Patents by Inventor Yi-Hsiung Chen

Yi-Hsiung Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11983475
    Abstract: A semiconductor device includes: M*1st conductors in a first layer of metallization (M*1st layer) and being aligned correspondingly along different corresponding ones of alpha tracks and representing corresponding inputs of a cell region in the semiconductor device; and M*2nd conductors in a second layer of metallization (M*2nd layer) aligned correspondingly along beta tracks, and the M*2nd conductors including at least one power grid (PG) segment and one or more of an output pin or a routing segment; and each of first and second ones of the input pins having a length sufficient to accommodate at most two access points; each of the access points of the first and second input pins being aligned to a corresponding different one of first to fourth beta tracks; and the PG segment being aligned with one of the first to fourth beta tracks.
    Type: Grant
    Filed: February 7, 2023
    Date of Patent: May 14, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Pin-Dai Sue, Po-Hsiang Huang, Fong-Yuan Chang, Chi-Yu Lu, Sheng-Hsiung Chen, Chin-Chou Liu, Lee-Chung Lu, Yen-Hung Lin, Li-Chun Tien, Yi-Kan Cheng
  • Publication number: 20230403205
    Abstract: The present disclosure relates to a system, a method and a computer-readable medium for quality prediction. The method includes obtaining values of a parameter of a first endpoint, obtaining values of a parameter of a second endpoint, and generating a prediction of the parameter of the first endpoint according to the values of the parameter of the first endpoint and the values of the parameter of the second endpoint. The prediction includes probability distribution information of the parameter of the first endpoint at a timing in the future. The present disclosure can result in a more precise quality prediction.
    Type: Application
    Filed: September 9, 2022
    Publication date: December 14, 2023
    Inventors: Li-Han CHEN, Jin-Wei LIU, Yi-Hsiung CHEN, Yung-Chi HSU
  • Patent number: 7781755
    Abstract: The main objective of present invention is to provide a manufacturing method of light emitting diode that utilizes metal diffusion bonding technology. AlInGaP light emitting diode epitaxial structure on a temporary substrate is bonded to a permanent substrate having a thermal expansion coefficient similar to that of the epitaxial structure, and then the temporary substrate is removed to produce an LED having a vertical structure and better performance. The other objective of the present invention is to provide a high performance LED that uses metal diffusion technology and wet chemical etching technology to roughen the LED surface in order to improve light extraction efficiency.
    Type: Grant
    Filed: April 23, 2009
    Date of Patent: August 24, 2010
    Assignee: Arima Optoelectronics Corp.
    Inventors: Ying-Che Sung, Chao-Hsin Wang, Yi-Hsiung Chen, Shih-Yu Chiu
  • Patent number: 7704770
    Abstract: The main objective of present invention is to provide a manufacturing method of light emitting diode that utilizes metal diffusion bonding technology. AlInGaP light emitting diode epitaxial structure on a temporary substrate is bonded to a permanent substrate having a thermal expansion coefficient similar to that of the epitaxial structure, and then the temporary substrate is removed to produce an LED having a vertical structure and better performance. The other objective of the present invention is to provide a high performance LED that uses metal diffusion technology and wet chemical etching technology to roughen the LED surface in order to improve light extraction efficiency.
    Type: Grant
    Filed: December 11, 2006
    Date of Patent: April 27, 2010
    Assignee: Arima Optoelectronics Corp.
    Inventors: Ying-Che Sung, Chao-Hsin Wang, Yi-Hsiung Chen, Shih-Yu Chiu
  • Publication number: 20090206362
    Abstract: The main objective of present invention is to provide a manufacturing method of light emitting diode that utilizes metal diffusion bonding technology. AlInGaP light emitting diode epitaxial structure on a temporary substrate is bonded to a permanent substrate having a thermal expansion coefficient similar to that of the epitaxial structure, and then the temporary substrate is removed to produce an LED having a vertical structure and better performance. The other objective of the present invention is to provide a high performance LED that uses metal diffusion technology and wet chemical etching technology to roughen the LED surface in order to improve light extraction efficiency.
    Type: Application
    Filed: April 23, 2009
    Publication date: August 20, 2009
    Inventors: Ying-Che Sung, Chao-Hsin Wang, Yi-Hsiung Chen, Shih-Yu Chiu
  • Publication number: 20070194325
    Abstract: The main objective of present invention is to provide a manufacturing method of light emitting diode that utilizes metal diffusion bonding technology. AlInGaP light emitting diode epitaxial structure on a temporary substrate is bonded to a permanent substrate having a thermal expansion coefficient similar to that of the epitaxial structure, and then the temporary substrate is removed to produce an LED having a vertical structure and better performance. The other objective of the present invention is to provide a high performance LED that uses metal diffusion technology and wet chemical etching technology to roughen the LED surface in order to improve light extraction efficiency.
    Type: Application
    Filed: December 11, 2006
    Publication date: August 23, 2007
    Inventors: Ying-Che Sung, Chao-Hsin Wang, Yi-Hsiung Chen, Shih-Yu Chiu