Patents by Inventor Yi-Yu Hsu

Yi-Yu Hsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220309810
    Abstract: A method and apparatus for morphological analysis of neural cells may include receiving an immunohistochemistry (IHC) image of one or more neural cells; detecting the one or more neural cells in the IHC image using a first neural network, wherein the detecting includes identifying boundaries of the one or more neural cells; generating a segmentation cell mask using a second neural network based on the identified boundaries of the one or more neural cells; and classifying the one or more neural cells based on the generated segmentation cell mask using a trained classification model.
    Type: Application
    Filed: March 28, 2022
    Publication date: September 29, 2022
    Applicant: HOWARD UNIVERSITY
    Inventors: Tsang-Wei TU, Yi-YU HSU, Chao-Hsiung HSU, Artur AGARONYAN, Paul C. WANG
  • Patent number: 6977127
    Abstract: An alternating phase shift mask. The alternating phase shift mask includes a transparent substrate, a light-shielding layer disposed on the transparent substrate to define a transparent array consisting of a plurality of first phase rows and a plurality of second phase rows alternately interposed between the first phase rows. The alternating phase shift mask further comprises a phase interference enhancement feature disposed a predetermined distance from the outermost row of the transparent array, wherein the phases of the phase interference enhancement feature and the outermost row are reverse.
    Type: Grant
    Filed: December 16, 2002
    Date of Patent: December 20, 2005
    Assignee: Winbond Electronics Corp.
    Inventors: Chii-Ming Shiah, Yi-Yu Hsu, Yu-Cheng Tung, Hung-Yueh Liao, Kao-Tsai Tsai, Jong-Bor Wang
  • Patent number: 6846618
    Abstract: The present invention uses a double exposure and double etching method to improve critical dimension uniformity. A coating layer is formed on a wafer that includes a first area and a second area. The first area and the second area are separately patterned with different processing conditions. By means of this two-stage patterning, the CD uniformity between wafer center and wafer edge is successfully improved over the conventional single-stage patterning process. The fabrication yield is thus enhanced.
    Type: Grant
    Filed: August 8, 2002
    Date of Patent: January 25, 2005
    Assignee: Winbond Electronics Corporation
    Inventors: Yi-Yu Hsu, Kuo-Chen Wang, Yao-Ting Shao
  • Publication number: 20030134207
    Abstract: An alternating phase shift mask. The alternating phase shift mask includes a transparent substrate, a light-shielding layer disposed on the transparent substrate to define a transparent array consisting of a plurality of first phase rows and a plurality of second phase rows alternately interposed between the first phase rows. The alternating phase shift mask further comprises a phase interference enhancement feature disposed a predetermined distance from the outermost row of the transparent array, wherein the phases of the phase interference enhancement feature and the outermost row are reverse.
    Type: Application
    Filed: December 16, 2002
    Publication date: July 17, 2003
    Inventors: Chii-Ming Shiah, Yi-Yu Hsu, Yu-Cheng Tung, Hung-Yueh Liao, Kao-Tsai Tsai, Jong-Bor Wang
  • Publication number: 20030044722
    Abstract: The present invention uses a double exposure and double etching method to improve critical dimension uniformity. A coating layer is formed on a wafer that includes a first area and a second area. The first area and the second area are separately patterned with different processing conditions. By means of this two-stage patterning, the CD uniformity between wafer center and wafer edge is successfully improved over the conventional single-stage patterning process. The fabrication yield is thus enhanced.
    Type: Application
    Filed: August 8, 2002
    Publication date: March 6, 2003
    Inventors: Yi-Yu Hsu, Kuo-Chen Wang, Yao-Ting Shao
  • Patent number: 6361929
    Abstract: The present invention relates to a method of removing a photo-resist layer from a semiconductor wafer. The semiconductor wafer comprises an inter-metal dielectric layer (IMD), and a photo-resist layer positioned on the IMD. The method comprises performing a dry cleaning process by injecting a nitrogen-containing gas into an oxygen-free environment and utilizing a plasma reaction to remove most of the photo-resist layer, and performing a wet cleaning process to completely remove the photo-resist layer.
    Type: Grant
    Filed: August 13, 1999
    Date of Patent: March 26, 2002
    Assignee: United Microelectronics Corp.
    Inventors: Hsein-Ta Chung, Yi-Yu Hsu, Tong-Yu Chen, Tri-Rung Yew