Abstract: A method for operating a reticle inspection system includes training an analysis model of the reticle inspection system with a machine learning process, generating a difference threshold based on the machine learning process, storing a reference image, and generating a scan image of a reticle with the reticle inspection system. The method includes generating a relative difference value by comparing the scan image to the reference image. The method includes, if the relative difference value is less than the difference threshold, determining that the reticle is not defective. The method includes, if the relative difference value is greater than the difference threshold, determining that the reticle is defective.

Abstract: A method of manufacturing a semiconductor device includes conditioning a reflective surface of an extreme ultraviolet (EUV) mask, capturing an image of the conditioned reflective surface, performing a photolithography process using the mask, capturing another image of the reflective surface after the photolithography process, and comparing the images of the reflective surface. A system for EUV photolithography includes a conditioning unit, an inspection tool, an EUV exposure device, and a computing system programmed to control the conditioning unit, the inspection tool, and the EUV exposure device.

Abstract: A method includes: generating a first image by scanning a mask; following the generating a first image, exposing the mask in a photolithography operation; following the exposing, generating a second image by scanning the mask; generating a compensated third image by performing a gray level map local compensation on the second image, the gray level map local compensation being via a transform function; generating a comparison result by comparing the compensated third image with the first image; and based on the comparison result, determining whether the mask has a defect thereon.

Abstract: A catalyst includes 1 part by mole of a palladium complex and 500 to 10000 parts by mole of an amine compound. The palladium complex has a chemical structure of ?in which X is halogen, each of R1 is independently C1-8 linear alkyl group or C3-8 cycloalkyl group, and each of R2 is independently H or C1-4 alkyl group.

Abstract: A method for operating a reticle inspection system includes training an analysis model of the reticle inspection system with a machine learning process, generating a difference threshold based on the machine learning process, storing a reference image, and generating a scan image of a reticle with the reticle inspection system. The method includes generating a relative difference value by comparing the scan image to the reference image. The method includes, if the relative difference value is less than the difference threshold, determining that the reticle is not defective. The method includes, if the relative difference value is greater than the difference threshold, determining that the reticle is defective.

Abstract: In an embodiment, a magnetic assembly includes: an inner permeance annulus; and an outer permeance annulus connected to the inner permeance annulus via magnets, wherein the outer permeance annulus comprises a peak region with a thickness greater than other regions of the outer permeance annulus.

Abstract: A reticle carrier described herein is configured to quickly discharge the residual charge on a reticle so as to reduce, minimize, and/or prevent particles in the reticle carrier from being attracted to and/or transferred to the reticle. In particular, the reticle carrier may be configured to provide reduced capacitance between an inner baseplate of the reticle carrier and the reticle. The reduction in capacitance may reduce the resistance-capacitance (RC) time constant for discharging the residual charge on the reticle, which may increase the discharge speed for discharging the residual charge through support pins of the reticle carrier. The increase in discharge speed may reduce the likelihood that an electrostatic force in the reticle carrier may attract particles in the reticle carrier to the reticle.

Abstract: In an embodiment, a magnetic assembly includes: an inner permeance annulus; and an outer permeance annulus connected to the inner permeance annulus via magnets, wherein the outer permeance annulus comprises a peak region with a thickness greater than other regions of the outer permeance annulus.

Abstract: A reticle carrier described herein is configured to quickly discharge the residual charge on a reticle so as to reduce, minimize, and/or prevent particles in the reticle carrier from being attracted to and/or transferred to the reticle. In particular, the reticle carrier may be configured to provide reduced capacitance between an inner baseplate of the reticle carrier and the reticle. The reduction in capacitance may reduce the resistance-capacitance (RC) time constant for discharging the residual charge on the reticle, which may increase the discharge speed for discharging the residual charge through support pins of the reticle carrier. The increase in discharge speed may reduce the likelihood that an electrostatic force in the reticle carrier may attract particles in the reticle carrier to the reticle.

Abstract: In an embodiment, a magnetic assembly includes: an inner permeance annulus; and an outer permeance annulus connected to the inner permeance annulus via magnets, wherein the outer permeance annulus comprises a peak region with a thickness greater than other regions of the outer permeance annulus.

Abstract: In an embodiment, a magnetic assembly includes: an inner permeance annulus; and an outer permeance annulus connected to the inner permeance annulus via magnets, wherein the outer permeance annulus comprises a peak region with a thickness greater than other regions of the outer permeance annulus.

