Abstract: The present disclosure provides a semiconductor structure and a method of forming the same. A semiconductor structure according to the present disclosure includes a plurality of nanostructures disposed over a substrate, a plurality of inner spacer features interleaving the plurality of nanostructures. The plurality of nanostructures are arranged along a direction perpendicular to the substrate. The plurality of inner spacer features include a bottommost inner spacer feature and upper inner spacer features disposed above the bottommost inner spacer feature. The first height of the bottommost inner spacer feature along the direction is greater than a second height of each of the upper inner spacer features.

Abstract: A surge protection system is provided. The surge protection system includes an input capacitor, a surge protection circuit, and a controller. When the input voltage starts to be transmitted to the input capacitor, a surge current is generated. The surge protection circuit includes a first path and a second path. The surge protection circuit is coupled to a second end of the input capacitor via the first path, so that the surge current is transmitted via the first path. The controller is coupled to the surge protection circuit. The controller is configured to provide a control signal to the surge protection circuit to switch the first path to the second path to be coupled to the second end of the input capacitor.

Abstract: An electronic device includes a host, a main display, an auxiliary display, and a hinge mechanism. The auxiliary display is located between the host and the main display and includes a sliding part and a lifting part. The sliding part is slidably connected to the host. The hinge mechanism includes a first bracket, a second bracket pivotally connected to the first bracket, and a third bracket pivotally connected to the second bracket. The first bracket is secured to the host, and the second bracket is secured to the main display. The third bracket is secured to the lifting part of the auxiliary display.

Abstract: A display apparatus includes a first display and a second display. The first display includes a first display body having a first side, a positioning recess located at the first side, and an engagement recess located in the positioning recess. The second display is detachably mounted at one side of the first display body, includes a second display body, a positioning protrusion, and a pendulum hook, and has a second side. The positioning protrusion is connected to the second side and has a cavity configured to accommodate the pendulum hook pivotally connected to the positioning protrusion and including an engagement protrusion. The positioning protrusion is inserted into the positioning recess. The second side contacts the first side. The engagement protrusion is configured to move out of the cavity and be engaged with the engagement recess or move away from the engagement recess and move back to the cavity.

Abstract: A radial-leaded over-current protection device comprises a PTC element, a first electrode lead, a second electrode lead and an electrically insulating encapsulation layer. The PTC element comprises a first conductive layer, a second conductive layer and a PTC material layer laminated therebetween. The PTC material layer comprises crystalline polymer and conductive filler dispersed therein. The first electrode lead has an end connecting to the first conductive layer, whereas the second electrode lead has an end connecting to the second conductive layer. The electrically insulating encapsulation layer includes a fluorine-containing polymer, and wraps around an entire outer surface of the PTC element and the ends of the first and second electrodes connecting to the PTC element. The electrically insulating encapsulation layer has a thickness of 102˜105 nm, and the radial-leaded over-current protection device has an initial resistance Rbf of 0.0017˜0.0027?.

Abstract: A surface-mountable over-current protection device comprises at least one PTC material layer, a first conductive layer, a second conductive layer, a first electrode, a second electrode, an insulating layer, and a cover layer. The PTC material layer comprises crystalline polymer and conductive fillers dispersed therein. The first conductive layer and the second conductive layer are disposed on a first surface and a second surface of the PTC material layer, respectively. The first electrode and the second electrode are electrically connected to the first conductive layer and the second conductive layer, respectively. The insulating layer is disposed between the first electrode and the second electrode for insulation. The cover layer includes a fluorine-containing polymer, and wraps around an entire outer surface of the surface-mountable over-current protection device.

Abstract: Methods of forming a slurry and methods of performing a chemical mechanical polishing (CMP) process utilized in manufacturing semiconductor devices, as described herein, may be performed on semiconductor devices including integrated contact structures with ruthenium (Ru) plug contacts down to a semiconductor substrate. The slurry may be formed by mixing a first abrasive, a second abrasive, and a reactant with a solvent. The first abrasive may include a first particulate including titanium dioxide (TiO2) particles and the second abrasive may include a second particulate that is different from the first particulate. The slurry may be used in a CMP process for removing ruthenium (Ru) materials and dielectric materials from a surface of a workpiece resulting in better WiD loading and planarization of the surface for a flat profile.

Abstract: The invention discloses a reticle storage device including a top lid, a bottom lid and a soft contact member. The top lid has a ceiling and a cover surrounding the ceiling. The bottom lid has a carrier and a peripheral structure surrounding the carrier. The soft contact member is configured to laterally extend in between the cover and the peripheral structure when the top lid and the bottom lid engage with each other, and to extend from an inside to an outside of the device in order to buffer the contact among the two lids.

Abstract: A battery charging method is disclosed. The method includes: obtaining historical working durations in which the electronic device was powered by a battery of the electronic device; in response to an electronic device connected to a charging power source, obtaining a remaining battery level and a target capacity of a battery of the electronic device, and accordingly defining a capacity to be charged; obtaining a current system time when the electronic device is connected to the charging power source; obtaining a specific time difference between the current system time and a predicted working duration, wherein the predicted working duration is a specific working duration chosen from the historical working durations subsequent to the current system time; and using the capacity to be charged to correspond to the specific time difference to obtain a predicted charging current value.

Abstract: An electronic device, including a host, a main display, an auxiliary display, and a lifting mechanism, is provided. The main display is pivoted to the host. The auxiliary display is disposed on the host. The lifting mechanism is disposed between the auxiliary display and the host. The lifting mechanism is configured to lift the auxiliary display and maintain a lifting height of the auxiliary display.

