Abstract: Embodiments provide a method and resulting structure that includes forming an opening in a dielectric layer to expose a metal feature, selectively depositing a metal cap on the metal feature, depositing a barrier layer over the metal cap, and depositing a conductive fill on the barrier layer.

Abstract: A controller of a buck-boost conversion circuit and a mode switching method thereof are provided. The controller control operations of multiple switches of the buck-boost conversion circuit to convert an input voltage into an output voltage and provide an output current. The controller includes a slope compensation circuit, a control loop, and a mode switching circuit. The slope compensation circuit generates a slope compensation signal according to a mode switching signal of a current cycle. The control loop is coupled to the slope compensation circuit and the switches respectively, and is configured to generate multiple switch control signals according to the slope compensation signal, a feedback voltage related to the output voltage, and a current sense signal related to the output current to control the operations of the switches respectively. The mode switching circuit is coupled to the slope compensation circuit and the control loop.

Abstract: A semiconductor structure includes a first electrode, a second electrode over the first electrode, a third electrode over the second electrode, a first insulating layer between the first electrode and the second electrode, and a second insulating layer between the second electrode and the third electrode. The third electrode includes a first bottom surface and a second bottom surface. The first bottom surface and the second bottom surface are at different levels. A width of the first bottom surface is greater than a width of the second bottom surface.

Abstract: A semiconductor structure includes a first electrode, a second electrode over the first electrode, a third electrode over the second electrode, a first insulating layer between the first electrode and the second electrode, and a second insulating layer between the second electrode and the third electrode. The third electrode includes a first bottom surface and a second bottom surface. The first bottom surface and the second bottom surface are at different levels. A width of the first bottom surface is greater than a width of the second bottom surface.

Abstract: A semiconductor structure includes a substrate, a first electrode over the substrate, a second electrode over the first electrode, and a first insulating layer between the first electrode and the second electrode. The first insulating layer has a first portion and a second portion coupled to the first portion, the second portion of the first insulating layer is in contact with the second electrode, the first portion is separated from the second electrode by the second portion. A thickness of the second portion is greater than a thickness of the first portion.

Abstract: A semiconductor structure includes a first electrode, a second electrode over the first electrode, a third electrode over the second electrode, a first insulating layer between the first electrode and the second electrode, and a second insulating layer between the second electrode and the third electrode. The third electrode includes a first bottom surface and a second bottom surface. The first bottom surface and the second bottom surface are at different levels. A width of the first bottom surface is greater than a width of the second bottom surface.

Abstract: A phase change memory (PCM) cell with a low deviation contact area between a heater and a phase change element is provided. The PCM cell comprises a bottom electrode, a dielectric layer, a heater, a phase change element, and a top electrode. The dielectric layer overlies the bottom electrode. The heater extends upward from the bottom electrode, through the dielectric layer. Further, the heater has a top surface that is substantially planar and that is spaced below a top surface of the dielectric layer. The phase change element overlies the dielectric layer and protrudes into the dielectric layer to contact with the top surface of the heater. Also provided is a method for manufacturing the PCM cell.

Abstract: A semiconductor structure includes a substrate, a first electrode over the substrate, a second electrode over the first electrode, and a first insulating layer between the first electrode and the second electrode. The first insulating layer has a first portion and a second portion coupled to the first portion, the second portion of the first insulating layer is in contact with the second electrode, the first portion is separated from the second electrode by the second portion. A thickness of the second portion is greater than a thickness of the first portion.

Abstract: In a method of manufacturing a semiconductor device, a first layer having an opening is formed over a substrate. A second layer is formed over the first layer and the substrate. A photo resist pattern is formed over the second layer above the opening of the first layer. The photo resist pattern is reflowed by a thermal process. An etch-back operation is performed to planarize the second layer.

Abstract: A phase change memory (PCM) cell with enhanced thermal isolation and low power consumption is provided. In some embodiments, the PCM cell comprises a bottom electrode, a dielectric layer, a heating element, and a phase change element. The dielectric layer is on the bottom electrode. The heating element extends through the dielectric layer, from a top of the dielectric layer to the bottom electrode. Further, the heating element has a pair of opposite sidewalls laterally spaced from the dielectric layer by a cavity. The phase change element overlies and contacts the heating element. An interface between the phase change element and the heating element extends continuously respectively from and to the opposite sidewalls of the heating element. Also provided is a method for manufacturing the PCM cell.

