Patents by Inventor Yi-Lun Hsu

Yi-Lun Hsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12230744
    Abstract: A light-emitting device includes a substrate including a top surface, a first side surface and a second side surface, wherein the first side surface and the second side surface of the substrate are respectively connected to two opposite sides of the top surface of the substrate; a semiconductor stack formed on the top surface of the substrate, the semiconductor stack including a first semiconductor layer, a second semiconductor layer, and an active layer formed between the first semiconductor layer and the second semiconductor layer; a first electrode pad formed adjacent to a first edge of the light-emitting device; and a second electrode pad formed adjacent to a second edge of the light-emitting device, wherein in a top view of the light-emitting device, the first edge and the second edge are formed on different sides or opposite sides of the light-emitting device, the first semiconductor layer adjacent to the first edge includes a first sidewall directly connected to the first side surface of the substrate,
    Type: Grant
    Filed: September 20, 2023
    Date of Patent: February 18, 2025
    Assignee: EPISTAR CORPORATION
    Inventors: Chao-Hsing Chen, Cheng-Lin Lu, Chih-Hao Chen, Chi-Shiang Hsu, I-Lun Ma, Meng-Hsiang Hong, Hsin-Ying Wang, Kuo-Ching Hung, Yi-Hung Lin
  • Publication number: 20140141188
    Abstract: Disclosed is a halogen-free retardant acrylic resin, including a copolymer of an acrylate monomer (I) and a phosphorus-containing monomer (II), wherein R1 is H or methyl; R2 is H, alkyl, ester, alkyl ester, aryl, or heteroaryl, and R3 is H or methyl, and X is (CH2)x, x being an integer of 1-11, (CH2CH2O)y, y being an integer of 1-5, or (CH2)zO, z being an integer of 2-10, and n is an integer or a non-integer of 1-2. A molded article of the halogen-free retardant acrylic resin is also provided.
    Type: Application
    Filed: December 27, 2012
    Publication date: May 22, 2014
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Feng-Ming HSIEH, Chun-Yen CHEN, Yi-Lun HSU, Kuo-Chen SHIH
  • Patent number: 8661917
    Abstract: A method for manufacturing a piezoresistive material, a piezoresistive composition and a pressure sensor device are provided. The piezoresistive composition includes a conductive carbon material, a solvent, a dispersive agent, an unsaturated polyester and a crosslinking agent. The conductive carbon material is selected from a group consisting of multi-wall nanotube, single-wall carbon nanotube, carbon nanocapsule, graphene, graphite nanoflake, carbon black, and a combination thereof. The solvent is selected from a group consisting of ethyl acetate, butyl acetate, hexane, propylene glycol mono-methyl ether acetate and a combination thereof. The dispersive agent includes block polymer solution with functional groups providing the affinity. The unsaturated polyester is selected from a group consisting of an ortho-phthalic type unsaturated polyester, an iso-phthalic type unsaturated polyester, and a combination thereof.
    Type: Grant
    Filed: October 14, 2011
    Date of Patent: March 4, 2014
    Assignee: Industrial Technology Research Institute
    Inventors: Li-Cheng Jheng, Wen-Yang Chang, Kuo-Chen Shih, Yi-Lun Hsu
  • Publication number: 20120090408
    Abstract: A method for manufacturing a piezoresistive material, a piezoresistive composition and a pressure sensor device are provided. The piezoresistive composition includes a conductive carbon material, a solvent, a dispersive agent, an unsaturated polyester and a crosslinking agent. The conductive carbon material is selected from a group consisting of multi-wall nanotube, single-wall carbon nanotube, carbon nanocapsule, graphene, graphite nanoflake, carbon black, and a combination thereof. The solvent is selected from a group consisting of ethyl acetate, butyl acetate, hexane, propylene glycol mono-methyl ether acetate and a combination thereof. The dispersive agent includes block polymer solution with functional groups providing the affinity. The unsaturated polyester is selected from a group consisting of an ortho-phthalic type unsaturated polyester, an iso-phthalic type unsaturated polyester, and a combination thereof.
    Type: Application
    Filed: October 14, 2011
    Publication date: April 19, 2012
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Li-Cheng Jheng, Wen-Yang Chang, Kuo-Chen Shih, Yi-Lun Hsu