Patents by Inventor Yi-Ming Hsu
Yi-Ming Hsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240136546Abstract: A vacuum battery structural assembly and a vacuum multi-cell battery module composed thereof are provided and include a first repeating unit including a first frame plate and a second frame plate with respect to the first frame plate; and an electrolyte channel defined within the first frame plate and the second frame plate to accommodate a liquid electrolyte, wherein both a surface of the first frame plate and a surface of the second frame plate include a vacuum suction area, the vacuum suction area includes a vacuum aperture and a vacuum channel, wherein the vacuum aperture is formed on at least one surface of the first frame plate and the second frame plate, the vacuum channel is positioned inside the first frame plate and the second frame plate, and is configured to generate a longitudinal pressing suction force and seal the first frame plate and the second frame plate.Type: ApplicationFiled: November 23, 2022Publication date: April 25, 2024Inventors: Hung-Hsien Ku, Shang-Qing Zhuang, Ning-Yih Hsu, Chien-Hong Lin, Han-Jou Lin, Yi-Hsin Hu, Po-Yen Chiu, Yao-Ming Wang
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Patent number: 11942467Abstract: A semiconductor structure includes a first metal-dielectric-metal layer, a first dielectric layer, a first conductive layer, a second conductive layer, and a second dielectric layer. The first metal-dielectric-metal layer includes a plurality of first fingers, a plurality of second fingers, and a first dielectric material. The first fingers are electrically connected to a first voltage. The second fingers are electrically connected to a second voltage different from the first voltage, and the first fingers and the second fingers are arranged in parallel and staggeredly. The first dielectric material is between the first fingers and the second fingers. The first dielectric layer is over the first metal-dielectric-metal layer. The first conductive layer is over the first dielectric layer. The second conductive layer is over the first conductive layer. The second dielectric layer is between the first conductive layer and the second conductive layer.Type: GrantFiled: June 18, 2021Date of Patent: March 26, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.Inventors: I-Sheng Chen, Yi-Jing Li, Chia-Ming Hsu, Wan-Lin Tsai, Clement Hsingjen Wann
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Patent number: 11931187Abstract: A method for predicting clinical severity of a neurological disorder includes steps of: a) identifying, according to a magnetic resonance imaging (MRI) image of a brain, brain image regions each of which contains a respective portion of diffusion index values of a diffusion index, which results from image processing performed on the MRI image; b) for one of the brain image regions, calculating a characteristic parameter based on the respective portion of the diffusion index values; and c) calculating a severity score that represents the clinical severity of the neurological disorder of the brain based on the characteristic parameter of the one of the brain image regions via a prediction model associated with the neurological disorder.Type: GrantFiled: March 16, 2018Date of Patent: March 19, 2024Assignees: Chang Gung Medical Foundation Chang Gung Memorial Hospital at Keelung, Chang Gung Memorial Hospital, Linkou, Chang Gung UniversityInventors: Jiun-Jie Wang, Yi-Hsin Weng, Shu-Hang Ng, Jur-Shan Cheng, Yi-Ming Wu, Yao-Liang Chen, Wey-Yil Lin, Chin-Song Lu, Wen-Chuin Hsu, Chia-Ling Chen, Yi-Chun Chen, Sung-Han Lin, Chih-Chien Tsai
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Patent number: 11916151Abstract: Present disclosure provides a semiconductor structure, including a semiconductor fin having a first portion and a second portion over the first portion, a first conductive region abutting a first lateral surface of the first portion and a first lateral surface of the second portion, a metal gate having a bottom portion and an upper portion, the bottom portion being between the first portion and the second portion of the semiconductor fin, and the upper portion being over the second portion of the semiconductor fin, and a first spacer between the bottom portion of the metal gate and the first conductive region. A method for manufacturing the semiconductor structure described herein is also provided.Type: GrantFiled: June 25, 2021Date of Patent: February 27, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.Inventors: Chia-Ming Hsu, Yi-Jing Li, Chih-Hsin Ko, Kuang-Hsin Chen, Da-Wen Lin, Clement Hsingjen Wann
