Patents by Inventor Yi Lyu

Yi Lyu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10914022
    Abstract: A spiral yarn structure includes a core yarn comprising at least one core filament which is a filament fiber of 5-25D, a cover yarn comprising a plurality of cover fibers formed by stretching roves having a count ranging from 0.5 Ne to 2.0 Ne, wherein the cover fibers encloses the core yarn, and a wrap yarn wrapping the cover yarn at a twist factor K?3, wherein the wrap yarn comprises at least one wrap filament which is a filament fiber of 5-25D, and the at least one wrap filament wraps an outer side of the cover yarn at an inclined angle to form the spiral yarn structure having a count ranging from 40 Ne to 80 Ne.
    Type: Grant
    Filed: September 19, 2018
    Date of Patent: February 9, 2021
    Assignee: CORETEK FIBERS LTD
    Inventors: Wen-Chi Huang, Ting-Yi Lyu
  • Patent number: 10316064
    Abstract: Described herein are compounds of Formula (I), or pharmaceutically acceptable salts thereof, and pharmaceutical compositions thereof. Compounds of the present invention are useful for inhibiting bacterial growth.
    Type: Grant
    Filed: January 26, 2015
    Date of Patent: June 11, 2019
    Assignee: Academia Sinica
    Inventors: Tsung-Lin Li, Syue-Yi Lyu, Yu-CHen Liu, Chin-Yuan Chang
  • Publication number: 20190085486
    Abstract: A spiral yarn structure includes a core yarn comprising at least one core filament which is a filament fiber of 5-25D, a cover yarn comprising a plurality of cover fibers formed by stretching roves having a count ranging from 0.5 Ne to 2.0 Ne, wherein the cover fibers encloses the core yarn, and a wrap yarn wrapping the cover yarn at a twist factor K?3, wherein the wrap yarn comprises at least one wrap filament which is a filament fiber of 5-25D, and the at least one wrap filament wraps an outer side of the cover yarn at an inclined angle to form the spiral yarn structure having a count ranging from 40 Ne to 80 Ne.
    Type: Application
    Filed: September 19, 2018
    Publication date: March 21, 2019
    Inventors: WEN-CHI HUANG, TING-YI LYU
  • Publication number: 20170327542
    Abstract: Described herein are compounds of Formula (I), or pharmaceutically acceptable salts thereof, and pharmaceutical compositions thereof. Compounds of the present invention are useful for inhibiting bacterial growth. Methods of using the compounds for treating and/or preventing bacterial infection as well as methods of preparing the compounds are also described.
    Type: Application
    Filed: January 26, 2015
    Publication date: November 16, 2017
    Applicant: ACADEMIA SINICA
    Inventors: Tsung-Lin LI, Syue-Yi LYU, Yu-Chen LIU, Chin-Yuan CHANG
  • Publication number: 20160347795
    Abstract: Described herein are compounds of Formula (I), or pharmaceutically acceptable salts thereof, and pharmaceutical compositions thereof. Compounds of the present invention are useful for inhibiting bacterial growth. Methods of using the compounds for treating and/or preventing bacterial infection as well as methods of preparing the compounds are also described.
    Type: Application
    Filed: January 26, 2015
    Publication date: December 1, 2016
    Applicant: ACADEMIA SINICA
    Inventors: Tsung-Lin LI, Syue-Yi LYU, Yu-Chen LIU, Chin-Yuan CHANG
  • Patent number: 8951961
    Abstract: A novel pharmaceutical composition comprising a compound of formula (I) is disclosed. The novel compound can include a pharmaceutically acceptable carrier. The invention further comprises methods for making compounds of formula (I) using Dbv29, and to the use of compound of formula (I) to treat bacterial infections.
    Type: Grant
    Filed: July 10, 2013
    Date of Patent: February 10, 2015
    Assignee: Academia Sinica
    Inventors: Tsung-Lin Li, Yu-Chen Liu, Yi-Shan Li, Syue-Yi Lyu
  • Publication number: 20130288955
    Abstract: A novel pharmaceutical composition comprising a compound of formula (I) is disclosed. The novel compound can include a pharmaceutically acceptable carrier. The invention further comprises methods for making compounds of formula (I) using Dbv29, and to the use of compound of formula (I) to treat bacterial infections.
    Type: Application
    Filed: July 10, 2013
    Publication date: October 31, 2013
    Inventors: Tsung-Lin Li, Yu-Chen Liu, Yi-Shan Li, Syue-Yi Lyu
  • Patent number: 8507427
    Abstract: A novel pharmaceutical composition comprising a compound of formula (I) is disclosed. The novel compound can include a pharmaceutically acceptable carrier. The invention further comprises methods for making compounds of formula (I) using Dbv29, and to the use of compound of formula (I) to treat bacterial infections.
    Type: Grant
    Filed: October 1, 2010
    Date of Patent: August 13, 2013
    Assignee: Academia Sinica
    Inventors: Tsung-Lin Li, Yu-Chen Liu, Yi-Shan Li, Syue-Yi Lyu
  • Publication number: 20120108498
    Abstract: A novel pharmaceutical composition comprising a compound of formula (I) is disclosed. The novel compound can include a pharmaceutically acceptable carrier. The invention further comprises methods for making compounds of formula (I) using Dbv29, and to the use of compound of formula (I) to treat bacterial infections.
