Abstract: A method and apparatus for forming tungsten features in semiconductor devices is provided. The method includes exposing a top opening of a feature formed in a substrate to a physical vapor deposition (PVD) process to deposit a tungsten liner layer within the feature. The PVD process is performed in a first processing region of a first processing chamber and the tungsten liner layer forms an overhang portion, which partially obstructs the top opening of the feature. The substrate is transferred from the first processing region of the first processing chamber to a second processing region of a second processing chamber without breaking vacuum. The overhang portion is exposed to nitrogen-containing radicals in the second processing region to inhibit subsequent growth of tungsten along the overhang portion. The feature is exposed to a tungsten-containing precursor gas to form a tungsten fill layer over the tungsten liner layer within the feature.

Abstract: A power distribution network adapted to provide power to a plurality of components in an integrated circuit is provided. The power distribution network includes a power distribution trunk path, a plurality of first power distribution branch paths, and a plurality of second power distribution branch paths. The power distribution trunk path is used for transmitting the power. A long axis direction of the power distribution trunk path is a first direction. The first power distribution branch paths and the second power distribution branch paths are electrically connected to the power distribution trunk path. A long axis direction of the first power distribution branch paths is a second direction different from the first direction. A long axis direction of the second power distribution branch paths is a third direction different from the first direction and the second direction.

Abstract: A power distribution network adapted to provide power to a plurality of components in an integrated circuit is provided. The power distribution network includes a power distribution trunk path, a plurality of first power distribution branch paths, and a plurality of second power distribution branch paths. The power distribution trunk path is used for transmitting the power. A long axis direction of the power distribution trunk path is a first direction. The first power distribution branch paths and the second power distribution branch paths are electrically connected to the power distribution trunk path. A long axis direction of the first power distribution branch paths is a second direction different from the first direction. A long axis direction of the second power distribution branch paths is a third direction different from the first direction and the second direction.