Patents by Inventor Yifeng Winston Yang

Yifeng Winston Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System and method of determining a polishing endpoint by monitoring signal intensity
    Patent number: 6730603
    Abstract: The present invention provides a polishing endpoint detection system, for use with a polishing apparatus, a method of determining a polishing endpoint of a surface located on a semiconductor wafer, and a method of manufacturing an integrated circuit on a semiconductor wafer. In one embodiment, the polishing endpoint detection system includes a carrier head having a polishing platen associated therewith. Also, the detection system includes a signal emitter located adjacent one of the carrier head or polishing platen. The signal emitter is configured to generate an emitted signal capable of traveling through an object to be polished. In addition, the detection system includes a signal receiver located adjacent another of the carrier head or polishing platen. The signal receiver is configured to receive the emitted signal from which a change in a signal intensity of the emitted signal can be determined.
    Type: Grant
    Filed: October 25, 2001
    Date of Patent: May 4, 2004
    Assignee: Agere Systems Inc.
    Inventors: Annette M. Crevasse, William G. Easter, Frank Miceli, Yifeng Winston Yang
  • System and method of determining a polishing endpoint by monitoring signal intensity
    Publication number: 20030082844
    Abstract: The present invention provides a polishing endpoint detection system, for use with a polishing apparatus, a method of determining a polishing endpoint of a surface located on a semiconductor wafer, and a method of manufacturing an integrated circuit on a semiconductor wafer. In one embodiment, the polishing endpoint detection system includes a carrier head having a polishing platen associated therewith. Also, the detection system includes a signal emitter located adjacent one of the carrier head or polishing platen. The signal emitter is configured to generate an emitted signal capable of traveling through an object to be polished. In addition, the detection system includes a signal receiver located adjacent another of the carrier head or polishing platen. The signal receiver is configured to receive the emitted signal from which a change in a signal intensity of the emitted signal can be determined.
    Type: Application
    Filed: October 25, 2001
    Publication date: May 1, 2003
    Applicant: Agere Systems Inc.
    Inventors: Annette M. Crevasse, William G. Easter, Frank Miceli, Yifeng Winston Yang