Abstract: An optical module includes a micro spectrometer. The micro spectrometer includes an optical crystal, a lens, and a photosensitive assembly. The optical crystal is configured to receive detection light and covert the detection light into interference light. The optical crystal is surrounded by a sleeve, the sleeve configured to fix a position of the optical crystal. The lens is configured for receiving the interference light and focusing the interference light. The photosensitive assembly is configured for imaging the interference light into an interference image. The optical module further comprises a controller. The controller is electrically connected to the photosensitive assembly, and the controller is used to convert the interference image into light wavelength signals and light intensity signals.

Abstract: A display device and a backlight control method of the display device are provided. When a duration of an image occlusion period is shorter than a preset duration, a backlight driving circuit is controlled to respectively provide a first pulse current and a second pulse current in a first light emitting period and a second light emitting period in each frame period, so as to drive a backlight unit to provide a first backlight and a second backlight. Here, the first pulse current is greater than the second pulse current.

Abstract: The invention provides a self-cleaving protein and a protein preparation method by employing a self-cleaving protein. The self-cleaving protein comprises an intein domain, wherein the intein domain contains at least one residue mutation at its N-terminus. The self-cleavage is prohibited under an “prohibition condition” and when the self-cleaving protein is under an “inducement condition”, the C-terminal cleavage will occur but N-terminal cleavage will not. In addition, the invention provides a fusion protein comprising the self-cleaving protein and target protein.

Abstract: A Zr-based or Zr—Cu based metallic glass thin film (MGTF) coated on aluminum alloy substrate and a method of fabricating the metallic glass and MGTF coated on aluminum alloy substrate are disclosed. The Zr-based metallic glass thin film-coated aluminum alloy substrate of the present invention comprises: an aluminum alloy substrate; and a Zr-based metallic glass thin film located on the substrate, in which the Zr-based metallic glass is represented by the formula of (ZraCubNicAld)100-xSix, wherein 45=<a=<75, 25=<b=<35, 5=<c=<15, 5=<d=<15, 0.1=<x=<10. The Zr—Cu-based metallic glass thin film coated substrate of the present invention comprises: an aluminum alloy substrate; a Zr—Cu-based metallic glass thin film located on the aluminum alloy substrate, in which the Zr—Cu-based metallic glass is represented by the following formula of (ZreCufAlgAgh)100-ySiy, wherein 35=<e=<55, 35=<f=<55, 5=<g=<15, 5=<h=<15, 0.1=<y=<10.

Abstract: A Zr-based or Zr—Cu based metallic glass thin film (MGTF) coated on aluminum alloy substrate and a method of fabricating the metallic glass and MGTF coated on aluminum alloy substrate are disclosed. The Zr-based metallic glass thin film-coated aluminum alloy substrate of the present invention comprises: an aluminum alloy substrate; and a Zr-based metallic glass thin film located on the substrate, in which the Zr-based metallic glass is represented by the formula of (ZraCubNicAld)100-xSix, wherein 45=<a=<75, 25=<b=<35, 5=<c=<15, 5=<d=<15, 0.1=<x=<10. The Zr—Cu-based metallic glass thin film coated substrate of the present invention comprises: an aluminum alloy substrate; a Zr—Cu-based metallic glass thin film located on the aluminum alloy substrate, in which the Zr—Cu-based metallic glass is represented by the following formula of (ZreCufAlgAgh)100-ySiy, wherein 35=<e=<55, 35=<f=<55, 5=<g=<15, 5=<h=<15, 0.1=<y=<10.

Abstract: A Zr-based or Zr—Cu based metallic glass thin film (MGTF) coated on aluminum alloy substrate and a method of fabricating the metallic glass and MGTF coated on aluminum alloy substrate are disclosed. The Zr-based metallic glass thin film-coated aluminum alloy substrate of the present invention comprises: an aluminum alloy substrate; and a Zr-based metallic glass thin film located on the substrate, in which the Zr-based metallic glass is represented by the formula of (ZraCubNicAld)100-xSix, wherein 45=<a=<75, 25=<b=<35, 5=<c=<15, 5=<d=<15, 0.1=<x=<10. The Zr—Cu-based metallic glass thin film coated substrate of the present invention comprises: an aluminum alloy substrate; a Zr—Cu-based metallic glass thin film located on the aluminum alloy substrate, in which the Zr—Cu-based metallic glass is represented by the formula of (ZreCufAlgAgh)100-ySiy, wherein 35=<e=<55, 35=<f=<55, 5=<g=<15, 5=<h=<15, 0.1=<y=<10.

Abstract: A medicine container detachably disposed in an electronic medicine box includes an accommodating portion and a cover portion. The accommodating portion has a medicine containing space. The cover portion is movably connected to accommodating portion and has a barcode. When the medicine container is disposed in the electronic medicine box, the barcode is readable. A medication auxiliary device including a plurality of the above medicine containers and an electronic medicine box is also disclosed.

