Abstract: In a method of forming a pattern over a semiconductor substrate, a target layer to be patterned is formed over a substrate, a mask pattern including an opening is formed in a mask layer, a shifting film is formed in an inner sidewall of the opening, a one-directional etching operation is performed to remove a part of the shifting film and a part of the mask layer to form a shifted opening, and the target layer is patterned by using the mask layer with the shifted opening as an etching mask. A location of the shifted opening is laterally shifted from an original location of the opening.

Abstract: Devices and methods of use and manufacture for the identification and characterization of analytes, e.g. proteins, are provided. The subject devices are characterized by having a substrate with a polymerized monomolecular film over at least a portion of the substrate, the monomolecular film having at least one ligand or specific binding pair member associated therewith. Preferably the monomolecular film is stable to the laser intensities employed in MALDI-MS. In certain embodiments, the ligands are biotin, integrin antagonists, antibodies and antigens. In using the subject devices, a subject device is contacted with a sample. If present in the sample, a member of the binding pair of interest binds to its complementary ligand and, once bound, can be analyze by mass spectroscopy techniques. Also provided are kits, which include the subject devices.