Abstract: A slurry dispersion system is provided, and includes a slurry source system, an in-line analyzer and a controller. The slurry source system provides a slurry for a chemical mechanical polishing (CMP) process. The in-line analyzer measures at least large particle count (LPC) value of a sampled slurry sampled from the slurry dispersion system, and generates an indication signal based on the LPC value, in which the indication signal indicates at lease one characteristic of the slurry. The controller receives the indication signal, and generates a control signal based on the indication signal for performing a real time control on the slurry dispersion system for controlling quality of the slurry.

Abstract: A slurry dispersion system is provided, and includes a slurry source system, an in-line analyzer and a controller. The slurry source system provides a slurry for a chemical mechanical polishing (CMP) process. The in-line analyzer measures at least one parameter of a sampled slurry sampled from the slurry dispersion system, and generates an indication signal based on the parameter, in which the indication signal indicates at lease one characteristic of the slurry. The controller receives the indication signal, and generates a control signal based on the indication signal for performing a real time control on the slurry dispersion system for controlling quality of the slurry.

Abstract: A slurry dispersion system is provided, and includes a slurry source system, an in-line analyzer and a controller. The slurry source system provides a slurry for a chemical mechanical polishing (CMP) process. The in-line analyzer measures at least one parameter of a sampled slurry sampled from the slurry dispersion system, and generates an indication signal based on the parameter, in which the indication signal indicates at lease one characteristic of the slurry. The controller receives the indication signal, and generates a control signal based on the indication signal for performing a real time control on the slurry dispersion system for controlling quality of the slurry.

Abstract: A slurry dispersion system is provided, and includes a slurry source system, an in-line analyzer and a controller. The slurry source system provides a slurry for a chemical mechanical polishing (CMP) process. The in-line analyzer measures at least one parameter of a sampled slurry sampled from the slurry dispersion system, and generates an indication signal based on the parameter, in which the indication signal indicates at lease one characteristic of the slurry. The controller receives the indication signal, and generates a control signal based on the indication signal for performing a real time control on the slurry dispersion system for controlling quality of the slurry.

Abstract: A test method includes: generating a start command in responses to a user input; testing each of the electronic devices in responses to the start command, and generating a test result for each of the electronic devices; obtaining a unique identifier of each of the electronic devices; obtaining the test result of each electronic device and generating a test file corresponding to each of the electronic device to record the test result; naming the test file according to the unique identifier of the corresponding electronic device; obtaining the test files, identifying the test files according to the test file name and determining whether each of the electronic devices are running in a normal state by analyzing the test result recorded in the test file. A test device using the above method is also described.

Abstract: In a method for processing test result reports using a computing device, the test result report is read from an original storage section of a database of the computing device. The method generates a classified report by classifying the test result report into a classification storage section of the database according to the file name of the test result report. The method further generates a filtrated reports by filtrating specific fields in the classified report according to predetermined important fields, and stores the filtrated report into a filtration storage section of the database. The method generates a desired result report by adding a parameter field into the filtrated report to store test parameters of the test result report, and stores the desired result report in a result storage section of the database.

Abstract: A method for managing test reports of a system under test (SUT) using a control computer obtains an initial test report of the SUT, adds error logs of the initial test report in a defect library of a storage device of the control computer, and adds error causes and solutions corresponding to the error logs in a root cause library and a solution library of the storage device respectively. The method further adds the error causes and the solutions corresponding to the error logs in the initial test report, to generate an optimized report of the SUT.