Abstract: A method for lithographically patterning a photoresist is provided. The method includes receiving a wafer with the photoresist and exposing the photoresist using an extreme ultraviolet (EUV) radiation reflected by an EUV mask. The EUV mask includes a substrate, a reflective multilayer stack on the substrate, a capping layer on the reflective multilayer stack, a patterned absorber layer on the capping layer. The patterned absorber layer includes a matrix metal and an interstitial element occupying interstitial sites of the matrix metal, and a size ratio of the interstitial element to the matrix metal is from about 0.41 to about 0.59.

Abstract: A method for making a dog bone treat includes the steps of: making a hollow inner cylindrical bone part from a cowhide, and heating and drying the inner cylindrical bone part; making an outer bone part from a cowhide, and wrapping the outer bone part around the inner bone part; making knots at two ends of the outer bone part to cover two ends of the inner bone part; heating and drying the outer bone part; making first and second holes on the outer and the inner bone parts respectively such that the second hole communicates with a holding room of the inner bone part, and such that the first hole is aligned with the second hole; injecting meat paste into the holding room, and a space between the inner and the outer bone parts via the first and the second holes; heating and drying the meat paste.