Patents by Inventor Yi-Zhen Chen

Yi-Zhen Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240087861
    Abstract: In an embodiment, a magnetic assembly includes: an inner permeance annulus; and an outer permeance annulus connected to the inner permeance annulus via magnets, wherein the outer permeance annulus comprises a peak region with a thickness greater than other regions of the outer permeance annulus.
    Type: Application
    Filed: November 17, 2023
    Publication date: March 14, 2024
    Inventors: Tsung-Jen YANG, Yi-Zhen CHEN, Chih-Pin WANG, Chao-Li SHIH, Ching-Hou SU, Cheng-Yi HUANG
  • Publication number: 20240072075
    Abstract: An electronic device including a substrate, a first electrode layer, a photodiode, an insulating layer, a second electrode layer, and a first transparent conductive layer is provided. The first electrode layer is disposed on the substrate. The photodiode is disposed on the first electrode layer and is electrically connected to the first electrode layer. The insulating layer is disposed on the photodiode. The second electrode layer is disposed on the insulating layer and is electrically connected to the photodiode. The first transparent conductive layer is disposed on the insulating layer and contacts the second electrode layer. A manufacturing method of an electronic device is also provided.
    Type: Application
    Filed: July 18, 2023
    Publication date: February 29, 2024
    Applicants: InnoCare Optoelectronics Corporation, Innolux Corporation
    Inventors: Chin-Chi Chen, Ting-Yu Chen, Yi-Ju Tseng, Ji-Zhen Lu
  • Patent number: 11854776
    Abstract: In an embodiment, a magnetic assembly includes: an inner permeance annulus; and an outer permeance annulus connected to the inner permeance annulus via magnets, wherein the outer permeance annulus comprises a peak region with a thickness greater than other regions of the outer permeance annulus.
    Type: Grant
    Filed: July 28, 2022
    Date of Patent: December 26, 2023
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Tsung-Jen Yang, Yi-Zhen Chen, Chih-Pin Wang, Chao-Li Shih, Ching-Hou Su, Cheng-Yi Huang
  • Patent number: 11801504
    Abstract: Provided is a hydrophilic phosphorus ligand with the structure of formula 1. X is Y is m is an integer from 1 to 20, A independently is *—O(CH2)n—, n is an integer from 1 to 5, *— is a bond close to triphenylphosphine, and — is a bond away from triphenylphosphine.
    Type: Grant
    Filed: July 11, 2022
    Date of Patent: October 31, 2023
    Assignee: Industrial Technology Research Institute
    Inventors: Mao-Lin Hsueh, Yi-Zhen Chen, Kuo-Chen Shih
  • Publication number: 20230280664
    Abstract: A reticle carrier described herein is configured to quickly discharge the residual charge on a reticle so as to reduce, minimize, and/or prevent particles in the reticle carrier from being attracted to and/or transferred to the reticle. In particular, the reticle carrier may be configured to provide reduced capacitance between an inner baseplate of the reticle carrier and the reticle. The reduction in capacitance may reduce the resistance-capacitance (RC) time constant for discharging the residual charge on the reticle, which may increase the discharge speed for discharging the residual charge through support pins of the reticle carrier. The increase in discharge speed may reduce the likelihood that an electrostatic force in the reticle carrier may attract particles in the reticle carrier to the reticle.
    Type: Application
    Filed: May 12, 2023
    Publication date: September 7, 2023
    Inventors: Yen-Hsun CHEN, Yi-Zhen CHEN, Jhan-Hong YEH, Han-Lung CHANG, Tzung-Chi FU, Li-Jui CHEN
  • Publication number: 20230249171
    Abstract: Provided is a hydrophilic phosphorus ligand with the structure of formula 1. X is Y is m is an integer from 1 to 20, A independently is *—O(CH2)n—, n is an integer from 1 to 5, *- is a bond close to triphenylphosphine, and - is a bond away from triphenylphosphine.
