Abstract: An anti-lift sunroof structure is provided, which can be opened and closed on an opening of a vehicle roof. The anti-lift sunroof structure includes a glass panel, a window frame, and a support element. The window frame includes a front frame bar, two side frame bars, and a rear frame bar. Two ends of each side frame bar are respectively connected to the front frame bar and the rear frame bar to form a mounting groove for installation of the glass panel. The support element is arranged corresponding to the front frame bar and includes a stop plate extended away from the rear frame bar. When the anti-lift sunroof structure is in a close position, the stop plate is located under the vehicle roof. Accordingly, sealing capability is prevented from being affected by excessive outward suction from a pressure difference when the vehicle is running at high speed.

Abstract: A sunroof device includes a glass panel, a window frame and a waterproof strip. The window frame is disposed on a periphery of the glass panel. A periphery of the window frame is outward extended with an end seat. The end seat is disposed with an end plug. The end plug projects from the end seat. A projecting direction of the end plug is parallel with an outer edge of the window frame. The waterproof strip is attached on the outer edge of the window frame and is in a hollow manner to form a receiving space therein. The receiving space is in a tubular manner. The end plug is extended along a longitudinal direction of the waterproof strip to be embedded in the receiving space of the waterproof strip.

Abstract: A window panel assembly includes a glass panel, a window frame and a sealing strip. The window frame is installed on the glass panel, the window frame includes an abutment seat extended therefrom. The abutment seat includes a connecting portion and an elastic arm portion. The connecting portion is connected to the window frame and the elastic arm portion. The elastic arm portion includes an abutment surface. The abutment seat includes blocking surfaces at two sides of the abutment surface. A buffer space is formed between the elastic portion and the window frame. The sealing strip is arranged at the window frame, and the sealing strip abuts against the blocking surfaces. Accordingly, the sealing effect of the window panel assembly during closing is improved without gaps.

Abstract: A window plate assembly includes: a glass panel (10); a window frame (20) disposed at a periphery of the glass panel (10), an outer periphery of the window frame (20) is disposed with a buckling groove (22) and extended with a block flange (23), a planar surface (24) is formed between the buckling groove (22) and the block flange (23); and a seal (30) having an abutting part (31) and a buckling part (32) extended from the abutting part (31), the buckling part (32) is buckled in the buckling groove (22) to make the abutting part (31) abut against the planar surface (24) and the block flange (23), and a buckling direction of the buckling part (32) and the buckling groove (22) is perpendicular to the planar surface (24).

Abstract: A sunroof device which includes a roof, a roof frame, a window plate assembly, and a pair of link assemblies. The roof is disposed with an opening. The roof frame is attached to the roof corresponding to the opening and includes a pair of sliding rails separately arranged corresponding to two sides of the opening. An outline of the roof frame is non-matched with an outline of the opening. The window plate assembly is connected on the pair of sliding rails. An outline of the window plate assembly is matched with the outline of the opening. A periphery of the window plate assembly is disposed with a waterproof strip abutting against an inner edge of the opening. Each link assembly is disposed on corresponding one of the sliding rails and is connected to the window plate assembly.

Abstract: This disclosure is directed to a waterproof structure having a front window assembly, a rear window assembly and a pair of window side frame bars. The front window assembly has a front glass panel, a front frame, and a rear side portion. The rear window assembly has a rear glass panel, a rear sealing strip, a pair of side edges, and a front side portion connected between the pair of side edges. Each window side frame bar has a protrusion extended toward the rear side portion. The rear side portion has a pair of cover portions extended from two ends respectively, the front frame abuts against the rear sealing strip when the rear side portion moves to the front side portion, and the rear sealing strip and the protrusions are covered by the cover portions respectively.

Abstract: Disclosed herein is a process for producing a postbiotic extract, which includes providing a first material having a first isoelectric point ranging from pH 1 to pH 6 and a second material having a second isoelectric point ranging from pH 4 to pH 8, admixing the first material and a probiotic microorganism with water having a pH greater than the second isoelectric point, so as to form a mixture, adding the second material into the mixture and then adjusting a pH of the second material-added mixture to between the first and second isoelectric points so that a precipitate is formed, and subjecting the precipitate to a cell wall isolation treatment to obtain the postbiotic extract. Use of the postbiotic extract is also disclosed.

Abstract: Disclosed herein is a process for producing a postbiotic extract, which includes providing a first material having a first isoelectric point ranging from pH 1 to pH 6 and a second material having a second isoelectric point ranging from pH 4 to pH 8, admixing the first material and a probiotic microorganism with water having a pH greater than the second isoelectric point, so as to form a mixture, adding the second material into the mixture and then adjusting a pH of the second material-added mixture to between the first and second isoelectric points so that a precipitate is formed, and subjecting the precipitate to a cell wall isolation treatment to obtain the postbiotic extract. Use of the postbiotic extract is also disclosed.

Abstract: Disclosed herein is a process for producing a postbiotic extract, which includes providing a first material having a first isoelectric point ranging from pH 1 to pH 6 and a second material having a second isoelectric point ranging from pH 4 to pH 8, admixing the first material and a probiotic microorganism with water having a pH greater than the second isoelectric point, so as to form a mixture, adding the second material into the mixture and then adjusting a pH of the second material-added mixture to between the first and second isoelectric points so that a precipitate is formed, and subjecting the precipitate to a cell wall isolation treatment to obtain the postbiotic extract. Use of the postbiotic extract is also disclosed.