Abstract: Methods of forming a slurry and methods of performing a chemical mechanical polishing (CMP) process utilized in manufacturing semiconductor devices, as described herein, may be performed on semiconductor devices including integrated contact structures with ruthenium (Ru) plug contacts down to a semiconductor substrate. The slurry may be formed by mixing a first abrasive, a second abrasive, and a reactant with a solvent. The first abrasive may include a first particulate including titanium dioxide (TiO2) particles and the second abrasive may include a second particulate that is different from the first particulate. The slurry may be used in a CMP process for removing ruthenium (Ru) materials and dielectric materials from a surface of a workpiece resulting in better WiD loading and planarization of the surface for a flat profile.

Abstract: The present disclosure provides a spindle structure including a base, a spindle, a sliding member, a restoring mechanism, and a restriction member. The spindle is rotatably received in the base and forms a receiving room. An end of the receiving room is a blind end communicating exterior via a gas channel. The sliding member is slidably received in the receiving room, and two ends thereof are a piston and a driving portion respectively. A gas cavity is defined between the piston and the blind end. The sliding member tends to move toward the blind end due to the restoring mechanism. The restriction member is connected to the driving portion and radially deforms when the sliding member slides so as to fix or to release the tool-holder. The sliding member slides outward when the gas cavity is injected with gas via the gas channel.

Abstract: A reticle retaining system including an inner pod and an outer pod is described. The inner pod includes an inner base configured to receive a workpiece; an inner cover configured to couple to the inner base, thereby forming an interior for housing the workpiece; and a hold down pin movably arranged through the inner cover and configured to press the workpiece. The outer pod includes an outer base configured to receive the inner base, an outer cover configured to couple to the outer base, and a pushing element arranged on the outer cover. The hold down pin, the outer cover and the pushing element have a charge dissipation property. When the pushing element pushes the hold down pin to press the workpiece, a charge dissipation path is established from the received workpiece, through the hold down pin and the pushing element, to the outer cover.

Abstract: An electronic device, including a host, a main display, an auxiliary display, and a lifting mechanism, is provided. The main display is pivoted to the host. The auxiliary display is disposed on the host. The lifting mechanism is disposed between the auxiliary display and the host. The lifting mechanism is configured to lift the auxiliary display and maintain a lifting height of the auxiliary display.

Abstract: Computer-implemented systems and methods are described herein for detecting unusually frequent exactly matching and nearly matching test responses. A plurality of test responses for each of a plurality of test takers is received. Evidence of a circulated key from the plurality of test responses is identified by detecting two or more test takers with exactly matching test responses for a plurality of questions. The strength of the evidence of the circulated key is analyzed by determining the probability that the two or more test takers would produce exactly matching test responses, wherein the strength of the evidence is inversely related to the probability. Test takers with nearly matching test responses to the circulated key are then identified. All test takers with exactly matching and nearly matching test responses are tagged for further investigation.

Abstract: A power supply circuit and a power distribution method thereof are provided. The power supply circuit includes a power input switch block, a power supply measurement block, a power supply conversion block and a power supply control block. The power input switch block provides a first power supply voltage to a load circuit based on an external power supply voltage from an adapter. The power supply measurement block measures a current of the first power supply voltage. The power supply conversion block is coupled to the battery module to provide a second power supply voltage to the load circuit. When a battery temperature of the battery module is higher than a critical temperature and a battery power of the battery module is higher than or equal to a critical power, the power supply control block limits the second power supply voltage provided to the load circuit.

Abstract: An electronic device, including a host, a main display, an auxiliary display, and a lifting mechanism, is provided. The main display is pivoted to the host. The auxiliary display is disposed on the host. The lifting mechanism is disposed between the auxiliary display and the host, and includes a first bracket, a positioning pin, a second bracket, and a torsional spring. The first bracket is fixed to the host. The positioning pin is retractably disposed at the first bracket. The second bracket is fixed to the auxiliary display. The second bracket is pivoted to the first bracket and has a positioning notch. The positioning pin is located outside the positioning notch or is engaged with the positioning notch. The torsional spring has a first end and a second end that are opposite. The first end is connected to the first bracket. The second end is connected to the second bracket.

Abstract: An anti-curling film is provided. The anti-curling film includes a first portion and a second portion covering the first portion. The first portion includes polylactic acid (PLA), polycaprolactone (PCL), polyethylene glycol dimethacrylate (PEGDMA) and a photoinitiator. The second portion includes polycaprolactone (PCL), gelatin, hyaluronic acid (HA), alginate (AA), polyvinyl alcohol (PVA) or a combination thereof.

Abstract: A reticle pod having a positioning member includes a base, a lid and a plurality of positioning members. The lid shuts relative to the base to form a substantially cuboid case. The case has a storing space for receiving a reticle. The positioning members are arranged in a shutting direction and disposed on at least two edges of the lid or at least two edges of the base, respectively. The positioning members each include a connecting portion, a correcting portion and a guiding slope portion. The connecting portion connects the edges of the lid. The correcting portion has one end connected to the connecting portion and extending in a shutting direction and an opposing end connected to the guiding slope portion. The guiding slope portion has a slope extending outward. The reticle pod having a positioning member is error-free, allowing the lid to shut precisely relative to the base.

Abstract: A reticle pod with antistatic capability includes a base and plural of support members. The base has a carrying surface having a recess formed thereon and defined by a bottom surface. The support members encircle the carrying surface of the base and are adapted to support a reticle. The recess is defined by a depth extending between the carrying surface and the bottom surface. The depth ranges from 300 ?m to 3400 ?m to thereby weaken the electrostatic force exerted upon particles on the carrying surface.