    Type: Application
    Filed: July 11, 2022
    Publication date: August 10, 2023
    Applicant: Industrial Technology Research Institute
    Inventors: Mao-Lin Hsueh, Yi-Zhen Chen, Kuo-Chen Shih
  • Patent number: 11718725
    Abstract: A method of forming foam material is provided, which includes mixing 100 parts by weight of a compound having cyclic carbonate groups and a foaming agent to form a foaming composition, wherein the foaming agent includes 3 to 13 parts by weight of carbamate salt and 15 to 65 parts by weight of amino compound. The foaming composition is heated to 100° C. to 170° C. for decomposing the carbamate salt into CO2 and amino compound, and the amino compound is reacted with the compound having cyclic carbonate groups to form the foam material.
    Type: Grant
    Filed: January 18, 2023
    Date of Patent: August 8, 2023
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Mao-Lin Hsueh, Yi-Zhen Chen, Chih-Kuang Chang
  • Patent number: 11698591
    Abstract: An EUV photolithography system utilizes a baseplate of an EUV pod to unload an EUV reticle from a chuck within an EUV scanner. The baseplate includes a top surface and support pins extending from the top surface. The when the reticle is unloaded onto the baseplate, the support pins hold the reticle at relatively large distance from the top surface of the baseplate. The support pins have a relatively low resistance. The large distance and low resistance help ensure that particles do not travel from the baseplate to the reticle during unloading.
    Type: Grant
    Filed: August 31, 2021
    Date of Patent: July 11, 2023
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yi-Zhen Chen, Yen-Hsun Chen, Jhan-Hong Yeh, Tzung-Chi Fu, Han-Lung Chang, Li-Jui Chen
  • Patent number: 11687011
    Abstract: A reticle carrier described herein is configured to quickly discharge the residual charge on a reticle so as to reduce, minimize, and/or prevent particles in the reticle carrier from being attracted to and/or transferred to the reticle. In particular, the reticle carrier may be configured to provide reduced capacitance between an inner baseplate of the reticle carrier and the reticle. The reduction in capacitance may reduce the resistance-capacitance (RC) time constant for discharging the residual charge on the reticle, which may increase the discharge speed for discharging the residual charge through support pins of the reticle carrier. The increase in discharge speed may reduce the likelihood that an electrostatic force in the reticle carrier may attract particles in the reticle carrier to the reticle.
    Type: Grant
    Filed: August 30, 2021
    Date of Patent: June 27, 2023
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yen-Hsun Chen, Yi-Zhen Chen, Jhan-Hong Yeh, Han-Lung Chang, Tzung-Chi Fu, Li-Jui Chen
  • Publication number: 20230159719
    Abstract: A method of forming foam material is provided, which includes mixing 100 parts by weight of a compound having cyclic carbonate groups and a foaming agent to form a foaming composition, wherein the foaming agent includes 3 to 13 parts by weight of carbamate salt and 15 to 65 parts by weight of amino compound. The foaming composition is heated to 100° C. to 170° C. for decomposing the carbamate salt into CO2 and amino compound, and the amino compound is reacted with the compound having cyclic carbonate groups to form the foam material.
    Type: Application
    Filed: January 18, 2023
    Publication date: May 25, 2023
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Mao-Lin HSUEH, Yi-Zhen CHEN, Chih-Kuang CHANG
  • Patent number: 11603444
    Abstract: A method of forming foam material is provided, which includes mixing 100 parts by weight of a compound having cyclic carbonate groups and a foaming agent to form a foaming composition, wherein the foaming agent includes 3 to 13 parts by weight of carbamate salt and 15 to 65 parts by weight of amino compound. The foaming composition is heated to 100° C. to 170° C. for decomposing the carbamate salt into CO2 and amino compound, and the amino compound is reacted with the compound having cyclic carbonate groups to form the foam material.
