Patents by Inventor Yi-Zhen Chen
Yi-Zhen Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240087861Abstract: In an embodiment, a magnetic assembly includes: an inner permeance annulus; and an outer permeance annulus connected to the inner permeance annulus via magnets, wherein the outer permeance annulus comprises a peak region with a thickness greater than other regions of the outer permeance annulus.Type: ApplicationFiled: November 17, 2023Publication date: March 14, 2024Inventors: Tsung-Jen YANG, Yi-Zhen CHEN, Chih-Pin WANG, Chao-Li SHIH, Ching-Hou SU, Cheng-Yi HUANG
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Publication number: 20240072075Abstract: An electronic device including a substrate, a first electrode layer, a photodiode, an insulating layer, a second electrode layer, and a first transparent conductive layer is provided. The first electrode layer is disposed on the substrate. The photodiode is disposed on the first electrode layer and is electrically connected to the first electrode layer. The insulating layer is disposed on the photodiode. The second electrode layer is disposed on the insulating layer and is electrically connected to the photodiode. The first transparent conductive layer is disposed on the insulating layer and contacts the second electrode layer. A manufacturing method of an electronic device is also provided.Type: ApplicationFiled: July 18, 2023Publication date: February 29, 2024Applicants: InnoCare Optoelectronics Corporation, Innolux CorporationInventors: Chin-Chi Chen, Ting-Yu Chen, Yi-Ju Tseng, Ji-Zhen Lu
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Patent number: 11854776Abstract: In an embodiment, a magnetic assembly includes: an inner permeance annulus; and an outer permeance annulus connected to the inner permeance annulus via magnets, wherein the outer permeance annulus comprises a peak region with a thickness greater than other regions of the outer permeance annulus.Type: GrantFiled: July 28, 2022Date of Patent: December 26, 2023Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Tsung-Jen Yang, Yi-Zhen Chen, Chih-Pin Wang, Chao-Li Shih, Ching-Hou Su, Cheng-Yi Huang
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Patent number: 11801504Abstract: Provided is a hydrophilic phosphorus ligand with the structure of formula 1. X is Y is m is an integer from 1 to 20, A independently is *—O(CH2)n—, n is an integer from 1 to 5, *— is a bond close to triphenylphosphine, and — is a bond away from triphenylphosphine.Type: GrantFiled: July 11, 2022Date of Patent: October 31, 2023Assignee: Industrial Technology Research InstituteInventors: Mao-Lin Hsueh, Yi-Zhen Chen, Kuo-Chen Shih
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Publication number: 20230280664Abstract: A reticle carrier described herein is configured to quickly discharge the residual charge on a reticle so as to reduce, minimize, and/or prevent particles in the reticle carrier from being attracted to and/or transferred to the reticle. In particular, the reticle carrier may be configured to provide reduced capacitance between an inner baseplate of the reticle carrier and the reticle. The reduction in capacitance may reduce the resistance-capacitance (RC) time constant for discharging the residual charge on the reticle, which may increase the discharge speed for discharging the residual charge through support pins of the reticle carrier. The increase in discharge speed may reduce the likelihood that an electrostatic force in the reticle carrier may attract particles in the reticle carrier to the reticle.Type: ApplicationFiled: May 12, 2023Publication date: September 7, 2023Inventors: Yen-Hsun CHEN, Yi-Zhen CHEN, Jhan-Hong YEH, Han-Lung CHANG, Tzung-Chi FU, Li-Jui CHEN
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Publication number: 20230249171Abstract: Provided is a hydrophilic phosphorus ligand with the structure of formula 1. X is Y is m is an integer from 1 to 20, A independently is *—O(CH2)n—, n is an integer from 1 to 5, *- is a bond close to triphenylphosphine, and - is a bond away from triphenylphosphine.Type: ApplicationFiled: July 11, 2022Publication date: August 10, 2023Applicant: Industrial Technology Research InstituteInventors: Mao-Lin Hsueh, Yi-Zhen Chen, Kuo-Chen Shih
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Patent number: 11718725Abstract: A method of forming foam material is provided, which includes mixing 100 parts by weight of a compound having cyclic carbonate groups and a foaming agent to form a foaming composition, wherein the foaming agent includes 3 to 13 parts by weight of carbamate salt and 15 to 65 parts by weight of amino compound. The foaming composition is heated to 100° C. to 170° C. for decomposing the carbamate salt into CO2 and amino compound, and the amino compound is reacted with the compound having cyclic carbonate groups to form the foam material.Type: GrantFiled: January 18, 2023Date of Patent: August 8, 2023Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Mao-Lin Hsueh, Yi-Zhen Chen, Chih-Kuang Chang
