Abstract: A semiconductor device package includes a copper lead frame, a copper oxide compound layer and an encapsulant. The copper oxide compound layer is in contact with a surface of the copper lead frame. The copper oxide compound layer includes a copper(II) oxide, and a thickness of the copper oxide compound layer is in a range from about 50 nanometers to about 100 nanometers. The encapsulant is in contact with a surface of the copper oxide compound layer.

Abstract: A method of manufacturing a bonding structure includes (a) providing a substrate, wherein the substrate includes a top surface and at least one bonding pad disposed adjacent to the top surface of the substrate, at least one bonding pad having a sloped surface with a first slope; (b) providing a semiconductor element, wherein the semiconductor element includes at least one pillar, and at least one pillar has a sidewall with a second slope, wherein the absolute value of the first slope is smaller than the absolute value of the second slope; and (c) bonding at least one pillar to a portion of the sloped surface of corresponding ones of the at least one bonding pad.

Abstract: A semiconductor device package includes a copper lead frame, a copper oxide compound layer and an encapsulant. The copper oxide compound layer is in contact with a surface of the copper lead frame. The copper oxide compound layer includes a copper(II) oxide, and a thickness of the copper oxide compound layer is in a range from about 50 nanometers to about 100 nanometers. The encapsulant is in contact with a surface of the copper oxide compound layer.

Abstract: A method of manufacturing a bonding structure includes (a) providing a substrate, wherein the substrate includes a top surface and at least one bonding pad disposed adjacent to the top surface of the substrate, at least one bonding pad having a sloped surface with a first slope; (b) providing a semiconductor element, wherein the semiconductor element includes at least one pillar, and at least one pillar has a sidewall with a second slope, wherein the absolute value of the first slope is smaller than the absolute value of the second slope; and (c) bonding at least one pillar to a portion of the sloped surface of corresponding ones of the at least one bonding pad.

Abstract: A bonding structure includes a substrate having a top surface and including at least one bonding pad. Each bonding pad is disposed adjacent to the top surface of the substrate and has a sloped surface. A semiconductor element includes at least one pillar. Each pillar is bonded to a portion of the sloped surface of a corresponding bonding pad, and a gap is formed between a sidewall of the pillar and the sloped surface of the corresponding bonding pad.

Abstract: The present disclosure relates to bonding structures useful in semiconductor packages and methods of manufacturing the same. In an embodiment, the bonding structure comprises a substrate, having a top surface and including at least one bonding pad, wherein each bonding pad is disposed adjacent to the top surface of the substrate and has a sloped surface; and a semiconductor element including at least one pillar, wherein each pillar is bonded to a portion of the sloped surface of a corresponding bonding pad, and a gap is formed between a sidewall of the pillar and the sloped surface of the corresponding bonding pad.

Abstract: A file change notification method of an embedded device that includes a first operating system (OS) and a second OS. The first OS corresponds to a first central processing unit (CPU) and connects to a storage system, the second OS corresponds to a second CPU for sharing with the configuration file via a network file system (NFS). The method monitors the configuration file stored in the storage system, determines whether the configuration file has been modified, and generates a notification message to notify a first application program that the configuration file has been changed. The method further sends the notification message from the first OS to the second OS through a communication network, and notifies a second application program that the configuration file has been changed when the notification message is received from the first OS.

Abstract: A file change notification method of an embedded device that includes a first operating system (OS) and a second OS. The first OS corresponds to a first central processing unit (CPU) and connects to a storage system, the second OS corresponds to a second CPU for sharing with the configuration file via a network file system (NFS). The method monitors the configuration file stored in the storage system, determines whether the configuration file has been modified, and generates a notification message to notify a first application program that the configuration file has been changed. The method further sends the notification message from the first OS to the second OS through a communication network, and notifies a second application program that the configuration file has been changed when the notification message is received from the first OS.

Abstract: The present invention provides a fabricating process for forming multi-layered metal bumps by electroless plating, comprising the steps of: providing an IC chip or a semiconductor substrate on which there are provided a plurality of pads; dispensing a first dielectric layer, exposing the pads, roughing the surface to be redistributed by chemical or physical approaches, activating the surface in order to follow-up electroless plating deposition advantageously, and dispensing a second dielectric layer so as to define a redistribution path; depositing a conductive film on the redistribution path by electroless plating, in which the conductive film allows the positions of the pads to be changed so as to be connected to the external circuit; forming a photoresist pattern, exposing a plurality of pre-determined positions on the conductive film so as to redistribute the positions for the metal bumps formed later; performing activation on the pre-determined positions so as to generate an activator; forming initial me

Abstract: The present invention provides a fabricating process for forming multi-layered metal bumps by electroless plating, comprising the steps of: providing an IC chip or a semiconductor substrate on which there are provided a plurality of pads; dispensing a first dielectric layer, exposing the pads, roughing the surface to be redistributed by chemical or physical approaches, activating the surface in order to follow-up electroless plating deposition advantageously, and dispensing a second dielectric layer so as to define a redistribution path; depositing a conductive film on the redistribution path by electroless plating, in which the conductive film allows the positions of the pads to be changed so as to be connected to the external circuit; forming a photoresist pattern, exposing a plurality of pre-determined positions on the conductive film so as to redistribute the positions for the metal bumps formed later; performing activation on the pre-determined positions so as to generate an activator; forming initial me