Patents by Inventor Yi-Hsien Chen

Yi-Hsien Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11963295
    Abstract: Provided are a circuit apparatus, a manufacturing method thereof, and a circuit system. The circuit apparatus includes a flexible circuit board, a flexible packaging material layer and an electronic device. The flexible circuit board has at least one hollow pattern, wherein the flexible circuit board has an inner region and a peripheral region surrounding the inner region, and has a first surface and a second surface opposite to each other. The flexible packaging material layer is disposed in the at least one hollow pattern. The electronic device is disposed on the first surface of the flexible circuit board and electrically connected with the flexible circuit board.
    Type: Grant
    Filed: January 27, 2022
    Date of Patent: April 16, 2024
    Assignee: Industrial Technology Research Institute
    Inventors: Hung-Hsien Ko, Yi-Cheng Lu, Heng-Yin Chen, Hao-Wei Yu, Te-Hsun Lin
  • Patent number: 11953913
    Abstract: There is provided a smart detection system including multiple sensors and a central server. The central server confirms a model of every sensor and a position thereof in an operation area. The central server confirms an event position and predicts a user action according to event signals sent by the multiple sensors.
    Type: Grant
    Filed: August 30, 2021
    Date of Patent: April 9, 2024
    Assignee: PIXART IMAGING INC.
    Inventors: Yi-Hsien Ko, Yen-Min Chang, Nien-Tse Chen
  • Publication number: 20240112957
    Abstract: A fabrication method is disclosed that includes: forming a first metal layer over first and second semiconductor structures; forming a first patterned photolithographic layer with an opening that exposes a portion of the first metal layer over the first semiconductor structure but not to a boundary between semiconductor structures; removing the exposed portion of the first metal layer; forming a second metal layer over the first and second semiconductor structures; forming a second patterned photolithographic layer with an opening that exposes a portion of the second metal layer over the second semiconductor structure but not to the boundary; removing the exposed portion of the first and second metal layers; wherein a barrier structure is generated between the first and second semiconductor structures that includes remaining portions of the first metal layer and a portion of the second metal layer overlying the remaining portions of the first metal layer.
    Type: Application
    Filed: January 12, 2023
    Publication date: April 4, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yu-Xuan Wang, Cheng-Chun Tseng, Yi-Chun Chen, Yu-Hsien Lin, Ryan Chia-Jen Chen
  • Patent number: 11943935
    Abstract: A layout pattern of a magnetoresistive random access memory (MRAM) includes a substrate having a first cell region, a second cell region, a third cell region, and a fourth cell region and a diffusion region on the substrate extending through the first cell region, the second cell region, the third cell region, and the fourth cell region. Preferably, the diffusion region includes a H-shape according to a top view.
    Type: Grant
    Filed: September 26, 2022
    Date of Patent: March 26, 2024
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Chun-Yen Tseng, Shu-Ru Wang, Yu-Tse Kuo, Chang-Hung Chen, Yi-Ting Wu, Shu-Wei Yeh, Ya-Lan Chiou, Chun-Hsien Huang
  • Publication number: 20240092662
    Abstract: A method for removing a heavy metal from water includes subjecting a microbial solution containing a liquid culture of a urease-producing bacterial strain and a reaction solution containing a manganese compound and urea to a microbial-induced precipitation reaction, so as to obtain biomineralized manganese carbonate (MnCO3) particles, admixing the biomineralized MnCO3 particles with water containing a heavy metal, so that the biomineralized MnCO3 particles adsorb the heavy metal in the water to form a precipitate, and removing the precipitate from the water.