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Patent number: 11698591Abstract: An EUV photolithography system utilizes a baseplate of an EUV pod to unload an EUV reticle from a chuck within an EUV scanner. The baseplate includes a top surface and support pins extending from the top surface. The when the reticle is unloaded onto the baseplate, the support pins hold the reticle at relatively large distance from the top surface of the baseplate. The support pins have a relatively low resistance. The large distance and low resistance help ensure that particles do not travel from the baseplate to the reticle during unloading.Type: GrantFiled: August 31, 2021Date of Patent: July 11, 2023Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Yi-Zhen Chen, Yen-Hsun Chen, Jhan-Hong Yeh, Tzung-Chi Fu, Han-Lung Chang, Li-Jui Chen
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Patent number: 11687011Abstract: A reticle carrier described herein is configured to quickly discharge the residual charge on a reticle so as to reduce, minimize, and/or prevent particles in the reticle carrier from being attracted to and/or transferred to the reticle. In particular, the reticle carrier may be configured to provide reduced capacitance between an inner baseplate of the reticle carrier and the reticle. The reduction in capacitance may reduce the resistance-capacitance (RC) time constant for discharging the residual charge on the reticle, which may increase the discharge speed for discharging the residual charge through support pins of the reticle carrier. The increase in discharge speed may reduce the likelihood that an electrostatic force in the reticle carrier may attract particles in the reticle carrier to the reticle.Type: GrantFiled: August 30, 2021Date of Patent: June 27, 2023Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Yen-Hsun Chen, Yi-Zhen Chen, Jhan-Hong Yeh, Han-Lung Chang, Tzung-Chi Fu, Li-Jui Chen
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Publication number: 20230159719Abstract: A method of forming foam material is provided, which includes mixing 100 parts by weight of a compound having cyclic carbonate groups and a foaming agent to form a foaming composition, wherein the foaming agent includes 3 to 13 parts by weight of carbamate salt and 15 to 65 parts by weight of amino compound. The foaming composition is heated to 100° C. to 170° C. for decomposing the carbamate salt into CO2 and amino compound, and the amino compound is reacted with the compound having cyclic carbonate groups to form the foam material.Type: ApplicationFiled: January 18, 2023Publication date: May 25, 2023Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Mao-Lin HSUEH, Yi-Zhen CHEN, Chih-Kuang CHANG
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Patent number: 11603444Abstract: A method of forming foam material is provided, which includes mixing 100 parts by weight of a compound having cyclic carbonate groups and a foaming agent to form a foaming composition, wherein the foaming agent includes 3 to 13 parts by weight of carbamate salt and 15 to 65 parts by weight of amino compound. The foaming composition is heated to 100° C. to 170° C. for decomposing the carbamate salt into CO2 and amino compound, and the amino compound is reacted with the compound having cyclic carbonate groups to form the foam material.Type: GrantFiled: December 31, 2019Date of Patent: March 14, 2023Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Mao-Lin Hsueh, Yi-Zhen Chen, Chih-Kuang Chang
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Publication number: 20230062852Abstract: A reticle carrier described herein is configured to quickly discharge the residual charge on a reticle so as to reduce, minimize, and/or prevent particles in the reticle carrier from being attracted to and/or transferred to the reticle. In particular, the reticle carrier may be configured to provide reduced capacitance between an inner baseplate of the reticle carrier and the reticle. The reduction in capacitance may reduce the resistance-capacitance (RC) time constant for discharging the residual charge on the reticle, which may increase the discharge speed for discharging the residual charge through support pins of the reticle carrier. The increase in discharge speed may reduce the likelihood that an electrostatic force in the reticle carrier may attract particles in the reticle carrier to the reticle.Type: ApplicationFiled: August 30, 2021Publication date: March 2, 2023Inventors: Yen-Hsun CHEN, Yi-Zhen CHEN, Jhan-Hong YEH, Han-Lung CHANG, Tzung-Chi FU, Li-Jui CHEN
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Publication number: 20230060598Abstract: An EUV photolithography system utilizes a baseplate of an EUV pod to unload an EUV reticle from a chuck within an EUV scanner. The baseplate includes a top surface and support pins extending from the top surface. The when the reticle is unloaded onto the baseplate, the support pins hold the reticle at relatively large distance from the top surface of the baseplate. The support pins have a relatively low resistance. The large distance and low resistance help ensure that particles do not travel from the baseplate to the reticle during unloading.Type: ApplicationFiled: August 31, 2021Publication date: March 2, 2023Inventors: Yi-Zhen CHEN, Yen-Hsun CHEN, Jhan-Hong YEH, Tzung-Chi FU, Han-Lung CHANG, Li-Jui CHEN
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Publication number: 20220367160Abstract: In an embodiment, a magnetic assembly includes: an inner permeance annulus; and an outer permeance annulus connected to the inner permeance annulus via magnets, wherein the outer permeance annulus comprises a peak region with a thickness greater than other regions of the outer permeance annulus.Type: ApplicationFiled: July 28, 2022Publication date: November 17, 2022Inventors: Tsung-Jen YANG, Yi-Zhen CHEN, Chih-Pin WANG, Chao-Li SHIH, Ching-Hou SU, Cheng-Yi HUANG