Abstract: A phase change memory (PCM) cell with a low deviation contact area between a heater and a phase change element is provided. The PCM cell comprises a bottom electrode, a dielectric layer, a heater, a phase change element, and a top electrode. The dielectric layer overlies the bottom electrode. The heater extends upward from the bottom electrode, through the dielectric layer. Further, the heater has a top surface that is substantially planar and that is spaced below a top surface of the dielectric layer. The phase change element overlies the dielectric layer and protrudes into the dielectric layer to contact with the top surface of the heater. Also provided is a method for manufacturing the PCM cell.

Abstract: A phase change memory (PCM) cell with a low deviation contact area between a heater and a phase change element is provided. The PCM cell comprises a bottom electrode, a dielectric layer, a heater, a phase change element, and a top electrode. The dielectric layer overlies the bottom electrode. The heater extends upward from the bottom electrode, through the dielectric layer. Further, the heater has a top surface that is substantially planar and that is spaced below a top surface of the dielectric layer. The phase change element overlies the dielectric layer and protrudes into the dielectric layer to contact with the top surface of the heater. Also provided is a method for manufacturing the PCM cell.

Abstract: A method of planarizing a semiconductor device includes forming a first region and a second region on a semiconductor substrate. The first region has a larger thickness than a thickness of the second region. An interlayer dielectric layer is conformally deposited on the first region and the second region. A photoresist is formed on the second region. A bottom anti-reflective coating layer is formed on the photoresist, first region and second region. A planarization process is performed to the semiconductor substrate. The planarization process to the first region and the second region includes removing portions of the interlayer dielectric layer, the photoresist and the BARC layer.

Abstract: In a method of manufacturing a semiconductor device, a first layer having an opening is formed over a substrate. A second layer is formed over the first layer and the substrate. A photo resist pattern is formed over the second layer above the opening of the first layer. The photo resist pattern is reflowed by a thermal process. An etch-back operation is performed to planarize the second layer.

Abstract: A phase change memory (PCM) cell with enhanced thermal isolation and low power consumption is provided. In some embodiments, the PCM cell comprises a bottom electrode, a dielectric layer, a heating element, and a phase change element. The dielectric layer is on the bottom electrode. The heating element extends through the dielectric layer, from a top of the dielectric layer to the bottom electrode. Further, the heating element has a pair of opposite sidewalls laterally spaced from the dielectric layer by a cavity. The phase change element overlies and contacts the heating element. An interface between the phase change element and the heating element extends continuously respectively from and to the opposite sidewalls of the heating element. Also provided is a method for manufacturing the PCM cell.

Abstract: A phase change memory (PCM) cell with a low deviation contact area between a heater and a phase change element is provided. The PCM cell comprises a bottom electrode, a dielectric layer, a heater, a phase change element, and a top electrode. The dielectric layer overlies the bottom electrode. The heater extends upward from the bottom electrode, through the dielectric layer. Further, the heater has a top surface that is substantially planar and that is spaced below a top surface of the dielectric layer. The phase change element overlies the dielectric layer and protrudes into the dielectric layer to contact with the top surface of the heater. Also provided is a method for manufacturing the PCM cell.

Abstract: A phase change memory (PCM) cell with enhanced thermal isolation and low power consumption is provided. In some embodiments, the PCM cell comprises a bottom electrode, a dielectric layer, a heating element, and a phase change element. The dielectric layer is on the bottom electrode. The heating element extends through the dielectric layer, from a top of the dielectric layer to the bottom electrode. Further, the heating element has a pair of opposite sidewalls laterally spaced from the dielectric layer by a cavity. The phase change element overlies and contacts the heating element. An interface between the phase change element and the heating element extends continuously respectively from and to the opposite sidewalls of the heating element. Also provided is a method for manufacturing the PCM cell.

Abstract: A phase change memory (PCM) cell with a low deviation contact area between a heater and a phase change element is provided. The PCM cell comprises a bottom electrode, a dielectric layer, a heater, a phase change element, and a top electrode. The dielectric layer overlies the bottom electrode. The heater extends upward from the bottom electrode, through the dielectric layer. Further, the heater has a top surface that is substantially planar and that is spaced below a top surface of the dielectric layer. The phase change element overlies the dielectric layer and protrudes into the dielectric layer to contact with the top surface of the heater. Also provided is a method for manufacturing the PCM cell.