    Type: Application
    Filed: February 9, 2023
    Publication date: March 21, 2024
    Inventors: Chien-Yen CHEN, Yi-Hsun HUANG, Pin-Yun LIN, Anggraeni Kumala DEWI, Koyeli DAS, Uttara SUKUL, Tsung-Hsien CHEN, Raju Kumar SHARMA, Cheng-Kang LU, Chung-Ming LU
  • Publication number: 20240068705
    Abstract: This disclosure is a condensate evaporation device. An air conditioning apparatus includes a compressor, an evaporator and a condenser connected with one another. A water tray is arranged to receive the condensate. A water distribution module includes a water separator base and a water separator piece. The water separator piece and the water separator base are combined to define a water channel. The condensate flows through the water channel to evenly flow out. A multi-folded water absorbing body is arranged on one side of the water separator base to absorb the condensate flowed out from the water separator base. The water tank is arranged on a bottom side of the multi-folded water absorbing body. A fan is arranged on one side of the multi-folded water absorbing body. Accordingly, the condensate may be evaporated efficiently.
    Type: Application
    Filed: January 18, 2023
    Publication date: February 29, 2024
    Inventors: Chao-Hsien CHAN, Yi-Chung CHOU, Chun-Hsun CHEN
  • Publication number: 20240014292
    Abstract: Semiconductor structures and methods of forming the same are provided. A semiconductor structure according to the present disclosure includes an active region having a channel region and a source/drain region, a gate structure over the channel region, a gate spacer layer disposed over the channel region and extending along a sidewall of the gate structure, an epitaxial source/drain feature over the source/drain region, a contact etch stop layer (CESL) disposed on the epitaxial source/drain feature and extending along a sidewall of the gate spacer layer, a source/drain contact disposed over the epitaxial source/drain feature, and a dielectric cap layer disposed over the gate structure, the gate spacer layer and at least a portion of the CESL. A sidewall of the source/drain contact is in direct contact with a sidewall of the CESL.
    Type: Application
    Filed: January 6, 2023
    Publication date: January 11, 2024
    Inventors: Ta-Chun Lin, Yi-Hsien Chen, Wen-Cheng Luo, Chung-Ting Li, Yi-Shien Mor, Chih-Hao Chang
  • Publication number: 20230299154
    Abstract: A method according to the present disclosure includes receiving a workpiece that includes a first gate structure including a first cap layer thereon, a first source/drain contact adjacent the first gate structure, a second gate structure including a second cap layer thereon, a second source/drain contact, an etch stop layer (ESL) over the first source/drain contact and the second source/drain contact, and a first dielectric layer over the ESL. The method further includes forming a butted contact opening to expose the first cap layer and the first source/drain contact, forming a butted contact in the butted contact opening, after the forming of the butted contact, depositing a second dielectric layer, forming a source/drain contact via opening through the second dielectric layer, the ESL layer, and the first dielectric layer to expose the second source/drain contact, and forming a source/drain contact via in the source/drain contact via opening.
    Type: Application
    Filed: May 22, 2023
    Publication date: September 21, 2023
    Inventors: Fu-Hsiang Su, Yi Hsien Chen
  • Patent number: 11658215
    Abstract: A method according to the present disclosure includes receiving a workpiece that includes a first gate structure including a first cap layer thereon, a first source/drain contact adjacent the first gate structure, a second gate structure including a second cap layer thereon, a second source/drain contact, an etch stop layer (ESL) over the first source/drain contact and the second source/drain contact, and a first dielectric layer over the ESL. The method further includes forming a butted contact opening to expose the first cap layer and the first source/drain contact, forming a butted contact in the butted contact opening, after the forming of the butted contact, depositing a second dielectric layer, forming a source/drain contact via opening through the second dielectric layer, the ESL layer, and the first dielectric layer to expose the second source/drain contact, and forming a source/drain contact via in the source/drain contact via opening.
    Type: Grant
    Filed: April 13, 2021
    Date of Patent: May 23, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Fu-Hsiang Su, Yi-Hsien Chen
  • Publication number: 20220271130
    Abstract: A method according to the present disclosure includes receiving a workpiece that includes a first gate structure including a first cap layer thereon, a first source/drain contact adjacent the first gate structure, a second gate structure including a second cap layer thereon, a second source/drain contact, an etch stop layer (ESL) over the first source/drain contact and the second source/drain contact, and a first dielectric layer over the ESL. The method further includes forming a butted contact opening to expose the first cap layer and the first source/drain contact, forming a butted contact in the butted contact opening, after the forming of the butted contact, depositing a second dielectric layer, forming a source/drain contact via opening through the second dielectric layer, the ESL layer, and the first dielectric layer to expose the second source/drain contact, and forming a source/drain contact via in the source/drain contact via opening.