    Type: Application
    Filed: October 1, 2010
    Publication date: May 3, 2012
    Applicant: Academia Sinica
    Inventors: Tsung-Lin Li, Yu-Chen Liu, Yi-Shan Li, Syue-Yi Lyu
  • Publication number: 20070027225
    Abstract: The present invention provides a composition for preparing porous dielectric thin films containing pore-generating material, said composition comprising gemini detergent, and/or a quaternary alkyl ammonium salt, a thermo-stable organic or inorganic matrix precursor, and solvent for dissolving the two solid components. There is also provided an interlayer insulating film having good mechanical properties such as hardness, modulus and hydroscopicity, which is required for semiconductor devices.
    Type: Application
    Filed: October 6, 2006
    Publication date: February 1, 2007
    Inventors: Yi Lyu, Kwang Lee, Ji Kim, Seok Chang, Jin Yim, Jae Park
  • Publication number: 20060264595
    Abstract: A siloxane-based resin having a novel structure and a semiconductor interlayer insulating film using the same. The siloxane-based resins have a low dielectric constant in addition to excellent mechanical properties and are useful materials in an insulating film between interconnect layers of a semiconductor device.
    Type: Application
    Filed: May 11, 2006
    Publication date: November 23, 2006
    Inventors: Yi Lyu, Ki Song, Joon Ryu, Jong Seon
  • Publication number: 20060147715
    Abstract: Disclosed is a composition for preparing an organic insulator, the composition comprising (i) at least one organic-inorganic hybrid material; (ii) at least one organometallic compound and/or organic polymer; and (iii) at least one solvent for dissolving the above two components, so that an organic insulator using the same has a low threshold voltage and driving voltage, and high charge carrier mobility and Ion/Ioff ratio, thereby enhancing insulator characteristics. Further, the preparation of organic insulating film can be carried out by wet process, so that simplification of the process and cut of cost are achieved.
    Type: Application
    Filed: March 24, 2004
    Publication date: July 6, 2006
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Sang Lee, Jong Park, Yi Lyu, Bon Koo, Young Byun, Eun Seo
  • Publication number: 20060094172
    Abstract: A method of fabricating a thin film transistor, in which source and drain electrodes are formed through a solution process, thus all stages which include formation of electrodes on a substrate, formation of an insulator layer, and formation of an organic semiconductor layer are conducted through the solution process. In the method, the fabrication is simplified and a fabrication cost is reduced. It is possible to apply the organic thin film transistor to integrated circuits requiring high speed switching because of high charge mobility.
    Type: Application
    Filed: June 2, 2005
    Publication date: May 4, 2006
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Tae Lee, Young Byun, Yi Lyu, Sang Lee, Bon Koo
  • Publication number: 20050259212
    Abstract: A composition for preparing an organic insulator, the composition comprising (i) at least one organic-inorganic hybrid material; (ii) at least one organometallic compound and/or organic polymer; and (iii) at least one solvent for dissolving the above two components, so that an organic insulator using the same has a low threshold voltage and driving voltage, and high charge carrier mobility and Ion/Ioff ratio, thereby enhancing insulator characteristics. Further, the preparation of organic insulating film can be carried out by wet process, so that simplification of the process and cut of cost are achieved.
    Type: Application
    Filed: May 13, 2005
    Publication date: November 24, 2005
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Sang Lee, Jong Park, Yi Lyu, Bon Koo, Young Byun, Eun Seo
  • Publication number: 20050090570
    Abstract: A composition for forming a porous dielectric film which is prepared by dissolving a siloxane-based precursor containing hydroxyl groups or alkoxy groups and a pore-generating material together with a condensation catalyst generator capable of curing the siloxane-based resin precursor, in an organic solvent. The porous dielectric film has a low dielectric constant and improved physical properties and is formed by coating the composition onto a substrate, followed by light exposure to cause polycondensation at low temperature. A method for forming a negative pattern of a porous dielectric film is also provided without the use of a photoresist by exposing the coated film to light through a mask, and removing unexposed regions with a developing agent.
    Type: Application
    Filed: March 25, 2004
    Publication date: April 28, 2005
    Inventors: Yi Lyu, Jin Yim, Jong Seon
  • Publication number: 20050049382
    Abstract: A siloxane-based resin having a novel structure and a semiconductor interlayer insulating film using the same. The siloxane-based resins have a low dielectric constant in addition to excellent mechanical properties and are useful materials in an insulating film between interconnecting layers of a semiconductor device.
    Type: Application
    Filed: February 2, 2004
    Publication date: March 3, 2005
    Inventors: Yi Lyu, Jin Yim, Ki Song, Hyun Jeong, Joon Ryu
  • Publication number: 20050003681
    Abstract: A siloxane-based resin having a novel structure and a semiconductor interlayer insulating film using the same. The siloxane-based resins have a low dielectric constant in addition to excellent mechanical properties and are useful materials in an insulating film between interconnect layers of a semiconductor device.
    Type: Application
    Filed: November 28, 2003
    Publication date: January 6, 2005
    Inventors: Yi Lyu, Ki Song, Joon Ryu, Jong Seon
  • Publication number: 20050001210
    Abstract: An organic thin film transistor (OTFT) comprising a gate electrode, a gate insulating film, an organic active layer and a source/drain electrode, or a gate electrode, a gate insulating film, a source/drain electrode and an organic active layer, sequentially formed on a substrate, wherein the gate insulating film is a multi-layered insulator comprising a first layer of a high dielectric material and a second layer of an insulating organic polymer compatible with the organic active layer, the second layer being positioned directly under the organic active layer. The OTFT of the present invention shows low threshold and driving voltages, high charge mobility, and high Ion/Ioff, and it can be prepared by a wet process.
    Type: Application
    Filed: February 3, 2004
    Publication date: January 6, 2005
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sang Lee, Jong Park, Yi Lyu, Young Byun, Bon Koo, In Kang