Patents by Inventor Yichen Fang
Yichen Fang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 12652806Abstract: A ferroelectric memory includes at least one storage cell. Each storage cell includes a transistor, a first ferroelectric capacitor, and at least one voltage divider capacitor. The transistor includes a gate electrode, a source electrode, and a drain electrode. One electrode of the first ferroelectric capacitor is connected to the gate electrode. The other electrode of the first ferroelectric capacitor is connected to a word line. One electrode of each voltage divider capacitor in the at least one voltage divider capacitor is connected to the gate electrode, and the other electrode of each voltage divider capacitor in the at least one voltage divider capacitor is connected to the source electrode.Type: GrantFiled: July 26, 2023Date of Patent: June 9, 2026Assignee: HUAWEI TECHNOLOGIES CO., LTD.Inventors: Zhaozhao Hou, Sitong Bu, Yichen Fang, Yu Zhang, Jeffrey Junhao Xu
-
Publication number: 20260109829Abstract: The present application discloses a foamable composition comprising 30 to 92 wt % cellulose acetate: 5 to 30 wt % of at least one plasticizer: 3 to 40 wt % of at least one natural filler; and 0) to 9 wt % of at least one physical blowing agent. The composition can be used to prepare biodegradable foam and foam articles having densities, cell sizes, mechanical and thermal properties appropriate for low and medium density foam applications.Type: ApplicationFiled: September 21, 2023Publication date: April 23, 2026Applicant: Eastman Chemical CompanyInventors: Yichen Fang, Goliath Beniah, Michael Eugene Donelson
-
Publication number: 20260098103Abstract: The present application discloses cellulose ester compositions comprising certain mineral particle compositions. The compositions when heated reduce the molecular weight of the cellulose esters in the compositions depending in the temperature, time, and mineral particle composition loading. The present application also discloses processes for reducing the molecular weight of cellulose esters in cellulose ester compositions comprising the mineral particle compositions.Type: ApplicationFiled: September 21, 2023Publication date: April 9, 2026Applicant: Eastman Chemical CompanyInventors: Stephanie Kay Clendennen, Hamid Ebrahimi, Yichen Fang, Michael John Rodig
-
Patent number: 12581659Abstract: Example ferroelectric memories and storage devices are described. One example ferroelectric memory includes at least one bit cell. A bit cell in the at least one bit cell includes a plurality of ferroelectric capacitors and a first transistor. The first transistor includes a first gate, a first channel, a first source, and a first drain. The first source and the first drain are located at two ends of the first channel. One electrode of each of the plurality of ferroelectric capacitors is formed on the first gate.Type: GrantFiled: May 3, 2023Date of Patent: March 17, 2026Assignee: Huawei Technologies Co., Ltd.Inventors: Jeffrey Junhao Xu, Weiliang Jing, Sitong Bu, Yichen Fang, Ying Wu, Zhaozhao Hou, Wanliang Tan, Heng Zhang, Yu Zhang
-
Publication number: 20250002611Abstract: The present application discloses mixed cellulose esters that are freshwater biodegradable. The present application also discloses compositions, articles, beads and films made from the mixed cellulose esters.Type: ApplicationFiled: November 11, 2022Publication date: January 2, 2025Applicant: Eastman Chemical CompanyInventors: Yichen Fang, Charles Ray Chambers, Jr., Sharmistha Mazumder, Devin G. Barrett
-
Publication number: 20250002612Abstract: The present application discloses mixed cellulose esters that are freshwater biodegradable. The present application also discloses compositions, articles, beads and films made from the mixed cellulose esters.Type: ApplicationFiled: November 11, 2022Publication date: January 2, 2025Applicant: Eastman Chemical CompanyInventors: Yichen Fang, Charles Ray Chambers, JR., Sharmistha Mazumder, Devin G. Barrett
-
Publication number: 20240409723Abstract: The present application discloses melt processable cellulose ester compositions comprising a cellulose ester, at least one alkaline additive, and at least one neutralizing agent. Plasticizers can be optionally used in the compositions. The present application also discloses processes for preparing the compositions and articles that can be made from the compositions. The compositions show improved degradation properties.Type: ApplicationFiled: October 7, 2022Publication date: December 12, 2024Applicant: Eastman Chemical CompanyInventors: Stephanie Kay Clendennen, Yichen Fang
-
