Patents by Inventor Yi-Lin Sun

Yi-Lin Sun has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11956261
    Abstract: A detection method for a malicious domain name in a domain name system (DNS) and a detection device are provided. The method includes: obtaining network connection data of an electronic device; capturing log data related to at least one domain name from the network connection data; analyzing the log data to generate at least one numerical feature related to the at least one domain name; inputting the at least one numerical feature into a multi-type prediction model, which includes a first data model and a second data model; and predicting whether a malicious domain name related to a malware or a phishing website exists in the at least one domain name by the multi-type prediction model according to the at least one numerical feature.
    Type: Grant
    Filed: May 12, 2021
    Date of Patent: April 9, 2024
    Assignee: Acer Cyber Security Incorporated
    Inventors: Chiung-Ying Huang, Yi-Chung Tseng, Ming-Kung Sun, Tung-Lin Tsai
  • Publication number: 20210223107
    Abstract: An instrument for measuring polarized light 3D images and a manufacturing method thereof comprises an image sensor, a liquid crystal cell, and a polarizing plate. The polarizing plate comprises at least four quadrants and is disposed on top of the image sensor. When the polarization state of light is sensed, the image sensor captures and calculates four detection parameters to determine Stokes parameters S0˜S3, S0=I (0°, 0°)+I (90°, 0°), S1=I (0°, 0°), ?I (90°,0°), S2=2·I (45°, 0°)?S0, S3=2·I (45°, ?/2)?S0.
    Type: Application
    Filed: February 13, 2020
    Publication date: July 22, 2021
    Inventors: Yu-Jen WANG, Huai-An HSIEH, Yi-Hsin LIN, Po-Lun CHEN, Chun-Ta CHEN, Ta-Jen HUANG, Yi-Lin SUN
  • Patent number: 10928674
    Abstract: A manufacturing method using a micro-miniature LED as a light source for backlight thickness reduction and light efficiency improvement comprising a plurality of spaced apart light emitting diode chips on a substrate. Colloid with uniformly distributed diffusion particles is coated to fill gaps between LED chips. A roller is applied to the surface of the colloid and a continuous geometric structure is formed with a cone structure in the horizontal-vertical (XY axis) direction. An ultraviolet curing device is used for optical UV curing of the continuous geometric structure to create a brightness enhancement layer.
    Type: Grant
    Filed: March 16, 2020
    Date of Patent: February 23, 2021
    Assignees: INTERFACE TECHNOLOGY (CHENGDU) CO., LTD., INTERFACE OPTOELECTRONICS (SHENZHEN) CO., LTD., GENERAL INTERACE SOLUTION LIMITED
    Inventors: Hsien-Ying Chou, Po-Lun Chen, Nai-Hau Shiue, Chun-Ta Chen, Ta-Jen Huang, Yi-Lin Sun
  • Patent number: 9300950
    Abstract: An entertainment displaying system for generating interactive displaying effects corresponding to a real object in view of an observation area is disclosed. The entertainment displaying system includes a tracking module, a computing module and a stereoscopic displaying module. The tracking module is used for tracking a relative position relationship between the real object and the observation area. The computing module is configured for generating a stereoscopic virtual object according to the relative position relationship. The stereoscopic displaying module includes a transparent displaying apparatus and an optical-shielding structure. The transparent displaying apparatus is configured for displaying the stereoscopic virtual object. The optical-shielding structure is disposed adjacent to the transparent displaying apparatus and located between the transparent displaying apparatus and the real object.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: March 29, 2016
    Assignee: AU OPTRONICS CORPORATION
    Inventors: Yi-Lin Sun, Shih-Lun Lai, Yung-Sheng Tsai, Jen-Lang Tung
  • Patent number: 9261738
    Abstract: A Fresnel liquid crystal lens and a 2D/3D switchable display panel are provided. The Fresnel liquid crystal lens includes a plurality of liquid crystal lens units. Each liquid crystal lens unit includes a first main electrode and two first sub electrodes disposed on a first substrate, a second main electrode and two second sub electrodes disposed on a second substrate, and a liquid crystal layer disposed between the first and second substrates. The first sub electrodes are disposed on two opposite sides of the first main electrode, and a first gap is formed between the first main electrode and the first sub electrode. The second sub electrodes are disposed on two opposite sides of the second main electrode, and a second gap is formed between the second main electrode and the second sub electrode.
    Type: Grant
    Filed: November 16, 2014
    Date of Patent: February 16, 2016
    Assignee: AU Optronics Corp.
    Inventors: Sheng-Chi Liu, Po-Sen Yang, Yi-Lin Sun, Jen-Lang Tung
  • Publication number: 20150219970
    Abstract: A Fresnel liquid crystal lens and a 2D/3D switchable display panel are provided. The Fresnel liquid crystal lens includes a plurality of liquid crystal lens units. Each liquid crystal lens unit includes a first main electrode and two first sub electrodes disposed on a first substrate, a second main electrode and two second sub electrodes disposed on a second substrate, and a liquid crystal layer disposed between the first and second substrates. The first sub electrodes are disposed on two opposite sides of the first main electrode, and a first gap is formed between the first main electrode and the first sub electrode. The second sub electrodes are disposed on two opposite sides of the second main electrode, and a second gap is formed between the second main electrode and the second sub electrode.
