Patents by Inventor Yi-Yuan Huang

Yi-Yuan Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11961714
    Abstract: A substrate processing apparatus comprises a chamber member that defines an interior volume that has an aspect ratio. The chamber member comprises a pair of laterally opposing inlet walls and a loading port. Each of the pair of laterally opposing inlet walls has an inlet port configured to receive output from a remote plasma source. The loading port is arranged between the pair of inlet walls, configured to allow passage of a substrate into the interior volume.
    Type: Grant
    Filed: May 31, 2021
    Date of Patent: April 16, 2024
    Assignee: LINCO TECHNOLOGY CO., LTD.
    Inventors: Yi-Yuan Huang, Yi-Cheng Liu
  • Publication number: 20240071731
    Abstract: A substrate processing apparatus, comprising: a processing chamber having a plasma intake wall configured to receive plasma from a remote plasma source (RPS) and a surrounding wall having an inner surface defining an interior volume for receiving a substrate; and a substrate support having a substrate supporting surface facing the plasma intake wall and elevatably arranged in the interior volume of the processing chamber. The surrounding wall, in a cross-section of the processing chamber, includes: a first segment having a first width associated with a processing region for the substrate support; a second segment having a width greater than the first width that is further away from the plasma intake wall than the first segment.
    Type: Application
    Filed: October 26, 2023
    Publication date: February 29, 2024
    Inventors: Yi-Yuan HUANG, Yi-Cheng LIU
  • Publication number: 20230398563
    Abstract: A parallel-type coating apparatus for coating at least one object to be coated carried by a carrier includes a double-layer vacuum chamber having feed and discharge chambers opposite to each other in a Z-direction, and a plurality of process chambers for performing at least a fixed point coating on the at least one object to be coated. The double-layer vacuum chamber and the process chambers are arranged in two juxtaposed rows in a Y-direction transverse to the Z-direction. A feed lifting mechanism is disposed in one of the double-layer vacuum chamber 3 and the process chambers, and includes a feed lifting seat movable in the Z-direction. A plurality of first conveying devices are respectively disposed in the other ones of the process chambers for conveying the carrier. A method for coating a multilayer film on at least one object to be coated carried by a carrier is also disclosed.
    Type: Application
    Filed: December 2, 2022
    Publication date: December 14, 2023
    Applicant: LINCO TECHNOLOGY CO., LTD.
    Inventors: Yi-Yuan HUANG, Yi-Cheng LIU
  • Publication number: 20230245860
    Abstract: A diffusing plate includes a plate body including a rectangular hole-configuring region, a plurality of holes arranged in the rectangular hole-configuring region and arranged concentrically to form a first to an N-th rectangular patterns from an inside to an outside sequentially. Scales of the first to the N-th rectangular patterns are incrementally increased, and N is a positive integer. One portion of the holes are located in an area near a center of the rectangular hole-configuring region, another portion of the holes are located in four corner areas of the rectangular hole-configuring region, each of the holes has a diameter, and the diameter of the one portion of the holes is smaller than the diameter of the another portion of the holes.
    Type: Application
    Filed: April 12, 2023
    Publication date: August 3, 2023
    Inventors: Yi-Yuan HUANG, Cheng-Yu TSAO, Cheng-Sheng LIN, Tsung-Wei CHANG, Yi-Cheng LIU
  • Publication number: 20220285132
    Abstract: A substrate processing apparatus comprises a chamber member that defines an interior volume that has an aspect ratio. The chamber member comprises a pair of laterally opposing inlet walls and a loading port. Each of the pair of laterally opposing inlet walls has an inlet port configured to receive output from a remote plasma source. The loading port is arranged between the pair of inlet walls, configured to allow passage of a substrate into the interior volume.
    Type: Application
    Filed: May 31, 2021
    Publication date: September 8, 2022
    Inventors: YI-YUAN HUANG, YI-CHENG LIU
  • Publication number: 20220254660
    Abstract: A substrate processing apparatus, comprising: a processing chamber having a plasma intake wall configured to receive plasma from a remote plasma source (RPS) and a surrounding wall having inner surface defining an interior volume for receiving a substrate; and a substrate support having a substrate supporting surface facing the plasma intake wall and elevatably arranged in the interior volume of the processing chamber. The surrounding wall, in a cross-section of the processing chamber, includes: a first segment having a first width associated with a processing region for the substrate support; a second segment having a width greater than the first width that is further away from the plasma intake wall than the first segment.
    Type: Application
    Filed: February 5, 2021
    Publication date: August 11, 2022
    Inventors: YI-YUAN HUANG, YI-CHENG LIU
  • Patent number: 9771649
    Abstract: A substrate carrier unit includes a substrate carrier and a phase transition material. The substrate carrier defines an isolated space therein. The phase transition material is filled into the isolated space of the substrate carrier and has a melting point ranging between 18° C. and 95° C. The phase transition material is capable of absorbing thermal energy from the substrate carrier as latent heat to change the phase from solid to liquid.
    Type: Grant
    Filed: May 5, 2015
    Date of Patent: September 26, 2017
    Assignee: Linco Technology Co., Ltd.
