Patents by Inventor Yi-Yeon Kim

Yi-Yeon Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10442796
    Abstract: The present invention relates to a novel 2,3,5-substituted thiophene compound having inhibitory activity against kinases, an anticancer agent including the compound as an active ingredient, and a method for preparing the compound.
    Type: Grant
    Filed: August 16, 2018
    Date of Patent: October 15, 2019
    Assignees: Korea Institute of Science and Technology, Daegu-Gyeongbuk Medical Innovation Foundation
    Inventors: Tae Bo Sim, Woo Young Hur, Chi Man Song, Ho Jong Yoon, Seung Hye Choi, Han Na Cho, Hwan Geun Choi, Nam Doo Kim, Jung Beom Son, Eun Hwa Ko, Hyun Kyoung Kim, Joong Heui Cho, Seock Yong Kang, So Young Kim, Yi Kyung Ko, Seung Yeon Lee, Suk Kyoon Yoon, Jae Hyun Bae
  • Patent number: 9245752
    Abstract: This present disclosure relates to an atomic layer etching method for graphene, including adsorbing reactive radicals onto a surface of the graphene and irradiating an energy source to the graphene on which the reactive radicals are adsorbed.
    Type: Grant
    Filed: January 22, 2014
    Date of Patent: January 26, 2016
    Assignee: Research & Business Foundation Sungkyunkwan University
    Inventors: Geun Young Yeom, Woong Sun Lim, Kyung Seok Min, Yi Yeon Kim, Jong Sik Oh
  • Publication number: 20140206192
    Abstract: This present disclosure relates to an atomic layer etching method for graphene, including adsorbing reactive radicals onto a surface of the graphene and irradiating an energy source to the graphene on which the reactive radicals are adsorbed.
    Type: Application
    Filed: January 22, 2014
    Publication date: July 24, 2014
    Applicant: RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY
    Inventors: Geun Young YEOM, Woong Sun LIM, Kyung Seok MIN, Yi Yeon KIM, Jong Sik OH
  • Publication number: 20110192820
    Abstract: An atomic layer etching apparatus using reactive radicals and neutral beams and an etching method using the same are provided.
    Type: Application
    Filed: February 25, 2010
    Publication date: August 11, 2011
    Applicant: SUNGKYUNKWAN UNIVERSITY Foundation for Corporate Collaboration
    Inventors: Geun-Young Yeom, Woong-Sun Lim, Sang-Duk Park, Yi-Yeon Kim, Byoung-Jae Park, Je-Kwan Yeon