    Type: Application
    Filed: November 16, 2014
    Publication date: August 6, 2015
    Inventors: Sheng-Chi Liu, Po-Sen Yang, Yi-Lin Sun, Jen-Lang Tung
  • Patent number: 9052865
    Abstract: A control method for image displaying applicable for use to a dual-side transparent display. The control method includes the following operations each required to be executed at least one time in a display period. The operations are: providing a left-eye signal of an image displayed on a first display surface of the dual-side transparent display, to a first side thereof; providing a right-eye signal of an image displayed on the first display surface of the dual-side transparent display, to the first side thereof; providing a left-eye signal of an image displayed on a second display surface of the dual-side transparent display, to a second side thereof; providing a right-eye signal of an image displayed on the second display surface of the dual-side transparent display, to the second side thereof; and configuring the dual-side transparent display to present a transparent state. A display system is also provided.
    Type: Grant
    Filed: December 6, 2012
    Date of Patent: June 9, 2015
    Assignee: AU OPTRONICS CORP.
    Inventors: Yi-Lin Sun, Shih-Lun Lai, Yung-Sheng Tsai, Jen-Lang Tung
  • Patent number: 9025133
    Abstract: In a laser interference lithography apparatus, a laser source provides a first laser beam, and an optics assembly is optically coupled to the laser source and receives and processes the first laser beam into one or multiple second laser beams. An exposure stage carries a to-be-exposed object. The fiber assembly receives and processes the second laser beam(s) into one or multiple single mode and stable coherent third laser beams without spatial noise. An interference pattern is generated on the to-be-exposed object using the third laser beam(s). The apparatus is configured without a pin hole spatial filter and a beam expander being disposed on an optical path from an output end of the laser source to the exposure stage.
    Type: Grant
    Filed: March 13, 2013
    Date of Patent: May 5, 2015
    Assignee: National Tsing Hua University
    Inventors: Chien-Chung Fu, Yi-Lin Sun, David Gerard Mikolas, Pao-Te Lin, En-Chiang Chang, Tze-Bin Huang
  • Publication number: 20140118715
    Abstract: In a laser interference lithography apparatus, a laser source provides a first laser beam, and an optics assembly is optically coupled to the laser source and receives and processes the first laser beam into one or multiple second laser beams. An exposure stage carries a to-be-exposed object. The fiber assembly receives and processes the second laser beam(s) into one or multiple single mode and stable coherent third laser beams without spatial noise. An interference pattern is generated on the to-be-exposed object using the third laser beam(s). The apparatus is configured without a pin hole spatial filter and a beam expander being disposed on an optical path from an output end of the laser source to the exposure stage.
    Type: Application
    Filed: March 13, 2013
    Publication date: May 1, 2014
    Applicant: NATIONAL TSING HUA UNIVERSITY
    Inventors: Chien-Chung FU, Yi-Lin SUN, David Gerard MIKOLAS, Pao-Te LIN, En-Chiang CHANG, Tze-Bin HUANG
  • Publication number: 20140049620
    Abstract: An entertainment displaying system for generating interactive displaying effects corresponding to a real object in view of an observation area is disclosed. The entertainment displaying system includes a tracking module, a computing module and a stereoscopic displaying module. The tracking module is used for tracking a relative position relationship between the real object and the observation area. The computing module is configured for generating a stereoscopic virtual object according to the relative position relationship. The stereoscopic displaying module includes a transparent displaying apparatus and an optical-shielding structure. The transparent displaying apparatus is configured for displaying the stereoscopic virtual object. The optical-shielding structure is disposed adjacent to the transparent displaying apparatus and located between the transparent displaying apparatus and the real object.
    Type: Application
    Filed: March 15, 2013
    Publication date: February 20, 2014
    Applicant: AU OPTRONICS CORPORATION
    Inventors: Yi-Lin SUN, Shih-Lun LAI, Yung-Sheng TSAI, Jen-Lang TUNG
  • Publication number: 20140022145
    Abstract: A control method for image displaying applicable for use to a dual-side transparent display. The control method includes the following operations each required to be executed at least one time in a display period. The operations are: providing a left-eye signal of an image displayed on a first display surface of the dual-side transparent display, to a first side thereof; providing a right-eye signal of an image displayed on the first display surface of the dual-side transparent display, to the first side thereof; providing a left-eye signal of an image displayed on a second display surface of the dual-side transparent display, to a second side thereof; providing a right-eye signal of an image displayed on the second display surface of the dual-side transparent display, to the second side thereof; and configuring the dual-side transparent display to present a transparent state. A display system is also provided.
    Type: Application
    Filed: December 6, 2012
    Publication date: January 23, 2014
    Applicant: AU OPTRONICS CORP.