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Publication number: 20230377847Abstract: A spot type atmospheric pressure plasma device includes a metal casing, a metal electrode, a dielectric layer, and a gas channel. The metal electrode is disposed in an inner space of the metal casing. The dielectric layer is disposed in the inner space and surrounds an outer side surface of the metal electrode. A central area of a bottom of the dielectric layer has a plasma jet, and a bottom of the metal electrode is adjacent to the plasma jet. The gas channel includes a first section, a second section, and a third section. The first section passes through the metal casing and the dielectric layer. The second section is connected to the first section and extends between the dielectric layer and the outer side surface. The third section is connected to the second section, and is configured to direct a working gas to the plasma jet.Type: ApplicationFiled: May 20, 2022Publication date: November 23, 2023Inventors: Yi-Ming HSU, Liang-Chun WANG, Yung-Hao CHEN, Po-Hsuan CHEN, Wen-Chieh TAN, Huang-Wei CHEN
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Publication number: 20230377846Abstract: A wide area atmospheric pressure plasma device includes a metal casing, a metal electrode, and a dielectric layer. The metal casing includes a chamber, at least one gas channel, and a plasma jet channel, in which the plasma jet channel is located under the chamber. The metal electrode is disposed within the chamber, is adjacent to the plasma jet channel, and extends along a length direction of the plasma jet channel. An outlet of the gas channel is adjacent to a bottom of the metal electrode, such that a working gas in the gas channel is sprayed towards the bottom of the metal electrode. The dielectric layer wraps the metal electrode.Type: ApplicationFiled: May 19, 2022Publication date: November 23, 2023Inventors: Yi-Ming HSU, Liang-Chun WANG, Yung-Hao CHEN, Po-Hsuan CHEN, Shih-Chang WANG, Huang-Wei CHEN
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Patent number: 9873133Abstract: An extrusion device includes a container, a pump, a plurality of pipes, and an adjustment device. The container has a chamber, and a first inlet/outlet and a second inlet/outlet connected to the chamber, wherein the chamber is adapted to contain a fluid inside. The pipes are connected between the pump and the first and second inlet/outlets of the container, so as to form a fluid loop. The pump is adapted to drive the fluid to flow inside the fluid loop. The adjustment device is coupled to the container for adjusting a volume of the chamber. Further, a coating system is also provided.Type: GrantFiled: October 8, 2014Date of Patent: January 23, 2018Assignee: Creating Nano Technologies, Inc.Inventors: Yi-Ming Hsu, Yen-Ling Liu, Li-Min Wang, Chien-Cheng Wang, Wen-Hsiao Shen
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Patent number: 9474141Abstract: An arc atmospheric pressure plasma device is described. The arc atmospheric pressure plasma device includes a first electrode, a second electrode and a nozzle. The first electrode is configured to connect to a power supply. The second electrode has a chamber and is grounded. The first electrode is located within the chamber. The nozzle is connected to a bottom of the second electrode, and has at least two nozzle channels. The nozzle channels communicate with the chamber.Type: GrantFiled: January 7, 2016Date of Patent: October 18, 2016Assignee: CREATING NANO TECHNOLOGIES, INC.Inventors: Chau-Nan Hong, Yi-Ming Hsu, Li-Min Wang
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Publication number: 20160258816Abstract: An optical method for monitoring plasma discharging glow is described, which includes the following steps. Plasma discharging glow is detected to obtain various optical signals using a detector. The optical signals are captured and converted into various electric signals by using a sensing circuit. A calculation step is performed according to the electric signals to obtain various light intensities corresponding to various locations in the plasma discharging glow using an arithmetic unit. An image of the plasma discharging glow is reconstructed according to the locations in the plasma discharging glow and the corresponding light intensities using an image reconstruction unit.Type: ApplicationFiled: September 9, 2015Publication date: September 8, 2016Inventors: Ji-Yung LEE, Yi-Ming HSU, Li-Min WANG, Yu-Chun HUANG, Yen-Cheng CHEN
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Patent number: 9341884Abstract: The present invention provides a LCOS device including a silicon substrate, a first dielectric layer, a first mirror layer, a second dielectric layer, and a second mirror layer. The first dielectric layer is disposed on the silicon substrate. The first mirror layer is disposed on the first dielectric layer. The second dielectric layer is disposed on the first mirror layer. The second mirror layer is disposed on the second dielectric layer.Type: GrantFiled: September 23, 2013Date of Patent: May 17, 2016Assignee: United Microelectronics Corp.Inventors: Yi-Ming Hsu, Feng-Ying Hsu, Chieh-Yu Tsai