Abstract: A medicine container detachably disposed in an electronic medicine box includes an accommodating portion and a cover portion. The accommodating portion has a medicine containing space. The cover portion is movably connected to accommodating portion and has a barcode. When the medicine container is disposed in the electronic medicine box, the barcode is readable. A medication auxiliary device including a plurality of the above medicine containers and an electronic medicine box is also disclosed.

Abstract: Three processes for the manufacture of polyhedral oligomeric silsesquioxanes (POSS) which utilize the action of bases that are capable of either attacking silicon or any compound that can react with a protic solvent (e.g. ROH, H2O etc.) and generate hydroxide [OH]?, alkoxide [RO]??, etc. The first process utilizes such bases to effectively redistribute the silicon-oxygen frameworks in polymeric silsesquioxanes [RSiO1.5]28 where ?=1-1,000,000 or higher into POSS nanostructures of formulas [(RSiO1.5)n?#, homoleptic, [(RXSiO1.5)n]?#, functionalized homoleptic, [(RSiO1.5)m(R?SiO1.5)n]?#, heteroleptic, and {(RSiO1.5)m(RXSiO1.0)n}?#, functionalized heteroleptic nanostructures. The second process utilizes base to aid in the formation of POSS nanostructures of formulas [(RSiO1.5)n]?# homoleptic and [(RSiO1.5)m(R?SiO1.5)n]?# heteroleptic and [(RSiO1.5)m(RXSiO1.

Abstract: Three processes for the manufacture of polyhedral oligomeric silsesquioxanes (POSS) which utilize the action of bases that are capable of either attacking silicon or any compound that can react with a protic solvent (e.g. ROH, H2O etc.) and generate hydroxide [OH]?, alkoxide [RO]?, etc. The first process utilizes such bases to effectively redistribute the silicon-oxygen frameworks in polymeric silsesquioxanes [RSiO1.5]? where ?=1?1,000,000 or higher into POSS nanostructures of formulas [(RSiO1.5)n]?#, homoleptic, [(RXSiO1.5)n]?#, functionalized homoleptic, [(RSiO1.5)m(R?SiO1.5)n]?#, heteroleptic, and {(RSiO1.5)m(RXSiO1.0)n}?#, functionalized heteroleptic nanostructures. The second process utilizes base to aid in the formation of POSS nanostructures of formulas [(RSiO1.5)n]?# homoleptic and [(RSiO1.5)m(R?SiO1.5)n]?# heteroleptic and [(RSiO1.5)m(RXSiO1.

Abstract: Processes have been developed for the manufacture of polyhedral oligomeric silsesquioxanes (POSS), polysilsesquioxanes, polyhedral oligomeric silicates (POS), and siloxane molecules bearing reactive ring-strained cyclic olefins (e.g. norbornenyl, cyclopentenyl, etc. functionalities). The preferred manufacturing processes employ the silation of siloxides (Si—OA, where A=H, alkaline or alkaline earth metals) with silane reagents that contain at least one reactive ring-strained cyclic olefin functionality [e.g., X3-ySi(CH3)y(CH2)2 where y=1-2 and X=OH, Cl, Br, I, alkoxide OR, acetate OOCR, peroxide OOR, amine NR2, isocyanate NCO, and R]. Alternatively, similar products can be prepared through hydrosilation reactions between silanes containing at least one silicon-hydrogen bond (Si—H) with ring-strained cyclic olefin reagents [e.g., 5-vinyl, 2 norbornene CH2?CH, cyclopentadiene]. The two processes can be effectively practiced using polymeric silsesquioxanes [RSiO1.

Abstract: Processes have been developed for the manufacture of polyhedral oligomeric silsesquioxanes (POSS), polysilsesquioxanes, polyhedral oligomeric silicates (POS), and siloxane molecules bearing reactive ring-strained cyclic olefins (e.g. norbornenyl, cyclopentenyl, etc. functionalities). The preferred manufacturing processes employ the silation of siloxides (SiOA, where A=H, alkaline or alkaline earth metals) with silane reagents that contain at least one reactive ring-strained cyclic olefin functionality [e.g., X3-ySi(CH3)y(CH2)2 where y=1-2 and X=OH, Cl, Br, I, alkoxide OR, acetate OOCR, peroxide OOR, amine NR2, isocyanate NCO, and R]. Alternatively, similar products can be prepared through hydrosilation reactions between silanes containing at least one silicon-hydrogen bond (Si—H) with ring-strained cyclic olefin reagents [e.g., 5-vinyl, 2 norbornene CH2═CH, cyclopentadiene].