    Inventors: Yi-Lin Sun, Shih-Lun Lai, Yung-Sheng Tsai, Jen-Lang Tung
  • Patent number: 8536004
    Abstract: A method for fabricating a semiconductor power device includes the following steps. First, a substrate having at least a semiconductor layer and a pad layer thereon is provided. At least a trench is etched into the pad layer and the semiconductor layer. Then, a dopant source layer is deposited in the trench and on the pad layer followed by thermally driving in dopants of the dopant source layer into the semiconductor layer. A polishing process is performed to remove the dopant source layer from a surface of the pad layer and a thermal oxidation process is performed to eliminate micro-scratches formed during the polishing process. Finally, the pad layer is removed to expose the semiconductor layer.
    Type: Grant
    Filed: August 17, 2011
    Date of Patent: September 17, 2013
    Assignee: Anpec Electronics Corporation
    Inventors: Yung-Fa Lin, Shou-Yi Hsu, Yi-Lin Sun
  • Patent number: 8536003
    Abstract: A method for fabricating a semiconductor power device includes the following steps. First, a substrate having thereon at least a semiconductor layer and a pad layer is provided. Then, at least a trench is etched into the pad layer and the semiconductor layer followed by depositing a dopant source layer in the trench and on the pad layer. A process is carried out thermally driving in dopants of the dopant source layer into the semiconductor layer. A rapid thermal process is performed to mend defects in the dopant source layer and defects between the dopant source layer and the semiconductor layer. Finally, a polishing process is performed to remove the dopant source layer from a surface of the pad layer.
    Type: Grant
    Filed: August 17, 2011
    Date of Patent: September 17, 2013
    Assignee: Anpec Electronics Corporation
    Inventors: Yung-Fa Lin, Shou-Yi Hsu, Yi-Lin Sun
  • Publication number: 20120289037
    Abstract: A method for fabricating a semiconductor power device includes the following steps. First, a substrate having at least a semiconductor layer and a pad layer thereon is provided. At least a trench is etched into the pad layer and the semiconductor layer. Then, a dopant source layer is deposited in the trench and on the pad layer followed by thermally driving in dopants of the dopant source layer into the semiconductor layer. A polishing process is performed to remove the dopant source layer from a surface of the pad layer and a thermal oxidation process is performed to eliminate micro-scratches formed during the polishing process. Finally, the pad layer is removed to expose the semiconductor layer.
    Type: Application
    Filed: August 17, 2011
    Publication date: November 15, 2012
    Inventors: Yung-Fa Lin, Shou-Yi Hsu, Yi-Lin Sun
  • Publication number: 20120276726
    Abstract: A method for fabricating a semiconductor power device includes the following steps. First, a substrate having thereon at least a semiconductor layer and a pad layer is provided. Then, at least a trench is etched into the pad layer and the semiconductor layer followed by depositing a dopant source layer in the trench and on the pad layer. A process is carried out thermally driving in dopants of the dopant source layer into the semiconductor layer. A rapid thermal process is performed to mend defects in the dopant source layer and defects between the dopant source layer and the semiconductor layer. Finally, a polishing process is performed to remove the dopant source layer from a surface of the pad layer.
    Type: Application
    Filed: August 17, 2011
    Publication date: November 1, 2012
    Inventors: Yung-Fa Lin, Shou-Yi Hsu, Yi-Lin Sun
  • Patent number: 5834346
    Abstract: A method for preventing bubble formation over source/drain active areas in p-channel MOSFETs is described. Bubble formation occurs when the source/drain areas and silicon containing gate electrodes are implanted with BF.sub.2.sup.+ molecule ions following an anisotropic LDD spacer etch using a plasma. It is found that the plasma causes the silicon surface to become prone to adsorption of BF.sub.2.sup.+ molecule ions during the source/drain/gate implantation. These adsorbed species are released and form bubbles during reflow of a subsequently deposited glass layer. The invention performs the spacer etch only partially with the anisotropic plasma and completes the spacer formation with a wet etch. The active silicon and gate electrode surfaces are thus not damaged by the plasma. Consequently adsorption of BF.sub.2.sup.+ molecule ions is inhibited and bubble formation does not occur during reflow.
    Type: Grant
    Filed: October 14, 1997
    Date of Patent: November 10, 1998
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yi-Lin Sun, Cheng-Yeh Shih, Chwen-Ming Liu
  • Patent number: 5674357
    Abstract: A method for removing particulate residues from semiconductor substrates. A semiconductor substrate is provided which has upon its surface a particulate residue. At minimum, either the semiconductor substrate or the particulate residue is susceptible to oxidation upon exposure to an oxygen containing plasma. The semiconductor substrate and the particulate residue are exposed to an oxygen plasma. The particulates are then rinsed from the surface of the semiconductor substrate with deionized water.
    Type: Grant
    Filed: August 30, 1995
    Date of Patent: October 7, 1997
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yi-Lin Sun, Ying-Chen Chao