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Patent number: 11488814Abstract: In an embodiment, a magnetic assembly includes: an inner permeance annulus; and an outer permeance annulus connected to the inner permeance annulus via magnets, wherein the outer permeance annulus comprises a peak region with a thickness greater than other regions of the outer permeance annulus.Type: GrantFiled: October 8, 2019Date of Patent: November 1, 2022Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Tsung-Jen Yang, Yi-Zhen Chen, Chih-Pin Wang, Chao-Li Shih, Ching-Hou Su, Cheng-Yi Huang
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Publication number: 20210198442Abstract: A method of forming foam material is provided, which includes mixing 100 parts by weight of a compound having cyclic carbonate groups and a foaming agent to form a foaming composition, wherein the foaming agent includes 3 to 13 parts by weight of carbamate salt and 15 to 65 parts by weight of amino compound. The foaming composition is heated to 100° C. to 170° C. for decomposing the carbamate salt into CO2 and amino compound, and the amino compound is reacted with the compound having cyclic carbonate groups to form the foam material.Type: ApplicationFiled: December 31, 2019Publication date: July 1, 2021Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Mao-Lin HSUEH, Yi-Zhen CHEN, Chih-Kuang CHANG
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Patent number: 10731034Abstract: A polyurethane urea composition and a preparation method thereof are provided. The method includes mixing and reacting an urea and an amine compound to obtain a polyurea oligomer, and mixing and reacting the polyurea oligomer and a cyclic carbonate compound to obtain a polyurethane urea composition having a repeating unit represented by formula I: —R2—U2—U1—U2—R2—, wherein ??[formula I] U1 is a is an integer of 1 to 10000, each U2 is independently each R1 is independently a C1 to C20 alkylene group, a C3 to C20 cycloalkylene group, a C8 to C20 alkylarylene group, a polyether group having a weight-average molecular weight of 100 g/mol to 10000 g/mol, or a combination thereof, and each R2 is independently an aliphatic group, a cycloaliphatic group, an aromatic group substituted by an alkyl or an unsubstituted aromatic group, an oligo polyether group, an oligo polyester group, or a combination thereof.Type: GrantFiled: March 27, 2018Date of Patent: August 4, 2020Assignee: Industrial Technology Research InstituteInventors: Mao-Lin Hsueh, Yi-Zhen Chen, Hsiao-Chun Yeh, Yung-Chan Lin, Cheng-Han Hsieh
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Publication number: 20200161108Abstract: In an embodiment, a magnetic assembly includes: an inner permeance annulus; and an outer permeance annulus connected to the inner permeance annulus via magnets, wherein the outer permeance annulus comprises a peak region with a thickness greater than other regions of the outer permeance annulus.Type: ApplicationFiled: October 8, 2019Publication date: May 21, 2020Inventors: Tsung-Jen YANG, Yi-Zhen CHEN, Chih-Pin WANG, Chao-Li SHIH, Ching-Hou SU, Cheng-Yi HUANG
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Publication number: 20190185668Abstract: A polyurethane urea composition and a preparation method thereof are provided. The method includes mixing and reacting an urea and an amine compound to obtain a polyurea oligomer, and mixing and reacting the polyurea oligomer and a cyclic carbonate compound to obtain a polyurethane urea composition having a repeating unit represented by formula I: —R2—U2—U1—U2—R2, wherein ??[formula I] U1 is a is an integer of 1 to 10000, each U2 is independently each R1 is independently a C1 to C20 alkyl group, a C3 to C20 cycloalkyl group, a C8 to C20 alkylaryl group, a polyether group having a weight-average molecular weight of 100 g/mol to 10000 g/mol, or a combination thereof, and each R2 is independently an aliphatic group, a cycloaliphatic group, an aromatic group substituted by an alkyl or an unsubstituted aromatic group, an oligo polyether group, an oligo polyester group, or a combination thereof.Type: ApplicationFiled: March 27, 2018Publication date: June 20, 2019Applicant: Industrial Technology Research InstituteInventors: Mao-Lin Hsueh, Yi-Zhen Chen, Hsiao-Chun Yeh, Yung-Chan Lin, Cheng-Han Hsieh
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Patent number: 9839906Abstract: A catalyst and a method for synthesizing cyclic carbonate using the catalyst are provided. The catalyst includes a metal complex shown in formula (I): wherein R1, R2, R4, and R5 are independently a C1-C25 alkyl group, a C1-C25 alkoxy group, a C3-C8 cycloalkyl group, a C6-C25 aryl group, a C6-C25 aryloxy group, a C7-C25 aralkyl group, a C7-C25 aralkoxy group, or halogen; R3 is hydrogen, a C1-C25 alkyl group, a C3-C8 cycloalkyl group, a C6-C25 aryl group, a C6-C25 aryloxy group, a C7-C25 aralkyl group, or a C7-C25 aralkoxy group; M is Sn or Ti; X is Cl, Br, I, or OAc; and L represents ether or furan.Type: GrantFiled: March 22, 2017Date of Patent: December 12, 2017Assignee: Industrial Technology Research InstituteInventors: Mao-Lin Hsueh, Yi-Zhen Chen, Kuo-Chen Shih