    Type: Grant
    Filed: December 31, 2019
    Date of Patent: March 14, 2023
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Mao-Lin Hsueh, Yi-Zhen Chen, Chih-Kuang Chang
  • Publication number: 20230062852
    Abstract: A reticle carrier described herein is configured to quickly discharge the residual charge on a reticle so as to reduce, minimize, and/or prevent particles in the reticle carrier from being attracted to and/or transferred to the reticle. In particular, the reticle carrier may be configured to provide reduced capacitance between an inner baseplate of the reticle carrier and the reticle. The reduction in capacitance may reduce the resistance-capacitance (RC) time constant for discharging the residual charge on the reticle, which may increase the discharge speed for discharging the residual charge through support pins of the reticle carrier. The increase in discharge speed may reduce the likelihood that an electrostatic force in the reticle carrier may attract particles in the reticle carrier to the reticle.
    Type: Application
    Filed: August 30, 2021
    Publication date: March 2, 2023
    Inventors: Yen-Hsun CHEN, Yi-Zhen CHEN, Jhan-Hong YEH, Han-Lung CHANG, Tzung-Chi FU, Li-Jui CHEN
  • Publication number: 20230060598
    Abstract: An EUV photolithography system utilizes a baseplate of an EUV pod to unload an EUV reticle from a chuck within an EUV scanner. The baseplate includes a top surface and support pins extending from the top surface. The when the reticle is unloaded onto the baseplate, the support pins hold the reticle at relatively large distance from the top surface of the baseplate. The support pins have a relatively low resistance. The large distance and low resistance help ensure that particles do not travel from the baseplate to the reticle during unloading.
    Type: Application
    Filed: August 31, 2021
    Publication date: March 2, 2023
    Inventors: Yi-Zhen CHEN, Yen-Hsun CHEN, Jhan-Hong YEH, Tzung-Chi FU, Han-Lung CHANG, Li-Jui CHEN
  • Publication number: 20220367160
    Abstract: In an embodiment, a magnetic assembly includes: an inner permeance annulus; and an outer permeance annulus connected to the inner permeance annulus via magnets, wherein the outer permeance annulus comprises a peak region with a thickness greater than other regions of the outer permeance annulus.
    Type: Application
    Filed: July 28, 2022
    Publication date: November 17, 2022
    Inventors: Tsung-Jen YANG, Yi-Zhen CHEN, Chih-Pin WANG, Chao-Li SHIH, Ching-Hou SU, Cheng-Yi HUANG
  • Patent number: 11488814
    Abstract: In an embodiment, a magnetic assembly includes: an inner permeance annulus; and an outer permeance annulus connected to the inner permeance annulus via magnets, wherein the outer permeance annulus comprises a peak region with a thickness greater than other regions of the outer permeance annulus.
    Type: Grant
    Filed: October 8, 2019
    Date of Patent: November 1, 2022
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Tsung-Jen Yang, Yi-Zhen Chen, Chih-Pin Wang, Chao-Li Shih, Ching-Hou Su, Cheng-Yi Huang
  • Publication number: 20210198442
    Abstract: A method of forming foam material is provided, which includes mixing 100 parts by weight of a compound having cyclic carbonate groups and a foaming agent to form a foaming composition, wherein the foaming agent includes 3 to 13 parts by weight of carbamate salt and 15 to 65 parts by weight of amino compound. The foaming composition is heated to 100° C. to 170° C. for decomposing the carbamate salt into CO2 and amino compound, and the amino compound is reacted with the compound having cyclic carbonate groups to form the foam material.