Publication number: 20240400788Abstract: The present application discloses melt processable cellulose ester compositions comprising a cellulose ester, at least one alkaline additive, and at least one neutralizing agent. Plasticizers can be optionally used in the compositions. The present application also discloses processes for preparing the compositions and articles that can be made from the compositions. The compositions show improved degradation properties.Type: ApplicationFiled: October 7, 2022Publication date: December 5, 2024Applicant: Eastman Chemical CompanyInventors: STEPHANIE KAY CLENDENNEN, YICHEN FANG
-
Publication number: 20240392089Abstract: A cellulose acetate foam having a density of less than 0.20 g/cm3 and an average foam cell size of less than 200 micrometers is disclosed. A foamable composition, a method for foaming a foam and articles including, prepared or formed from the foam are also described.Type: ApplicationFiled: September 1, 2022Publication date: November 28, 2024Applicant: Eastman Chemical CompanyInventors: BETHANY MICHELLE ADEN, GAURAV AMARPURI, GOLIATH BENIAH, STEPHANIE KAY CLENDENNEN, MICHAEL EUGENE DONELSON, Yichen Fang, THILANGA PRABHASH LIYANA ARACHCHI, STEVEN THOMAS PERRI, WAYNE KEN SHIH
-
Publication number: 20240327621Abstract: The present application discloses melt processable cellulose ester compositions comprising a cellulose ester, at least one alkaline additive, and at least one neutralizing agent. Plasticizers can be optionally used in the compositions. The present application also discloses processes for preparing the compositions and articles that can be made from the compositions. The compositions show improved degradation properties.Type: ApplicationFiled: October 7, 2022Publication date: October 3, 2024Applicant: Eastman Chemical CompanyInventors: STEPHANIE KAY CLENDENNEN, YICHEN FANG
-
Publication number: 20240130139Abstract: A ferroelectric memory includes at least one storage cell. Each storage cell includes a transistor, a first ferroelectric capacitor, and at least one voltage divider capacitor. The transistor includes a gate electrode, a source electrode, and a drain electrode. One electrode of the first ferroelectric capacitor is connected to the gate electrode. The other electrode of the first ferroelectric capacitor is connected to a word line. One electrode of each voltage divider capacitor in the at least one voltage divider capacitor is connected to the gate electrode, and the other electrode of each voltage divider capacitor in the at least one voltage divider capacitor is connected to the source electrode.Type: ApplicationFiled: July 26, 2023Publication date: April 18, 2024Applicant: HUAWEI TECHNOLOGIES CO., LTD.Inventors: Zhaozhao Hou, Sitong Bu, Yichen Fang, Yu Zhang, JEFFREY JUNHAO XU
-
Publication number: 20230276636Abstract: Example ferroelectric memories and storage devices are described One example ferroelectric memory includes at least one bit cell. A bit cell in the at least one bit cell includes a plurality of ferroelectric capacitors and a first transistor. The first transistor includes a first gate, a first channel, a first source, and a first drain. The first source and the first drain are located at two ends of the first channel. One electrode of each of the plurality of ferroelectric capacitors is formed on the first gate.Type: ApplicationFiled: May 3, 2023Publication date: August 31, 2023Inventors: Jeffrey Junhao XU, Weiliang JING, Sitong BU, Yichen FANG, Ying WU, Zhaozhao HOU, Wanliang TAN, Heng ZHANG, Yu ZHANG
-
Patent number: 9431620Abstract: The present invention discloses an organic resistive random access memory and a preparation method thereof. The memory uses silicon as a substrate, and has a MIM capacitor structure having a vertical memory unit, where the MIM structure has a top electrode of Al, a bottom electrode of ITO, and an middle functional layer of parylene, wherein, a parylene layer as the functional layer is formed by performing deposition multiple times, where the deposition of Al2O3 is performed once by ALD between each two deposition of parylene. A critical region which is in favor of forming a conductive channel could be formed by controlling the deposition area of Al2O3, and further control the electrical characteristics of the memory. Through the present invention, the cycle-to-cycle and device-to-device uniformity could be effectively improved, without changing the basic structure of the memory.Type: GrantFiled: September 30, 2013Date of Patent: August 30, 2016Assignee: Peking UniversityInventors: Yimao Cai, Yefan Liu, Wenliang Bai, Zongwei Wang, Yichen Fang, Ru Huang
-
Publication number: 20160240778Abstract: Disclosed are a multi-value nonvolatile organic resistive random access memory and a method for preparing the same. The resistive random access memory comprises a top electrode, a bottom electrode and a middle functional layer located between the top electrode and the bottom electrode, the middle functional layer is at least two layers of parylene. The method comprises the steps of: growing material for the bottom electrode using physical vapor deposition method on a substrate; growing sequentially multiple layers of parylene on the bottom electrode by polymer chemical vapor deposition; defining the via for leading out the bottom electrode by lithography and etching; growing material for the top electrode on the parylene materials by using physical vapor deposition process, defining the top electrode material by lithography and lift-off, and leading out the bottom electrode.Type: ApplicationFiled: March 31, 2014Publication date: August 18, 2016Inventors: Yimao Cai, Yefan Liu, Yichen Fang, Zongwei Wang, Qiang Li, Muxi Yu, Yue Pan, Ru Huang
