Abstract: Methods and apparatus for controlling processing of a substrate within a process chamber, comprising: performing statistical analysis on measurements of deposition profile of at least one previously processed substrate processed in the process chamber, wherein the deposition profile is based at least on modulating a power parameter of at least one power supply affecting a magnetron in the process chamber; determining, based on the statistical analysis, a model of the deposition profile as a function of at least the power parameter; fitting the measurements of deposition profile to the model; determining a power parameter setpoint for the at least one power supply using the fitted model based on a desired deposition profile of an unprocessed substrate; and setting the power parameter setpoint for processing the unprocessed substrate.

Abstract: Methods and apparatus for processing a substrate are provided herein. For example, an RF power delivery compensation circuit comprises a first input configured to receive an RF forward power from an RF power source connected to a processing chamber and a second input configured to receive an RF delivered power from a matching network connected between the RF power source and the processing chamber. The RF power delivery compensation circuit calculates an RF forward power compensation factor based on the RF forward power and the RF delivered power for adjusting the RF forward power delivered to the processing chamber during operation.

Abstract: Methods and apparatus for processing a substrate are provided herein. For example, an RF power delivery compensation circuit comprises a first input configured to receive an RF forward power from an RF power source connected to a processing chamber and a second input configured to receive an RF delivered power from a matching network connected between the RF power source and the processing chamber. The RF power delivery compensation circuit calculates an RF forward power compensation factor based on the RF forward power and the RF delivered power for adjusting the RF forward power delivered to the processing chamber during operation.

Abstract: The present subject matter relates to techniques for systems and methods for determining alpha phase in brain of subjects undergoing depressive disorder. The disclosed system for a closed-loop operation in simultaneous functional magnetic resonance imaging (fMRI)-electroencephalogram (EEG)-transcranial magnetic stimulation (TMS), can include a processor that be configured to receive and process a functional magnetic resonance imaging (fMRI) data and/or an extracranial electroencephalogram (EEG) data and/or transcranial magnetic stimulation (TMS) pulse simultaneously.

Abstract: A non-imaging optical concentrator, including a top portion, a body, and a bottom portion, wherein the top portion is configured to receive an incident light and transmit the received incident light to the body when the incident light is within an angle of acceptance for the non-imaging optical concentrator, and where the body is configured to reflect the incident light transmitted by the top portion to the bottom portion when the incident light is within the angle of acceptance for the non-imaging optical concentrator, and wherein the top portion is configured to split or diverge the incident light into two or more directions when the incident light is within the angle of acceptance for the non-imaging optical concentrator.

Abstract: Disclosed herein are solar cell devices comprising a transparent substrate, a solar cell fabricated over the transparent substrate and a polymeric concentrator comprising a concentrating lens with a planar surface, wherein the concentrating lens is optically aligned with the solar cell such that the concentrating lens provides a uniform illumination over an entire surface of the solar cell. Also, disclosed herein are methods of making solar cell devices and in particular polymeric concentrators.