Patents by Inventor Yi Xiang Wang

Yi Xiang Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050201038
    Abstract: Method and apparatus for removing and neutralizing charges. The method includes loading a structure into a chamber. The structure includes a first surface and a plurality of charges away from the first surface. Additionally, the method includes supplying a first ionized gas to the first surface of the structure, and radiating the structure with a first ultraviolate light. The supplying a first ionized gas and the radiating the structure with a first ultraviolate light are performed simultaneously for a first period of time.
    Type: Application
    Filed: January 12, 2005
    Publication date: September 15, 2005
    Applicant: Hermes-Microvision, Inc.
    Inventors: Yi Xiang Wang, Guofan Ye
  • Patent number: 6791095
    Abstract: A method for inspecting a semiconductor wafer using an SEM having a nominal focal plane and operable for guiding a beam. The SEM having a stage movable in each of an X-, Y-, and Z-direction, including moving the SEM stage in the XY-direction to a first location for inspection, optically sensing the location of the top surface of an area in relation to the focal plane of the stage, adjusting the position of the stage in the Z-direction so that the top surface of the area is substantially at the focal plane, inspecting the areas, and moving the stage in the XY-direction to the next location such that the next area is under the SEM beam for inspection. The Z-stage using a non-contact optical sensor to provide feedback to drive a plurality of piezoelectric actuator to move the wafer to the focal plane.
    Type: Grant
    Filed: March 21, 2002
    Date of Patent: September 14, 2004
    Assignee: Hermes-Microvision (Taiwan) Inc.
    Inventors: Chung-Shih Pan, Yi Xiang Wang, Anil Desai
  • Publication number: 20030178576
    Abstract: A method for inspecting a semiconductor wafer using an SEM having a nominal focal plane and operable for guiding a beam. The SEM having a stage movable in each of an X-, Y-, and Z-direction, including moving the SEM stage in the XY-direction to a first location for inspection, optically sensing the location of the top surface of an area in relation to the focal plane of the stage, adjusting the position of the stage in the Z-direction so that the top surface of the area is substantially at the focal plane, inspecting the areas, and moving the stage in the XY-direction to the next location such that the next area is under the SEM beam for inspection. The Z-stage using a non-contact optical sensor to provide feedback to drive a plurality of piezoelectric actuator to move the wafer to the focal plane.
    Type: Application
    Filed: March 21, 2002
    Publication date: September 25, 2003
    Inventors: Chung-Shih Pan, Yi Xiang Wang, Anil Desai