    Inventors: Chung-Yu Yeh, Huei-Chia Su, Cheng-Peng Yeh, Tsung-Wei Chang, Yi-Yuan Huang, Wan-Yu Huang, Mu-Sen Lu
  • Patent number: 9611542
    Abstract: A film deposition system includes a substrate carrier, a film deposition device, a transport device and a cooling device. The substrate carrier includes a carrier body that defines an isolated space therein, and a phase transition material that is filled into the isolated space and that has a melting point ranging between 18° C. and 95° C. The phase transition material is capable of absorbing thermal energy from the carrier body as latent heat to change the phase of the phase transition material from solid to liquid. The cooling device is configured to absorb thermal energy from the substrate carrier so as to change the phase of the phase transition material from liquid to solid.
    Type: Grant
    Filed: May 1, 2015
    Date of Patent: April 4, 2017
    Assignee: Linco Technology Co., Ltd.
    Inventors: Cheng-Peng Yeh, Huei-Chia Su, Chung-Yu Yeh, Tsung-Wei Chang, Yi-Yuan Huang, Wan-Yu Huang, Mu-Sen Lu
  • Publication number: 20170016110
    Abstract: A double-valve device includes a base unit, two valve units and a transport unit. The base unit has a surrounding wall, an entrance wall connected to the surrounding wall and formed with an entrance opening, an exit wall connected to the surrounding wall oppositely of the entrance wall and formed with an exit opening, and a spacing wall disposed between the entrance and exit walls and formed with a pass-through opening. The surrounding wall, the entrance wall and the spacing wall cooperatively define a buffer chamber. The surrounding wall, the spacing wall and the exit wall cooperatively define a joint chamber. The valve units are respectively disposed in the buffer and joint chambers for respectively sealing and unsealing the entrance and pass-through openings.
    Type: Application
    Filed: July 14, 2015
    Publication date: January 19, 2017
    Applicant: Linco Technology Co., LTD
    Inventors: Yi-Yuan Huang, Mu-Sen Lu, Wen-Lung Chen
  • Publication number: 20160326637
    Abstract: A substrate carrier unit includes a substrate carrier and a phase transition material. The substrate carrier defines an isolated space therein. The phase transition material is filled into the isolated space of the substrate carrier and has a melting point ranging between 18° C. and 95° C. The phase transition material is capable of absorbing thermal energy from the substrate carrier as latent heat to change the phase from solid to liquid.
    Type: Application
    Filed: May 5, 2015
    Publication date: November 10, 2016
    Inventors: Chung-Yu Yeh, Huei-Chia Su, Cheng-Peng Yeh, Tsung-Wei Chang, Yi-Yuan Huang, Wan-Yu Huang, Mu-Sen Lu
  • Publication number: 20160318061
    Abstract: A film deposition system includes a substrate carrier, a film deposition device, a transport device and a cooling device. The substrate carrier includes a carrier body that defines an isolated space therein, and a phase transition material that is filled into the isolated space and that has a melting point ranging between 18° C. and 95° C. The phase transition material is capable of absorbing thermal energy from the carrier body as latent heat to change the phase of the phase transition material from solid to liquid. The cooling device is configured to absorb thermal energy from the substrate carrier so as to change the phase of the phase transition material from liquid to solid.
    Type: Application
    Filed: May 1, 2015
    Publication date: November 3, 2016
    Inventors: Cheng-Peng Yeh, Huei-Chia Su, Chung-Yu Yeh, Tsung-Wei Chang, Yi-Yuan Huang, Wan-Yu Huang, Mu-Sen Lu
  • Publication number: 20090310779
    Abstract: Data from biometric images such as minutiae of a fingerprint are represented in coordinates x- and y-, and the direction of the ridge flow of the minutia ?; in vector sets of (x1, y1, ?1) are used in generating a 256-bit secret key in a secure manner in enrolling the fingerprint in the Enrolment Phase. The key generation algorithm includes random key generation, threshold signature scheme using polynomial functions, generating random fake minutiae vector sets to form a locked representation of the fingerprint. In the Query Phase, the fingerprint image used to re-generate the secret key is matched against the locked template representation through automatic alignment process using geometric hash table to compare the enrolled minutiae (genuine and fake) with the vector set extracted from the query minutiae sets, and adjustable transform equation is used for adjusting for the minutiae direction, etc.
    Type: Application
    Filed: July 19, 2007
    Publication date: December 17, 2009
    Applicant: PRIVYLINK PTE LTD
    Inventors: Kwok Yan Karch Lam, Yi Yuan Huang, Hong Wei Sun, Ka Wo Cheng
  • Patent number: 6278684
    Abstract: This invention relates to a rewritable optical information recording medium of the phase-change type, which is made of a Te—Ge—Sb—B quaternary alloy. The optical contrast of the recording medium according to the present invention is enhanced over 35% in the visible wavelength range of 350 nm to 800 nm. Hence, the CNR of an optical disk with the recording medium of the present invention is increased, and the recording medium is suitable for optical information record operated in shorter visible wavelength. In addition, since the crystallization of the recording medium according to the present invention is single-phase, the performance of the repeated recording and erasing is enhanced.
    Type: Grant
    Filed: June 15, 1999
    Date of Patent: August 21, 2001
    Assignee: Industrial Technology Research Institute
    Inventors: Donyau Chiang, Tzuan-Ren Jeng, Der-Ray Huang, Tsung-Shune Chin, Yi-Yuan Huang, Chyan-Ming Lee