date: November 7, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chieh Lee, Yi-Ching Liu, Chia-En Huang, Wen-Chang Cheng, Jonathan Tsung-Yung Chang
  • Patent number: 12137571
    Abstract: An integrated circuit is provided. The integrated circuit includes a three-dimensional memory device, a first word line driving circuit and a second word line driving circuit. The three-dimensional memory device includes stacking structures separately extending along a column direction. Each stacking structure includes a stack of word lines. The stacking structures have first staircase structures at a first side and second staircase structures at a second side. The word lines extend to steps of the first and second staircase structures. The first and second word line driving circuits lie below the three-dimensional memory device, and extend along the first and second sides, respectively. Some of the word lines in each stacking structure are routed to the first word line driving circuit from a first staircase structure, and others of the word lines in each stacking structure are routed to the second word line driving circuit from a second staircase structure.
    Type: Grant
    Filed: November 21, 2023
    Date of Patent: November 5, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Bo-Feng Young, Yi-Ching Liu, Sai-Hooi Yeong, Yih Wang, Yu-Ming Lin
  • Patent number: 12137570
    Abstract: A memory device includes a three dimensional memory array having memory cells arranged on multiple floors in rows and columns. Each column is associated with a bit line and a select line. The memory device further includes select gate pairs each being associated with a column. The bit line of a column is connectable to a corresponding a global bit line through a first select gate of a select gate pair associated with the column and a select line of the column is connectable to a corresponding global select line through the second select gate of the select gate pair associated with the column. The plurality of select gate pairs are formed in a different layer than the plurality of memory cells.
    Type: Grant
    Filed: December 30, 2021
    Date of Patent: November 5, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chia-Ta Yu, Chia-En Huang, Yi-Ching Liu, Yih Wang, Sai-Hooi Yeong, Yu-Ming Lin
  • Publication number: 20240365556
    Abstract: In some embodiments, an integrated circuit (IC) device includes an active semiconductor layer, a circuitry formed within the active semiconductor layer, a region including conductive layers formed in a back-end-of-line (BEOL) layer above the active semiconductor layer, and a memory module formed in the BEOL layer. The memory device includes a three-dimensional array of memory cells, each adapted to store a weight value, and adapted to generate at each memory cell a signal indicative of a product between the stored weight value and an input signal applied to the memory cell. The memory module is further adapted to transmit the product signals from the memory cell simultaneously in the direction of the active semiconductor layer.
    Type: Application
    Filed: July 11, 2024
    Publication date: October 31, 2024
    Inventors: Chieh Lee, Chia-En Huang, Yi-Ching Liu, Wen-Chang Cheng, Yih Wang
  • Publication number: 20240355364
    Abstract: Disclosed herein are related to a memory array including a set of memory cells and a set of switches to configure the set of memory cells. In one aspect, each switch is connected between a corresponding local line and a corresponding subset of memory cells. The local clines may be connected to a global line. Local lines may be metal rails, for example, local bit lines or local select lines. A global line may be a metal rail, for example, a global bit line or a global select line. A switch may be enabled or disabled to electrically couple a controller to a selected subset of memory cells through the global line. Accordingly, the set of memory cells can be configured through the global line rather than a number of metal rails to achieve area efficiency.
    Type: Application
    Filed: July 3, 2024
    Publication date: October 24, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Meng-Sheng Chang, Chia-En Huang, Yi-Ching Liu, Yih Wang
  • Publication number: 20240341075
    Abstract: A semiconductor device includes a conductive layer extending along a first lateral direction; a gate dielectric layer disposed over the conductive layer; a channel layer disposed over the gate dielectric layer and extending along a second lateral direction perpendicular to the first lateral direction; a first via-like structure, in direct contact with the channel layer, that is disposed along a first edge of the first channel extending along the second lateral direction; and a second via-like structure, in direct contact with the channel layer, that is disposed along a second, opposite edge of the first channel extending along the second lateral direction. The first via-like structure and second via-like structure are laterally separated apart along a third lateral direction that is clockwise tilted from the second lateral direction with a first positive angle.
    Type: Application
    Filed: April 5, 2023
    Publication date: October 10, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Peng-Chun Liou, Ya-Yun Cheng, Chia-En Huang, Yi-Ching Liu, Zhiqiang Wu, Yih Wang