-
Publication number: 20160110644Abstract: The present invention discloses a time correlation learning neuron circuit based on a resistive memristor and an implementation method thereof. The present invention utilizes switching characteristics of the resistive memristor. When two terminals of the resistive memristor are selected synchronously by two excitation signals, the voltage drop between these two terminals will change the resistance value of memristor, thereby achieving the on-off of a synapse connection and achieving the correction of the two excitation signals. Meanwhile the device also has a memory characteristic. Also, the previous excitation signal can be repeated. That is, the purpose of learning is achieved. Since the resistive memristor has a simple structure and a high degree of integration, it can achieve large-scale physical synapse connection in order to achieve more complex learning and even logic functions. The present invention has a good application prospect in a neuron cell computation.Type: ApplicationFiled: September 30, 2013Publication date: April 21, 2016Inventors: Ru Huang, Yaokai Zhang, Yimao Cai, Fan Yang, Yue Pan, Zongwei Wang, Yichen Fang
-
Patent number: 9281476Abstract: Embodiments of the present invention disclose a resistive memory and a method for fabricating the same. The resistive memory comprises a bottom electrode, a resistive layer and a top electrode. The resistive layer is located over the bottom electrode. The top electrode is located over the resistive layer. A conductive protrusion is provided on the bottom electrode. The conductive protrusion is embedded in the resistive layer, and has a top width smaller than a bottom width. Embodiments of the present invention further disclose a method for fabricating a resistive memory. According to the resistive memory and the method for fabricating the same provided by the embodiments of the present invention, by means of providing the conductive protrusion on the bottom electrode, a “lightning rod” effect may be occurred so that an electric field in the resistive layer is intensively distributed near the conductive protrusion.Type: GrantFiled: July 8, 2013Date of Patent: March 8, 2016Assignee: Peking UniversityInventors: Yimao Cai, Shihui Yin, Ru Huang, Yichen Fang
-
Publication number: 20160049604Abstract: The present invention discloses an organic resistive random access memory and a preparation method thereof. The memory uses silicon as a substrate, and has a MIM capacitor structure having a vertical memory unit, where the MIM structure has a top electrode of Al, a bottom electrode of ITO, and an middle functional layer of parylene, wherein, a parylene layer as the functional layer is formed by performing deposition multiple times, where the deposition of Al2O3 is performed once by ALD between each two deposition of parylene. A critical region which is in favor of forming a conductive channel could be formed by controlling the deposition area of Al2O3, and further control the electrical characteristics of the memory. Through the present invention, the cycle-to-cycle and device-to-device uniformity could be effectively improved, without changing the basic structure of the memory.Type: ApplicationFiled: September 30, 2013Publication date: February 18, 2016Inventors: Yimao Cai, Yefan Liu, Wenliang Bai, Zongwei Wang, Yichen Fang, Ru Huang
-
Publication number: 20150144861Abstract: Embodiments of the present invention disclose a resistive memory and a method for fabricating the same. The resistive memory comprises a bottom electrode, a resistive layer and a top electrode. The resistive layer is located over the bottom electrode. The top electrode is located over the resistive layer. A conductive protrusion is provided on the bottom electrode. The conductive protrusion is embedded in the resistive layer, and has a top width smaller than a bottom width. Embodiments of the present invention further disclose a method for fabricating a resistive memory. According to the resistive memory and the method for fabricating the same provided by the embodiments of the present invention, by means of providing the conductive protrusion on the bottom electrode, a “lightning rod” effect may be occurred so that an electric field in the resistive layer is intensively distributed near the conductive protrusion.Type: ApplicationFiled: July 8, 2013Publication date: May 28, 2015Inventors: Yimao Cai, Shihui Yin, Ru Huang, Yichen Fang