Abstract: Disclosed herein is a process for producing a postbiotic extract, which includes providing a first material having a first isoelectric point ranging from pH 1 to pH 6 and a second material having a second isoelectric point ranging from pH 4 to pH 8, admixing the first material and a probiotic microorganism with water having a pH greater than the second isoelectric point, so as to form a mixture, adding the second material into the mixture and then adjusting a pH of the second material-added mixture to between the first and second isoelectric points so that a precipitate is formed, and subjecting the precipitate to a cell wall isolation treatment to obtain the postbiotic extract. Use of the postbiotic extract is also disclosed.

Abstract: Disclosed herein is a method for preventing or alleviating particulate matter-induced lung injury. The method includes administering to a subject in need thereof a pharmaceutical composition including at least one heat-killed lactic acid bacterial strain that is selected from the group consisting of Lactobacillus plantarum CB102 which is deposited at the Deutsche Sammlung von Mikroorganismen und Zellkulturen (DSMZ) GmbH under an accession number DSM 33894, Lactobacillus acidophilus JCM 1132, Bifidobacterium longum CB108 which is deposited at the DSMZ GmbH under an accession number DSM 33895, Bifidobacterium animalis subsp. lactis JCM 10602, and combinations thereof.

Abstract: Disclosed herein is a process for producing a postbiotic extract, which includes providing a first material having a first isoelectric point ranging from pH 1 to pH 6 and a second material having a second isoelectric point ranging from pH 4 to pH 8, admixing the first material and a probiotic microorganism with water having a pH greater than the second isoelectric point, so as to form a mixture, adding the second material into the mixture and then adjusting a pH of the second material-added mixture to between the first and second isoelectric points so that a precipitate is formed, and subjecting the precipitate to a cell wall isolation treatment to obtain the postbiotic extract. Use of the postbiotic extract is also disclosed.

Abstract: A method for alleviating arthritis includes administering to a subject in need thereof a postbiotic extract. The postbiotic extract is prepared by a process including the steps of providing a first material having a first isoelectric point ranging from pH 1 to pH 6 and a second material having a second isoelectric point ranging from pH 4 to pH 8, admixing the first material and a probiotic microorganism with water having a pH greater than the second isoelectric point, so as to forma mixture, adding the second material into the mixture and then adjusting a pH of the second material-added mixture to between the first and second isoelectric points so that a precipitate is formed, and subjecting the precipitate to a cell wall isolation treatment to obtain the postbiotic extract.

Abstract: A method for improving skin condition includes administering to a subject in need thereof a postbiotic extract. The postbiotic extract is prepared by a process including the steps of providing a first material having a first isoelectric point ranging from pH 1 to pH 6 and a second material having a second isoelectric point ranging from pH 4 to pH 8, admixing the first material and a probiotic microorganism with water having a pH greater than the second isoelectric point, so as to forma mixture, adding the second material into the mixture and then adjusting a pH of the second material-added mixture to between the first and second isoelectric points so that a precipitate is formed, and subjecting the precipitate to a cell wall isolation treatment to obtain the postbiotic extract.

Abstract: A method for alleviating arthritis includes administering to a subject in need thereof a postbiotic extract. The postbiotic extract is prepared by a process including the steps of providing a first material having a first isoelectric point ranging from pH 1 to pH 6 and a second material having a second isoelectric point ranging from pH 4 to pH 8, admixing the first material and a probiotic microorganism with water having a pH greater than the second isoelectric point, so as to forma mixture, adding the second material into the mixture and then adjusting a pH of the second material-added mixture to between the first and second isoelectric points so that a precipitate is formed, and subjecting the precipitate to a cell wall isolation treatment to obtain the postbiotic extract.

Abstract: A method for improving skin condition includes administering to a subject in need thereof a postbiotic extract. The postbiotic extract is prepared by a process including the steps of providing a first material having a first isoelectric point ranging from pH 1 to pH 6 and a second material having a second isoelectric point ranging from pH 4 to pH 8, admixing the first material and a probiotic microorganism with water having a pH greater than the second isoelectric point, so as to forma mixture, adding the second material into the mixture and then adjusting a pH of the second material-added mixture to between the first and second isoelectric points so that a precipitate is formed, and subjecting the precipitate to a cell wall isolation treatment to obtain the postbiotic extract.

Abstract: Disclosed herein is a process for producing a postbiotic extract, which includes providing a first material having a first isoelectric point ranging from pH 1 to pH 6 and a second material having a second isoelectric point ranging from pH 4 to pH 8, admixing the first material and a probiotic microorganism with water having a pH greater than the second isoelectric point, so as to form a mixture, adding the second material into the mixture and then adjusting a pH of the second material-added mixture to between the first and second isoelectric points so that a precipitate is formed, and subjecting the precipitate to a cell wall isolation treatment to obtain the postbiotic extract. Use of the postbiotic extract is also disclosed.