    Type: Application
    Filed: April 13, 2021
    Publication date: August 25, 2022
    Inventors: Fu-Hsiang Su, Yi-Hsien Chen
  • Patent number: 10786866
    Abstract: An inspecting and repairing device of additive manufacturing technology and a method thereof are provided. The inspecting and repairing device has a powder bed unit, a repairing unit, and an inspection unit. The powder bed unit has a powder platform, a powder spreading mechanism and a laser unit. The repairing unit has a processing mechanism. The inspection unit has a camera and a controller. According to an image of the powder platform captured by the camera, the controller can determine whether spreading powders, whether being overcome a powder spreading defect, or whether driving the processing mechanism to repair a surface of a workpiece.
    Type: Grant
    Filed: October 27, 2017
    Date of Patent: September 29, 2020
    Assignee: TONGTAI MACHINE & TOOL CO., LTD.
    Inventors: Yi-Hsien Chen, Hsin-Pao Chen, Jui-Hsiung Yen
  • Publication number: 20180126487
    Abstract: An inspecting and repairing device of additive manufacturing technology and a method thereof are provided. The inspecting and repairing device has a powder bed unit, a repairing unit, and an inspection unit. The powder bed unit has a powder platform, a powder spreading mechanism and a laser unit. The repairing unit has a processing mechanism. The inspection unit has a camera and a controller. According to an image of the powder platform captured by the camera, the controller can determine whether spreading powders, whether being overcome a powder spreading defect, or whether driving the processing mechanism to repair a surface of a workpiece.
    Type: Application
    Filed: October 27, 2017
    Publication date: May 10, 2018
    Inventors: YI-HSIEN CHEN, HSIN-PAO CHEN, JUI-HSIUNG YEN
  • Patent number: 9136092
    Abstract: The present disclosure provides one embodiment of an integrated circuit (IC) method. The method includes receiving an IC design layout having a main feature; performing an optical proximity correction (OPC) process to the design layout; and thereafter, performing a jog reduction process to the design layout such that jog features of the design layout are reduced.
    Type: Grant
    Filed: April 9, 2012
    Date of Patent: September 15, 2015
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chi-Ta Lu, Jia-Guei Jou, Yi-Hsien Chen, Peng-Ren Chen, Dong-Hsu Cheng
  • Publication number: 20130268901
    Abstract: The present disclosure provides one embodiment of an integrated circuit (IC) method. The method includes receiving an IC design layout having a main feature; performing an optical proximity correction (OPC) process to the design layout; and thereafter, performing a jog reduction process to the design layout such that jog features of the design layout are reduced.
    Type: Application
    Filed: April 9, 2012
    Publication date: October 10, 2013
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chi-Ta Lu, Jia-Guei Jou, Yi-Hsien Chen, Peng-Ren Chen, Dong-Hsu Cheng
  • Publication number: 20100023136
    Abstract: A control apparatus for a computer system, which includes a control signal generating unit for generating a input control signal, a selection signal generating unit for generating a selection signal, a control signal switching unit coupled to the control signal generating unit and the selection signal generating unit for outputting an enable signal according to the selection signal while receiving the input control signal, and a plurality of hardware signal control receivers coupled to the control signal switching unit, wherein a first hardware signal control receiver of the plurality of hardware signal control receivers is indicated according to the selection signal and informs an operating system of the computer system to execute an action according to the enable signal.