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Patent number: 9320125Abstract: A plasma device including a casing, a first electrode, a second electrode, a nozzle and a gas ejection port is provided. The casing has a first chamber. The first electrode is disposed within the first chamber and has a second chamber. The second electrode capable of rotating in relative to the casing has a third chamber connected with the second chamber. The second chamber and the third chamber are adapted for accommodating plasma formed between the first electrode and the second electrode. The nozzle and the gas ejection port are independently disposed at the bottom of the second electrode respectively, wherein the nozzle is configured to eject the plasma, and forms an included angle with or is spaced a distance apart from a rotating axis of the second electrode. The gas ejection port is configured to eject cold gas.Type: GrantFiled: October 8, 2014Date of Patent: April 19, 2016Assignee: Creating Nano Technologies, Inc.Inventors: Yi-Ming Hsu, Li-Min Wang, An-Jen Li
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Publication number: 20150360251Abstract: An extrusion device includes a container, a pump, a plurality of pipes, and an adjustment device. The container has a chamber, and a first inlet/outlet and a second inlet/outlet connected to the chamber, wherein the chamber is adapted to contain a fluid inside. The pipes are connected between the pump and the first and second inlet/outlets of the container, so as to form a fluid loop. The pump is adapted to drive the fluid to flow inside the fluid loop. The adjustment device is coupled to the container for adjusting a volume of the chamber. Further, a coating system is also provided.Type: ApplicationFiled: October 8, 2014Publication date: December 17, 2015Inventors: Yi-Ming Hsu, Yen-Ling Liu, Li-Min Wang, Chien-Cheng Wang, Wen-Hsiao Shen
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Publication number: 20150303034Abstract: A plasma device including a casing, a first electrode, a second electrode, a nozzle and a gas ejection port is provided. The casing has a first chamber. The first electrode is disposed within the first chamber and has a second chamber. The second electrode capable of rotating in relative to the casing has a third chamber connected with the second chamber. The second chamber and the third chamber are adapted for accommodating plasma formed between the first electrode and the second electrode. The nozzle and the gas ejection port are independently disposed at the bottom of the second electrode respectively, wherein the nozzle is configured to eject the plasma, and forms an included angle with or is spaced a distance apart from a rotating axis of the second electrode. The gas ejection port is configured to eject cold gas.Type: ApplicationFiled: October 8, 2014Publication date: October 22, 2015Inventors: Yi-Ming Hsu, Li-Min Wang, An-Jen Li
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Publication number: 20150085234Abstract: The present invention provides a LCOS device including a silicon substrate, a first dielectric layer, a first mirror layer, a second dielectric layer, and a second mirror layer. The first dielectric layer is disposed on the silicon substrate. The first mirror layer is disposed on the first dielectric layer. The second dielectric layer is disposed on the first mirror layer. The second minor layer is disposed on the second dielectric layer.Type: ApplicationFiled: September 23, 2013Publication date: March 26, 2015Applicant: United Microelectronics Corp.Inventors: Yi-Ming Hsu, Feng-Ying Hsu, Chieh-Yu Tsai
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Publication number: 20110037395Abstract: A vehicle includes a vehicle body and a solar-powered light emitting device. The solar-powered light emitting device includes a hollow base, a light emitting unit, a light guide element, a power supply unit, and a control unit. The hollow base is disposed on a lateral side of the vehicle body, confines a receiving space, and is formed with a light exit in spatial communication with the receiving space. The light emitting unit includes a control board and a light emitting element. The light guide element is disposed on the hollow base outwardly of the receiving space, and is disposed to receive the light passing through the light exit. The power supply unit includes a solar cell and a rechargeable battery unit. The control unit is coupled electrically to the rechargeable battery unit and the light emitting unit, and includes a light sensor and a vibration sensor.Type: ApplicationFiled: August 12, 2009Publication date: February 17, 2011Inventors: Chung-Hsu Kao, Yi-Ming Hsu