Abstract: Provided is a hydrophilic phosphorus ligand with the structure of formula 1. X is Y is m is an integer from 1 to 20, A independently is *—O(CH2)n—, n is an integer from 1 to 5, *— is a bond close to triphenylphosphine, and — is a bond away from triphenylphosphine.

Abstract: A reticle carrier described herein is configured to quickly discharge the residual charge on a reticle so as to reduce, minimize, and/or prevent particles in the reticle carrier from being attracted to and/or transferred to the reticle. In particular, the reticle carrier may be configured to provide reduced capacitance between an inner baseplate of the reticle carrier and the reticle. The reduction in capacitance may reduce the resistance-capacitance (RC) time constant for discharging the residual charge on the reticle, which may increase the discharge speed for discharging the residual charge through support pins of the reticle carrier. The increase in discharge speed may reduce the likelihood that an electrostatic force in the reticle carrier may attract particles in the reticle carrier to the reticle.

Abstract: Provided is a hydrophilic phosphorus ligand with the structure of formula 1. X is Y is m is an integer from 1 to 20, A independently is *—O(CH2)n—, n is an integer from 1 to 5, *- is a bond close to triphenylphosphine, and - is a bond away from triphenylphosphine.

Abstract: A method of forming foam material is provided, which includes mixing 100 parts by weight of a compound having cyclic carbonate groups and a foaming agent to form a foaming composition, wherein the foaming agent includes 3 to 13 parts by weight of carbamate salt and 15 to 65 parts by weight of amino compound. The foaming composition is heated to 100° C. to 170° C. for decomposing the carbamate salt into CO2 and amino compound, and the amino compound is reacted with the compound having cyclic carbonate groups to form the foam material.

Abstract: An EUV photolithography system utilizes a baseplate of an EUV pod to unload an EUV reticle from a chuck within an EUV scanner. The baseplate includes a top surface and support pins extending from the top surface. The when the reticle is unloaded onto the baseplate, the support pins hold the reticle at relatively large distance from the top surface of the baseplate. The support pins have a relatively low resistance. The large distance and low resistance help ensure that particles do not travel from the baseplate to the reticle during unloading.

Abstract: A reticle carrier described herein is configured to quickly discharge the residual charge on a reticle so as to reduce, minimize, and/or prevent particles in the reticle carrier from being attracted to and/or transferred to the reticle. In particular, the reticle carrier may be configured to provide reduced capacitance between an inner baseplate of the reticle carrier and the reticle. The reduction in capacitance may reduce the resistance-capacitance (RC) time constant for discharging the residual charge on the reticle, which may increase the discharge speed for discharging the residual charge through support pins of the reticle carrier. The increase in discharge speed may reduce the likelihood that an electrostatic force in the reticle carrier may attract particles in the reticle carrier to the reticle.

Abstract: A method of forming foam material is provided, which includes mixing 100 parts by weight of a compound having cyclic carbonate groups and a foaming agent to form a foaming composition, wherein the foaming agent includes 3 to 13 parts by weight of carbamate salt and 15 to 65 parts by weight of amino compound. The foaming composition is heated to 100° C. to 170° C. for decomposing the carbamate salt into CO2 and amino compound, and the amino compound is reacted with the compound having cyclic carbonate groups to form the foam material.

Abstract: A method of forming foam material is provided, which includes mixing 100 parts by weight of a compound having cyclic carbonate groups and a foaming agent to form a foaming composition, wherein the foaming agent includes 3 to 13 parts by weight of carbamate salt and 15 to 65 parts by weight of amino compound. The foaming composition is heated to 100° C. to 170° C. for decomposing the carbamate salt into CO2 and amino compound, and the amino compound is reacted with the compound having cyclic carbonate groups to form the foam material.

Abstract: A reticle carrier described herein is configured to quickly discharge the residual charge on a reticle so as to reduce, minimize, and/or prevent particles in the reticle carrier from being attracted to and/or transferred to the reticle. In particular, the reticle carrier may be configured to provide reduced capacitance between an inner baseplate of the reticle carrier and the reticle. The reduction in capacitance may reduce the resistance-capacitance (RC) time constant for discharging the residual charge on the reticle, which may increase the discharge speed for discharging the residual charge through support pins of the reticle carrier. The increase in discharge speed may reduce the likelihood that an electrostatic force in the reticle carrier may attract particles in the reticle carrier to the reticle.