    Type: Application
    Filed: December 31, 2019
    Publication date: July 1, 2021
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Mao-Lin HSUEH, Yi-Zhen CHEN, Chih-Kuang CHANG
  • Patent number: 10731034
    Abstract: A polyurethane urea composition and a preparation method thereof are provided. The method includes mixing and reacting an urea and an amine compound to obtain a polyurea oligomer, and mixing and reacting the polyurea oligomer and a cyclic carbonate compound to obtain a polyurethane urea composition having a repeating unit represented by formula I: —R2—U2—U1—U2—R2—, wherein ??[formula I] U1 is a is an integer of 1 to 10000, each U2 is independently each R1 is independently a C1 to C20 alkylene group, a C3 to C20 cycloalkylene group, a C8 to C20 alkylarylene group, a polyether group having a weight-average molecular weight of 100 g/mol to 10000 g/mol, or a combination thereof, and each R2 is independently an aliphatic group, a cycloaliphatic group, an aromatic group substituted by an alkyl or an unsubstituted aromatic group, an oligo polyether group, an oligo polyester group, or a combination thereof.
    Type: Grant
    Filed: March 27, 2018
    Date of Patent: August 4, 2020
    Assignee: Industrial Technology Research Institute
    Inventors: Mao-Lin Hsueh, Yi-Zhen Chen, Hsiao-Chun Yeh, Yung-Chan Lin, Cheng-Han Hsieh
  • Publication number: 20200161108
    Abstract: In an embodiment, a magnetic assembly includes: an inner permeance annulus; and an outer permeance annulus connected to the inner permeance annulus via magnets, wherein the outer permeance annulus comprises a peak region with a thickness greater than other regions of the outer permeance annulus.
    Type: Application
    Filed: October 8, 2019
    Publication date: May 21, 2020
    Inventors: Tsung-Jen YANG, Yi-Zhen CHEN, Chih-Pin WANG, Chao-Li SHIH, Ching-Hou SU, Cheng-Yi HUANG
  • Publication number: 20190185668
    Abstract: A polyurethane urea composition and a preparation method thereof are provided. The method includes mixing and reacting an urea and an amine compound to obtain a polyurea oligomer, and mixing and reacting the polyurea oligomer and a cyclic carbonate compound to obtain a polyurethane urea composition having a repeating unit represented by formula I: —R2—U2—U1—U2—R2, wherein ??[formula I] U1 is a is an integer of 1 to 10000, each U2 is independently each R1 is independently a C1 to C20 alkyl group, a C3 to C20 cycloalkyl group, a C8 to C20 alkylaryl group, a polyether group having a weight-average molecular weight of 100 g/mol to 10000 g/mol, or a combination thereof, and each R2 is independently an aliphatic group, a cycloaliphatic group, an aromatic group substituted by an alkyl or an unsubstituted aromatic group, an oligo polyether group, an oligo polyester group, or a combination thereof.
    Type: Application
    Filed: March 27, 2018
    Publication date: June 20, 2019
    Applicant: Industrial Technology Research Institute
    Inventors: Mao-Lin Hsueh, Yi-Zhen Chen, Hsiao-Chun Yeh, Yung-Chan Lin, Cheng-Han Hsieh
  • Patent number: 9839906
    Abstract: A catalyst and a method for synthesizing cyclic carbonate using the catalyst are provided. The catalyst includes a metal complex shown in formula (I): wherein R1, R2, R4, and R5 are independently a C1-C25 alkyl group, a C1-C25 alkoxy group, a C3-C8 cycloalkyl group, a C6-C25 aryl group, a C6-C25 aryloxy group, a C7-C25 aralkyl group, a C7-C25 aralkoxy group, or halogen; R3 is hydrogen, a C1-C25 alkyl group, a C3-C8 cycloalkyl group, a C6-C25 aryl group, a C6-C25 aryloxy group, a C7-C25 aralkyl group, or a C7-C25 aralkoxy group; M is Sn or Ti; X is Cl, Br, I, or OAc; and L represents ether or furan.
    Type: Grant
    Filed: March 22, 2017
    Date of Patent: December 12, 2017
    Assignee: Industrial Technology Research Institute
    Inventors: Mao-Lin Hsueh, Yi-Zhen Chen, Kuo-Chen Shih