Patents by Inventor Yi Hsun PAN

Yi Hsun PAN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Cleaning module, cleaning apparatus and method of cleaning photomask
    Patent number: 11237478
    Abstract: In a method of cleaning a photomask, a wiper tape is guided from a wiper tape supplying reel, over a cleaning head, and then onto a wiper tape collecting reel. A section of the wiper tape over the cleaning head is brought into contact with an adhesive residue on a surface of the photomask. A relative movement is caused between the photomask and the section of the wiper tape to remove the adhesive residue from the surface of the photomask.
    Type: Grant
    Filed: August 11, 2020
    Date of Patent: February 1, 2022
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yi-Hsun Pan, Kun-Lung Hsieh
  • Cleaning Module, Cleaning Apparatus and Method of Cleaning Photomask
    Publication number: 20200371432
    Abstract: In a method of cleaning a photomask, a wiper tape is guided from a wiper tape supplying reel, over a cleaning head, and then onto a wiper tape collecting reel. A section of the wiper tape over the cleaning head is brought into contact with an adhesive residue on a surface of the photomask. A relative movement is caused between the photomask and the section of the wiper tape to remove the adhesive residue from the surface of the photomask.
    Type: Application
    Filed: August 11, 2020
    Publication date: November 26, 2020
    Inventors: Yi-Hsun Pan, Kun-Lung Hsieh
  • Cleaning module, cleaning apparatus and method of cleaning photomask
    Patent number: 10747105
    Abstract: In a method of cleaning a photomask, a wiper tape is guided from a wiper tape supplying reel, over a cleaning head, and then onto a wiper tape collecting reel. A section of the wiper tape over the cleaning head is brought into contact with an adhesive residue on a surface of the photomask. A relative movement is caused between the photomask and the section of the wiper tape to remove the adhesive residue from the surface of the photomask.
    Type: Grant
    Filed: December 29, 2017
    Date of Patent: August 18, 2020
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yi-Hsun Pan, Kun-Lung Hsieh
  • Cleaning Module, Cleaning Apparatus and Method of Cleaning Photomask
    Publication number: 20180129132
    Abstract: In a method of cleaning a photomask, a wiper tape is guided from a wiper tape supplying reel, over a cleaning head, and then onto a wiper tape collecting reel. A section of the wiper tape over the cleaning head is brought into contact with an adhesive residue on a surface of the photomask. A relative movement is caused between the photomask and the section of the wiper tape to remove the adhesive residue from the surface of the photomask.
    Type: Application
    Filed: December 29, 2017
    Publication date: May 10, 2018
    Inventors: Yi-Hsun Pan, Kun-Lung Hsieh
  • Cleaning module, cleaning apparatus and method of cleaning photomask
    Patent number: 9857680
    Abstract: In a method of cleaning a photomask, a wiper tape is guided from a wiper tape supplying reel, over a cleaning head, and then onto a wiper tape collecting reel. A section of the wiper tape over the cleaning head is brought into contact with an adhesive residue on a surface of the photomask. A relative movement is caused between the photomask and the section of the wiper tape to remove the adhesive residue from the surface of the photomask.
    Type: Grant
    Filed: January 14, 2014
    Date of Patent: January 2, 2018
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yi Hsun Pan, Kun-Lung Hsieh
  • CLEANING MODULE, CLEANING APPARATUS AND METHOD OF CLEANING PHOTOMASK
    Publication number: 20150198875
    Abstract: In a method of cleaning a photomask, a wiper tape is guided from a wiper tape supplying reel, over a cleaning head, and then onto a wiper tape collecting reel. A section of the wiper tape over the cleaning head is brought into contact with an adhesive residue on a surface of the photomask. A relative movement is caused between the photomask and the section of the wiper tape to remove the adhesive residue from the surface of the photomask.
    Type: Application
    Filed: January 14, 2014
    Publication date: July 16, 2015
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Yi Hsun PAN, Kun-Lung HSIEH