    Type: Application
    Filed: July 13, 2009
    Publication date: January 28, 2010
    Inventors: Kuei-Kang Chang, Yi-Hsien Chen
  • Patent number: 7409861
    Abstract: A concentration detector is adapted to detect the concentration of a liquid fuel in a container. The concentration detector comprises a rotating mechanism positioned underneath the level of the liquid fuel and having a rotational center. A first float having a specific gravity less than the specific gravity of the liquid fuel, a volume equivalent to “V” and a mass equivalent to “M”. The distance between the mass center of the first float and the rotational center is “L”. A second float connected with the first float and having a specific gravity less than the specific gravity of the liquid fuel, a volume equivalent to “V” and a mass equivalent to “r*M”. The distance between the mass center of the second float and the rotational center is “L. The mass center of the second float, the rotational center and the mass center of the first float constitute an included angle of 120°.
    Type: Grant
    Filed: December 14, 2006
    Date of Patent: August 12, 2008
    Assignee: Antig Technology Co., Ltd.
    Inventors: Feng-Yi Deng, Ya-Chien Chung, Yu-Lin Tang, Yi-Hsien Chen
  • Patent number: 7404323
    Abstract: A concentration detector is disclosed, which is adapted to detect a concentration of a liquid fuel in a container. The concentration detector includes a rotating means positioned underneath a level of a liquid fuel and rotatable at an angle ? on a X-Y plane. The rotating means includes at least three floating objects connected with each other. Each floating object has a specific gravity less than a specific gravity of the liquid fuel ?. The floating objects are balanced according to a torque equation, F(?,?)=0, such that the rotating means is still under the level of the liquid fuel. While a concentration of the liquid fuel is changed and the angle ? of the rotating means is detected, the specific gravity of the liquid fuel ? is obtained from the torque equation, F(?,?)=0, and thereby computing the concentration of the liquid fuel.
    Type: Grant
    Filed: November 21, 2006
    Date of Patent: July 29, 2008
    Assignee: Antig Technology Co., Ltd.
    Inventors: Hsi-Ming Shu, Feng-Yi Deng, Yu-Lin Tang, Ya-Chien Chuang, Yi-Hsien Chen
  • Publication number: 20070231627
    Abstract: The present invention provides a concentration detection device, which is used to detect the concentration of liquid fuel within a container.
    Type: Application
    Filed: March 28, 2007
    Publication date: October 4, 2007
    Inventors: Yachien Chung, Yi-Hsien Chen, Feng-Yi Deng, Yu Lin Tang
  • Publication number: 20070137299
    Abstract: A concentration detector is adapted to detect the concentration of a liquid fuel in a container. The concentration detector comprises a rotating mechanism positioned underneath the level of the liquid fuel and having a rotational center. A first float having a specific gravity less than the specific gravity of the liquid fuel, a volume equivalent to “V” and a mass equivalent to “M”. The distance between the mass center of the first float and the rotational center is “L”. A second float connected with the first float and having a specific gravity less than the specific gravity of the liquid fuel, a volume equivalent to “V” and a mass equivalent to “r*M”. The distance between the mass center of the second float and the rotational center is “L. The mass center of the second float, the rotational center and the mass center of the first float constitute an included angle of 120°.
    Type: Application
    Filed: December 14, 2006
    Publication date: June 21, 2007
    Inventors: Feng-Yi Deng, Ya-Chien Chung, Yu-Lin Tang, Yi-Hsien Chen
  • Publication number: 20070113624
    Abstract: A concentration detector is disclosed, which is adapted to detect a concentration of a liquid fuel in a container. The concentration detector includes a rotating means positioned underneath a level of a liquid fuel and rotatable at an angle ? on a X-Y plane. The rotating means includes at least three floating objects connected with each other. Each floating object has a specific gravity less than a specific gravity of the liquid fuel ?. The floating objects are balanced according to a torque equation, F(?,?)=0, such that the rotating means is still under the level of the liquid fuel. While a concentration of the liquid fuel is changed and the angle ? of the rotating means is detected, the specific gravity of the liquid fuel ? is obtained from the torque equation, F(?,?)=0, and thereby computing the concentration of the liquid fuel.
    Type: Application
    Filed: November 21, 2006
    Publication date: May 24, 2007
    Inventors: Hsi-Ming Shu, Feng-Yi Deng, Yu-Lin Tang, Ya-Chien Chuang, Yi-Hsien Chen