Patents by Inventor Yi-Hsu Chen

Yi-Hsu Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11974413
    Abstract: A computing system including a water-resistant chassis, at least one electronic component with a heat sink, and a gap filler. The heat sink includes an arrangement of fins separated by inter-fin spaces. The gap filler is in contact with both the heat sink and the water-resistant chassis. The gap filler is positioned in the inter-fin spaces to provide a heat conduction path between the heat sink and the chassis.
    Type: Grant
    Filed: April 27, 2022
    Date of Patent: April 30, 2024
    Assignee: QUANTA COMPUTER INC.
    Inventors: Yi-Chieh Chen, Yueh-Chang Wu, Ching-Yi Shih, Kang Hsu
  • Publication number: 20240085678
    Abstract: Various embodiments of the present disclosure are directed towards a camera module comprising flat lenses. Flat lenses have reduced thicknesses compared to other types of lenses, whereby the camera module may have a small size and camera bumps may be omitted or reduced in size on cell phones and the like incorporating the camera module. The flat lenses are configured to focus visible light into a beam of white light, split the beam into sub-beams of red, green, and blue light, and guide the sub-beams respectively to separate image sensors for red, green, and blue light. The image sensors generate images for corresponding colors and the images are combined into a full-color image. Optically splitting the beam into the sub-beams and using separate image sensors for the sub-beams allows color filters to be omitted and smaller pixel sensors. This, in turn, allows higher quality imaging.
    Type: Application
    Filed: May 8, 2023
    Publication date: March 14, 2024
    Inventors: Jung-Huei Peng, Chun-Wen Cheng, Yi-Chien Wu, Tsun-Hsu Chen
  • Publication number: 20140197508
    Abstract: An image sensor comprises a substrate, a plurality of image sensing elements and a first inorganic optical layer, wherein the substrate has an active region; the image sensing elements are disposed in the active region; and the first inorganic optical layer covers the image sensing elements and has at least two adjacent edges for forming an angle greater than 90 degrees (90°).
    Type: Application
    Filed: January 17, 2013
    Publication date: July 17, 2014
    Applicant: UNITED MICROELECTRONICS CORPORATION
    Inventors: Yi-Hsu CHEN, Yuh-Turng LIU, Yu-Ming WANG
  • Patent number: 7228503
    Abstract: A method for remote mask data jobview through a network featuring 24-hour service, reduced cycle time and lower cost, whereby customers can obtain real time mask data access instead of downloading entire pattern files. Expensive CAD/CAM software is unnecessary for the mask data jobview; instead, only a web browser is required. The method for remote mask data jobview through a network comprising the steps of: storing a mask data file to a jobview computer, wherein drawing software is installed on the jobview computer; logging onto a web server from a customer computer through a first network, wherein a web-based graphic mode emulator is installed on the web server; logging onto the jobview computer from the web server through a second network; using the web-base graphic mode emulator to operate the drawing software; and using a browser installed on the customer computer to operate the drawing software to open and review the mask data file.
    Type: Grant
    Filed: August 25, 2000
    Date of Patent: June 5, 2007
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Jui-Ming Wang, Yi-Hsu Chen, Jeen-Haw Liu, Chung-Sheng Lee, Jiin-Feng Yeh, Hua-Jen Chen
  • Publication number: 20050125763
    Abstract: Provided are a system and method for creating a reticle field layout (RFL). In one example, the method includes receiving information for a RFL design by a computer system directly from a user via a computer interface. The RFL design is automatically verified using predefined specification and design rules accessible to the computer system. The RFL design may be modified by adding additional features before being finalized.
    Type: Application
    Filed: June 30, 2004
    Publication date: June 9, 2005
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Ko-Feng Lin, Yi-Hsu Chen, Lee-Chih Yeh, Chun-Jen Chen, Ta-Chin Chin
  • Patent number: 6631307
    Abstract: A method is described which allows certain Optical Proximity Corrections to be computed in a few minutes. This has been achieved by limiting changes to the optical mask to the addition of two sets of serifs (one larger than the other) at the appropriate vertices in the layout mask. A key feature of the method is that identification of which serifs will be within a critical distance from a neighbouring edge (and have therefore to be smaller) is performed by the application of a few simple logical operations. This results in a corrected mask that can be generated in a few minutes, as opposed to many hours.
    Type: Grant
    Filed: March 19, 1998
    Date of Patent: October 7, 2003
    Assignee: Taiwan Semiconductor Manufacturing Company
    Inventors: San-De Tzu, Yi-Hsu Chen
  • Patent number: 6365303
    Abstract: A mask pattern having an anti-ESD ring which protects the pattern region of the mask from damage due to ESD events. The anti-ESD ring has a space between two broad border regions formed of an opaque metal such as chrome. ESD fingers, or rods extend from one of the border regions to within a small gap of the other border region. These ESD fingers act as lightning rods so that ESD events preferably occur across this small gap between the ESD fingers and one of the border regions. The ESD fingers are small enough so that any metal transferred across the gap in an ESD event is very small. The gap is located so that any metal transferred is far away from the pattern region of the mask. The ESD fingers confine ESD events to a preferred region of the mask and damage to the pattern region is avoided.
    Type: Grant
    Filed: April 24, 2000
    Date of Patent: April 2, 2002
    Assignee: Taiwan Semiconductor Manufacturing Company
    Inventors: Chang-Cheng Hung, Jeen-Hao Liu, Yi-Hsu Chen, Yung-Haw Liaw, Dong-Hsu Cheng, Deng-Guey Juang
  • Patent number: 6001512
    Abstract: A mask and method of systematically laying out the mask for test patterns in the frame cell region of an attenuating phase shifting mask are described. An array of sub-resolution contact holes are used in the border regions of the mask to prevent over exposure of photoresist in the regions between the device regions on a wafer due to side lobe effect. The mask and method provide for a buffer distance surrounding the features of the test patterns. The buffer distance is free of sub-resolution contact holes. When the buffer distance is correctly chosen problems due to side lobe effect at the frame cell portion of the mask are prevented.
    Type: Grant
    Filed: April 28, 1998
    Date of Patent: December 14, 1999
    Assignee: Taiwan Semiconductor Manufacturing Company Ltd.
    Inventors: San-De Tzu, Yi-Hsu Chen
  • Patent number: 5817439
    Abstract: A mask and method of forming a mask which minimizes the light transmission in the border regions of attenuating phase shifting masks. The mask uses square contact holes formed in the attenuating phase shifting material in the border regions. The square contact holes are located at the edge of the mask pattern region beginning at each corner of the mask pattern region and working toward the center of each side of the mask pattern region using a contact hole pitch. At the center of each side of the mask pattern region the pitch is discontinuous and a row of rectangular contact holes are formed.
    Type: Grant
    Filed: May 15, 1997
    Date of Patent: October 6, 1998
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: San-De Tzu, Yi-Hsu Chen, Chih-Chiang Tu